CN100538524C - 投影光学系统 - Google Patents

投影光学系统 Download PDF

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Publication number
CN100538524C
CN100538524C CNB2004800359682A CN200480035968A CN100538524C CN 100538524 C CN100538524 C CN 100538524C CN B2004800359682 A CNB2004800359682 A CN B2004800359682A CN 200480035968 A CN200480035968 A CN 200480035968A CN 100538524 C CN100538524 C CN 100538524C
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CN
China
Prior art keywords
lens
optical system
projection optical
group
negative refraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB2004800359682A
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English (en)
Chinese (zh)
Other versions
CN1922547A (zh
Inventor
汉斯-于尔根·罗斯塔尔斯基
奥雷利安·多多克
威廉·乌尔希里
亚历山大·埃普勒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN1922547A publication Critical patent/CN1922547A/zh
Application granted granted Critical
Publication of CN100538524C publication Critical patent/CN100538524C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/34—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having four components only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CNB2004800359682A 2003-12-02 2004-11-25 投影光学系统 Expired - Lifetime CN100538524C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52609603P 2003-12-02 2003-12-02
US60/526,096 2003-12-02

Publications (2)

Publication Number Publication Date
CN1922547A CN1922547A (zh) 2007-02-28
CN100538524C true CN100538524C (zh) 2009-09-09

Family

ID=34652415

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004800359682A Expired - Lifetime CN100538524C (zh) 2003-12-02 2004-11-25 投影光学系统

Country Status (7)

Country Link
US (1) US7492509B2 (enExample)
EP (2) EP1690139B1 (enExample)
JP (1) JP2007513372A (enExample)
KR (2) KR101255854B1 (enExample)
CN (1) CN100538524C (enExample)
DE (1) DE602004019142D1 (enExample)
WO (1) WO2005054956A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI636280B (zh) * 2015-12-07 2018-09-21 荷蘭商Ａｓｍｌ控股公司 物鏡系統

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
CN100538524C (zh) 2003-12-02 2009-09-09 卡尔蔡司Smt股份有限公司 投影光学系统
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170028451A (ko) 2004-05-17 2017-03-13 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7301707B2 (en) 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
WO2006069795A2 (en) * 2004-12-30 2006-07-06 Carl Zeiss Smt Ag Projection optical system
CN105759543A (zh) * 2014-12-17 2016-07-13 深圳市亿思达科技集团有限公司 投影光学系统及投影装置
WO2017026945A1 (en) 2015-08-13 2017-02-16 Heptagon Micro Optics Pte. Ltd. Illumination assembly for 3d data acquisition
CN110673321A (zh) * 2018-04-20 2020-01-10 美国奈维特公司 用于高光学扩展量模块化变焦镜头的镜头连接件
CN117036647B (zh) * 2023-10-10 2023-12-12 中国电建集团昆明勘测设计研究院有限公司 基于倾斜实景三维模型的地面曲面提取方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5969803A (en) * 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
EP1139138A1 (en) * 1999-09-29 2001-10-04 Nikon Corporation Projection exposure method and apparatus and projection optical system
US6445510B1 (en) * 1999-11-20 2002-09-03 Carl-Zeiss-Stiftung Optical imaging device, in particular lens system, with at least one system diaphragm
EP1245984A2 (en) * 2001-03-27 2002-10-02 Nikon Corporation A projection optical system, a projection exposure apparatus, and a projection exposure method

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4613940A (en) * 1982-11-09 1986-09-23 International Microelectronic Products Method and structure for use in designing and building electronic systems in integrated circuits
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
US7187503B2 (en) * 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
JP3576961B2 (ja) 2000-11-10 2004-10-13 キヤノン株式会社 投影露光装置及びデバイス製造方法
KR100866818B1 (ko) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002323653A (ja) * 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
US20040075894A1 (en) * 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
AU2002317875A1 (en) 2001-12-10 2003-06-23 Carl Zeiss Smt Ag Catadioptrical reduction lens
US7154676B2 (en) * 2002-03-01 2006-12-26 Carl Zeiss Smt A.G. Very-high aperture projection objective
DE10229249A1 (de) * 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refraktives Projektionsobjektiv mit einer Taille
WO2003075096A2 (de) 2002-03-01 2003-09-12 Carl Zeiss Smt Ag Refraktives projektionsobjektiv
US7190527B2 (en) * 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
JP2004086128A (ja) * 2002-07-04 2004-03-18 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
WO2005019878A1 (de) 2003-08-01 2005-03-03 Carl Zeiss Smt Ag Optische abbildungsvorrichtung mit wenigstens einer systemblende
JP2005109286A (ja) * 2003-10-01 2005-04-21 Nikon Corp 投影光学系、露光装置、および露光方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法
CN100538524C (zh) 2003-12-02 2009-09-09 卡尔蔡司Smt股份有限公司 投影光学系统

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5969803A (en) * 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
EP1139138A1 (en) * 1999-09-29 2001-10-04 Nikon Corporation Projection exposure method and apparatus and projection optical system
US6445510B1 (en) * 1999-11-20 2002-09-03 Carl-Zeiss-Stiftung Optical imaging device, in particular lens system, with at least one system diaphragm
EP1245984A2 (en) * 2001-03-27 2002-10-02 Nikon Corporation A projection optical system, a projection exposure apparatus, and a projection exposure method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI636280B (zh) * 2015-12-07 2018-09-21 荷蘭商Ａｓｍｌ控股公司 物鏡系統
US10247940B2 (en) 2015-12-07 2019-04-02 Asml Holding N.V. Objective lens system

Also Published As

Publication number Publication date
WO2005054956A2 (en) 2005-06-16
US20070258152A1 (en) 2007-11-08
US7492509B2 (en) 2009-02-17
KR101109844B1 (ko) 2012-04-06
EP2040123B9 (en) 2012-11-14
DE602004019142D1 (de) 2009-03-05
EP1690139B1 (en) 2009-01-14
EP2040123B1 (en) 2012-06-27
EP2040123A1 (en) 2009-03-25
EP1690139A2 (en) 2006-08-16
KR20100019568A (ko) 2010-02-18
KR101255854B1 (ko) 2013-04-17
KR20060123761A (ko) 2006-12-04
JP2007513372A (ja) 2007-05-24
WO2005054956A3 (en) 2005-11-24
CN1922547A (zh) 2007-02-28

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SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee

Owner name: CARL ZEISS SMT CO., LTD.

Free format text: FORMER NAME: ZEISS CARL SMT AG

CP01 Change in the name or title of a patent holder

Address after: Germany Cohen

Patentee after: CARL ZEISS SMT GmbH

Address before: Germany Cohen

Patentee before: CARL ZEISS SMT AG

CX01 Expiry of patent term
CX01 Expiry of patent term

Granted publication date: 20090909