JP2007513372A - 投影光学系 - Google Patents

投影光学系 Download PDF

Info

Publication number
JP2007513372A
JP2007513372A JP2006541857A JP2006541857A JP2007513372A JP 2007513372 A JP2007513372 A JP 2007513372A JP 2006541857 A JP2006541857 A JP 2006541857A JP 2006541857 A JP2006541857 A JP 2006541857A JP 2007513372 A JP2007513372 A JP 2007513372A
Authority
JP
Japan
Prior art keywords
lens
optical system
projection optical
refractive power
lens group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006541857A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007513372A5 (enExample
Inventor
ロスタルスキ、ハンス−ユルゲン
ドドック、アウレリアン
ウルリッヒ、ヴィルヘルム
エッペレ、アレクサンダー
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・アーゲー filed Critical カール・ツァイス・エスエムティー・アーゲー
Publication of JP2007513372A publication Critical patent/JP2007513372A/ja
Publication of JP2007513372A5 publication Critical patent/JP2007513372A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/34—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having four components only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006541857A 2003-12-02 2004-11-25 投影光学系 Pending JP2007513372A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52609603P 2003-12-02 2003-12-02
PCT/EP2004/013519 WO2005054956A2 (en) 2003-12-02 2004-11-25 Projection optical system

Publications (2)

Publication Number Publication Date
JP2007513372A true JP2007513372A (ja) 2007-05-24
JP2007513372A5 JP2007513372A5 (enExample) 2010-04-30

Family

ID=34652415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006541857A Pending JP2007513372A (ja) 2003-12-02 2004-11-25 投影光学系

Country Status (7)

Country Link
US (1) US7492509B2 (enExample)
EP (2) EP2040123B9 (enExample)
JP (1) JP2007513372A (enExample)
KR (2) KR101109844B1 (enExample)
CN (1) CN100538524C (enExample)
DE (1) DE602004019142D1 (enExample)
WO (1) WO2005054956A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019505831A (ja) * 2015-12-07 2019-02-28 エーエスエムエル ホールディング エヌ．ブイ． 対物レンズシステム

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7492509B2 (en) 2003-12-02 2009-02-17 Carl Zeiss Smt Ag Projection optical system
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7301707B2 (en) 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
KR20070097083A (ko) * 2004-12-30 2007-10-02 칼 짜이스 에스엠테 아게 투사 광학 시스템
CN105759543A (zh) * 2014-12-17 2016-07-13 深圳市亿思达科技集团有限公司 投影光学系统及投影装置
WO2017026945A1 (en) 2015-08-13 2017-02-16 Heptagon Micro Optics Pte. Ltd. Illumination assembly for 3d data acquisition
CN110389429A (zh) * 2018-04-20 2019-10-29 美国奈维特公司 用于机器视觉高光学扩展量模块化变焦镜头
CN117036647B (zh) * 2023-10-10 2023-12-12 中国电建集团昆明勘测设计研究院有限公司 基于倾斜实景三维模型的地面曲面提取方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device
JP2002151392A (ja) * 2000-11-10 2002-05-24 Canon Inc 投影露光装置及びデバイス製造方法
JP2004086128A (ja) * 2002-07-04 2004-03-18 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
JP2005109286A (ja) * 2003-10-01 2005-04-21 Nikon Corp 投影光学系、露光装置、および露光方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4613940A (en) * 1982-11-09 1986-09-23 International Microelectronic Products Method and structure for use in designing and building electronic systems in integrated circuits
US5969803A (en) * 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
EP1139138A4 (en) * 1999-09-29 2006-03-08 Nikon Corp PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM
DE19955984A1 (de) 1999-11-20 2001-05-23 Zeiss Carl Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende
US7187503B2 (en) * 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
KR100866818B1 (ko) 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
DE10064685A1 (de) 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002323653A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
JP2002287023A (ja) * 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
JP2005512151A (ja) 2001-12-10 2005-04-28 カール・ツァイス・エスエムティー・アーゲー カタジオプトリック縮小対物レンズ
US20040075894A1 (en) 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
JP2005519332A (ja) 2002-03-01 2005-06-30 カール・ツアイス・エスエムテイ・アーゲー 屈折型投影対物レンズ
DE10229249A1 (de) * 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refraktives Projektionsobjektiv mit einer Taille
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US7154676B2 (en) * 2002-03-01 2006-12-26 Carl Zeiss Smt A.G. Very-high aperture projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
WO2005019878A1 (de) 2003-08-01 2005-03-03 Carl Zeiss Smt Ag Optische abbildungsvorrichtung mit wenigstens einer systemblende
US7492509B2 (en) 2003-12-02 2009-02-17 Carl Zeiss Smt Ag Projection optical system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device
JP2002151392A (ja) * 2000-11-10 2002-05-24 Canon Inc 投影露光装置及びデバイス製造方法
JP2004086128A (ja) * 2002-07-04 2004-03-18 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
JP2005109286A (ja) * 2003-10-01 2005-04-21 Nikon Corp 投影光学系、露光装置、および露光方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019505831A (ja) * 2015-12-07 2019-02-28 エーエスエムエル ホールディング エヌ．ブイ． 対物レンズシステム

Also Published As

Publication number Publication date
CN100538524C (zh) 2009-09-09
CN1922547A (zh) 2007-02-28
EP1690139B1 (en) 2009-01-14
WO2005054956A3 (en) 2005-11-24
KR101255854B1 (ko) 2013-04-17
EP2040123A1 (en) 2009-03-25
US7492509B2 (en) 2009-02-17
EP2040123B1 (en) 2012-06-27
EP2040123B9 (en) 2012-11-14
KR20060123761A (ko) 2006-12-04
KR101109844B1 (ko) 2012-04-06
KR20100019568A (ko) 2010-02-18
DE602004019142D1 (de) 2009-03-05
US20070258152A1 (en) 2007-11-08
EP1690139A2 (en) 2006-08-16
WO2005054956A2 (en) 2005-06-16

Similar Documents

Publication Publication Date Title
US7782538B2 (en) Projection objective having a high aperture and a planar end surface
KR101288187B1 (ko) 반사굴절식 투영 대물렌즈
US6665126B2 (en) Projection exposure lens with aspheric elements
US7190527B2 (en) Refractive projection objective
US20080068705A1 (en) Projection optical system and method
JP2003535356A (ja) 非球面レンズ表面が隣接して配置されている投影対物レンズ
US7848016B2 (en) High-NA projection objective
JPH08211294A (ja) 投影露光装置
JP5105743B2 (ja) 浸漬リソグラフィー用屈折性投影対物レンズ
JP4207478B2 (ja) オプティカルインテグレータ、照明光学装置、露光装置および露光方法
JP2007513372A (ja) 投影光学系
US9436103B2 (en) Wynne-Dyson projection lens with reduced susceptibility to UV damage
US7957069B2 (en) Projection optical system
CN101006377A (zh) 反射型投影光学系统以及具备此反射型投影光学系统的曝光装置
JP2005524866A (ja) 超高開口度の投影対物レンズ
CN103713379B (zh) 一种大数值孔径的折反射的干式投影光学系统
JP2002072080A (ja) 投影光学系および該投影光学系を備えた露光装置
JPH0774090A (ja) 回路の製造方法及び露光装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071112

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071112

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20080717

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20080717

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20080718

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100312

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110228

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110228

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20110531

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20110607

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20111031