DE602004006051D1 - Optisches Projektionssystem - Google Patents

Optisches Projektionssystem

Info

Publication number
DE602004006051D1
DE602004006051D1 DE602004006051T DE602004006051T DE602004006051D1 DE 602004006051 D1 DE602004006051 D1 DE 602004006051D1 DE 602004006051 T DE602004006051 T DE 602004006051T DE 602004006051 T DE602004006051 T DE 602004006051T DE 602004006051 D1 DE602004006051 D1 DE 602004006051D1
Authority
DE
Germany
Prior art keywords
projection system
optical projection
optical
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004006051T
Other languages
English (en)
Other versions
DE602004006051T2 (de
Inventor
Duk Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Publication of DE602004006051D1 publication Critical patent/DE602004006051D1/de
Application granted granted Critical
Publication of DE602004006051T2 publication Critical patent/DE602004006051T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE602004006051T 2003-05-30 2004-05-28 Optisches Projektionssystem Expired - Lifetime DE602004006051T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003155292A JP3728301B2 (ja) 2003-05-30 2003-05-30 投影光学系
JP2003155292 2003-05-30

Publications (2)

Publication Number Publication Date
DE602004006051D1 true DE602004006051D1 (de) 2007-06-06
DE602004006051T2 DE602004006051T2 (de) 2007-11-22

Family

ID=33128327

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004006051T Expired - Lifetime DE602004006051T2 (de) 2003-05-30 2004-05-28 Optisches Projektionssystem

Country Status (7)

Country Link
US (1) US7006197B2 (de)
EP (1) EP1482343B1 (de)
JP (1) JP3728301B2 (de)
KR (1) KR100659245B1 (de)
CN (1) CN1297834C (de)
DE (1) DE602004006051T2 (de)
TW (1) TWI259288B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004354909A (ja) * 2003-05-30 2004-12-16 Orc Mfg Co Ltd 投影露光装置および投影露光方法
US20060158615A1 (en) * 2005-01-18 2006-07-20 Williamson David M Catadioptric 1x projection system and method
CN100459679C (zh) * 2005-11-24 2009-02-04 台达电子工业股份有限公司 用于投影设备的光机中的成像系统
JP5114061B2 (ja) * 2006-04-26 2013-01-09 株式会社オーク製作所 投影露光装置
CN101479637B (zh) * 2006-05-05 2011-09-21 康宁股份有限公司 准远心成像透镜的畸变调谐
DE102006038455A1 (de) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
JP5090780B2 (ja) * 2007-04-26 2012-12-05 株式会社オーク製作所 露光描画装置
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
CN103105741B (zh) * 2013-01-22 2015-01-21 北京京东方光电科技有限公司 对位补偿装置及曝光装置
US9488811B2 (en) 2013-08-20 2016-11-08 Ultratech, Inc. Wynne-Dyson optical system with variable magnification
US11175487B2 (en) * 2017-06-19 2021-11-16 Suss Microtec Photonic Systems Inc. Optical distortion reduction in projection systems
CN117852663A (zh) * 2024-03-07 2024-04-09 国开启科量子技术(安徽)有限公司 离子寻址装置及离子阱量子计算机

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5159172A (en) * 1990-08-07 1992-10-27 International Business Machines Corporation Optical projection system
JPH08179217A (ja) 1994-08-19 1996-07-12 Tamarack Scient Co Inc ダイソンレンズ系
US5559629A (en) * 1994-08-19 1996-09-24 Tamarack Scientific Co., Inc. Unit magnification projection system and method
US5557469A (en) 1994-10-28 1996-09-17 Ultratech Stepper, Inc. Beamsplitter in single fold optical system and optical variable magnification method and system
US5739964A (en) * 1995-03-22 1998-04-14 Etec Systems, Inc. Magnification correction for small field scanning
US5757469A (en) * 1995-03-22 1998-05-26 Etec Systems, Inc. Scanning lithography system haing double pass Wynne-Dyson optics
US5815245A (en) * 1995-03-22 1998-09-29 Etec Systems, Inc. Scanning lithography system with opposing motion
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv

Also Published As

Publication number Publication date
EP1482343A1 (de) 2004-12-01
US20040240210A1 (en) 2004-12-02
TW200502576A (en) 2005-01-16
DE602004006051T2 (de) 2007-11-22
CN1573405A (zh) 2005-02-02
CN1297834C (zh) 2007-01-31
JP3728301B2 (ja) 2005-12-21
KR100659245B1 (ko) 2006-12-18
EP1482343B1 (de) 2007-04-25
TWI259288B (en) 2006-08-01
KR20040103458A (ko) 2004-12-08
US7006197B2 (en) 2006-02-28
JP2004354910A (ja) 2004-12-16

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Legal Events

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8364 No opposition during term of opposition