DE602004019142D1 - Optisches projektionssystem - Google Patents

Optisches projektionssystem

Info

Publication number
DE602004019142D1
DE602004019142D1 DE602004019142T DE602004019142T DE602004019142D1 DE 602004019142 D1 DE602004019142 D1 DE 602004019142D1 DE 602004019142 T DE602004019142 T DE 602004019142T DE 602004019142 T DE602004019142 T DE 602004019142T DE 602004019142 D1 DE602004019142 D1 DE 602004019142D1
Authority
DE
Germany
Prior art keywords
projection system
optical projection
optical
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004019142T
Other languages
German (de)
English (en)
Inventor
Hans-Juergen Rostalski
Aurelian Dodoc
Wilhelm Ulrich
Alexander Epple
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of DE602004019142D1 publication Critical patent/DE602004019142D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/34—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having four components only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602004019142T 2003-12-02 2004-11-25 Optisches projektionssystem Expired - Lifetime DE602004019142D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US52609603P 2003-12-02 2003-12-02
PCT/EP2004/013519 WO2005054956A2 (en) 2003-12-02 2004-11-25 Projection optical system

Publications (1)

Publication Number Publication Date
DE602004019142D1 true DE602004019142D1 (de) 2009-03-05

Family

ID=34652415

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004019142T Expired - Lifetime DE602004019142D1 (de) 2003-12-02 2004-11-25 Optisches projektionssystem

Country Status (7)

Country Link
US (1) US7492509B2 (enExample)
EP (2) EP2040123B9 (enExample)
JP (1) JP2007513372A (enExample)
KR (2) KR101109844B1 (enExample)
CN (1) CN100538524C (enExample)
DE (1) DE602004019142D1 (enExample)
WO (1) WO2005054956A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7492509B2 (en) 2003-12-02 2009-02-17 Carl Zeiss Smt Ag Projection optical system
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7301707B2 (en) 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
KR20070097083A (ko) * 2004-12-30 2007-10-02 칼 짜이스 에스엠테 아게 투사 광학 시스템
CN105759543A (zh) * 2014-12-17 2016-07-13 深圳市亿思达科技集团有限公司 投影光学系统及投影装置
WO2017026945A1 (en) 2015-08-13 2017-02-16 Heptagon Micro Optics Pte. Ltd. Illumination assembly for 3d data acquisition
US10247940B2 (en) 2015-12-07 2019-04-02 Asml Holding N.V. Objective lens system
CN110389429A (zh) * 2018-04-20 2019-10-29 美国奈维特公司 用于机器视觉高光学扩展量模块化变焦镜头
CN117036647B (zh) * 2023-10-10 2023-12-12 中国电建集团昆明勘测设计研究院有限公司 基于倾斜实景三维模型的地面曲面提取方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4613940A (en) * 1982-11-09 1986-09-23 International Microelectronic Products Method and structure for use in designing and building electronic systems in integrated circuits
US5969803A (en) * 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
EP1139138A4 (en) * 1999-09-29 2006-03-08 Nikon Corp PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM
DE19955984A1 (de) 1999-11-20 2001-05-23 Zeiss Carl Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende
US7187503B2 (en) * 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
JP3576961B2 (ja) * 2000-11-10 2004-10-13 キヤノン株式会社 投影露光装置及びデバイス製造方法
KR100866818B1 (ko) 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
DE10064685A1 (de) 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002323653A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
JP2002287023A (ja) * 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
JP2005512151A (ja) 2001-12-10 2005-04-28 カール・ツァイス・エスエムティー・アーゲー カタジオプトリック縮小対物レンズ
US20040075894A1 (en) 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
JP2005519332A (ja) 2002-03-01 2005-06-30 カール・ツアイス・エスエムテイ・アーゲー 屈折型投影対物レンズ
DE10229249A1 (de) * 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refraktives Projektionsobjektiv mit einer Taille
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US7154676B2 (en) * 2002-03-01 2006-12-26 Carl Zeiss Smt A.G. Very-high aperture projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
JP2004086128A (ja) * 2002-07-04 2004-03-18 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
WO2005019878A1 (de) 2003-08-01 2005-03-03 Carl Zeiss Smt Ag Optische abbildungsvorrichtung mit wenigstens einer systemblende
JP2005109286A (ja) * 2003-10-01 2005-04-21 Nikon Corp 投影光学系、露光装置、および露光方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法
US7492509B2 (en) 2003-12-02 2009-02-17 Carl Zeiss Smt Ag Projection optical system

Also Published As

Publication number Publication date
CN100538524C (zh) 2009-09-09
CN1922547A (zh) 2007-02-28
EP1690139B1 (en) 2009-01-14
WO2005054956A3 (en) 2005-11-24
KR101255854B1 (ko) 2013-04-17
EP2040123A1 (en) 2009-03-25
US7492509B2 (en) 2009-02-17
JP2007513372A (ja) 2007-05-24
EP2040123B1 (en) 2012-06-27
EP2040123B9 (en) 2012-11-14
KR20060123761A (ko) 2006-12-04
KR101109844B1 (ko) 2012-04-06
KR20100019568A (ko) 2010-02-18
US20070258152A1 (en) 2007-11-08
EP1690139A2 (en) 2006-08-16
WO2005054956A2 (en) 2005-06-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE