KR101109844B1 - 프로젝션 광학 시스템 - Google Patents

프로젝션 광학 시스템 Download PDF

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Publication number
KR101109844B1
KR101109844B1 KR1020107000522A KR20107000522A KR101109844B1 KR 101109844 B1 KR101109844 B1 KR 101109844B1 KR 1020107000522 A KR1020107000522 A KR 1020107000522A KR 20107000522 A KR20107000522 A KR 20107000522A KR 101109844 B1 KR101109844 B1 KR 101109844B1
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KR
South Korea
Prior art keywords
lens
optical system
refractive power
lenses
projection optical
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020107000522A
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English (en)
Korean (ko)
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KR20100019568A (ko
Inventor
한스-위르겐 로스탈스키
아우렐리안 도독
빌헬름 울리히
알렉산더 에펠
Original Assignee
칼 짜이스 에스엠티 게엠베하
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Publication of KR20100019568A publication Critical patent/KR20100019568A/ko
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Publication of KR101109844B1 publication Critical patent/KR101109844B1/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/34—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having four components only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020107000522A 2003-12-02 2004-11-25 프로젝션 광학 시스템 Expired - Fee Related KR101109844B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US52609603P 2003-12-02 2003-12-02
US60/526,096 2003-12-02
PCT/EP2004/013519 WO2005054956A2 (en) 2003-12-02 2004-11-25 Projection optical system

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020067010738A Division KR101255854B1 (ko) 2003-12-02 2004-11-25 프로젝션 광학 시스템

Publications (2)

Publication Number Publication Date
KR20100019568A KR20100019568A (ko) 2010-02-18
KR101109844B1 true KR101109844B1 (ko) 2012-04-06

Family

ID=34652415

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020067010738A Expired - Fee Related KR101255854B1 (ko) 2003-12-02 2004-11-25 프로젝션 광학 시스템
KR1020107000522A Expired - Fee Related KR101109844B1 (ko) 2003-12-02 2004-11-25 프로젝션 광학 시스템

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020067010738A Expired - Fee Related KR101255854B1 (ko) 2003-12-02 2004-11-25 프로젝션 광학 시스템

Country Status (7)

Country Link
US (1) US7492509B2 (enExample)
EP (2) EP1690139B1 (enExample)
JP (1) JP2007513372A (enExample)
KR (2) KR101255854B1 (enExample)
CN (1) CN100538524C (enExample)
DE (1) DE602004019142D1 (enExample)
WO (1) WO2005054956A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
CN100538524C (zh) 2003-12-02 2009-09-09 卡尔蔡司Smt股份有限公司 投影光学系统
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170028451A (ko) 2004-05-17 2017-03-13 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7301707B2 (en) 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
WO2006069795A2 (en) * 2004-12-30 2006-07-06 Carl Zeiss Smt Ag Projection optical system
CN105759543A (zh) * 2014-12-17 2016-07-13 深圳市亿思达科技集团有限公司 投影光学系统及投影装置
WO2017026945A1 (en) 2015-08-13 2017-02-16 Heptagon Micro Optics Pte. Ltd. Illumination assembly for 3d data acquisition
KR102047429B1 (ko) * 2015-12-07 2019-11-21 에이에스엠엘 홀딩 엔.브이. 대물렌즈 시스템
CN110673321A (zh) * 2018-04-20 2020-01-10 美国奈维特公司 用于高光学扩展量模块化变焦镜头的镜头连接件
CN117036647B (zh) * 2023-10-10 2023-12-12 中国电建集团昆明勘测设计研究院有限公司 基于倾斜实景三维模型的地面曲面提取方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0124598A1 (en) * 1982-11-09 1984-11-14 Imp, Inc. Method and structure for use in designing and building electronic systems in integrated circuits

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5969803A (en) * 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device
EP1139138A4 (en) * 1999-09-29 2006-03-08 Nikon Corp PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
DE19955984A1 (de) * 1999-11-20 2001-05-23 Zeiss Carl Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende
US7187503B2 (en) * 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
JP3576961B2 (ja) 2000-11-10 2004-10-13 キヤノン株式会社 投影露光装置及びデバイス製造方法
KR100866818B1 (ko) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002323653A (ja) * 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
JP2002287023A (ja) 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
US20040075894A1 (en) * 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
AU2002317875A1 (en) 2001-12-10 2003-06-23 Carl Zeiss Smt Ag Catadioptrical reduction lens
US7154676B2 (en) * 2002-03-01 2006-12-26 Carl Zeiss Smt A.G. Very-high aperture projection objective
DE10229249A1 (de) * 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refraktives Projektionsobjektiv mit einer Taille
WO2003075096A2 (de) 2002-03-01 2003-09-12 Carl Zeiss Smt Ag Refraktives projektionsobjektiv
US7190527B2 (en) * 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
JP2004086128A (ja) * 2002-07-04 2004-03-18 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
WO2005019878A1 (de) 2003-08-01 2005-03-03 Carl Zeiss Smt Ag Optische abbildungsvorrichtung mit wenigstens einer systemblende
JP2005109286A (ja) * 2003-10-01 2005-04-21 Nikon Corp 投影光学系、露光装置、および露光方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法
CN100538524C (zh) 2003-12-02 2009-09-09 卡尔蔡司Smt股份有限公司 投影光学系统

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0124598A1 (en) * 1982-11-09 1984-11-14 Imp, Inc. Method and structure for use in designing and building electronic systems in integrated circuits

Also Published As

Publication number Publication date
WO2005054956A2 (en) 2005-06-16
US20070258152A1 (en) 2007-11-08
US7492509B2 (en) 2009-02-17
CN100538524C (zh) 2009-09-09
EP2040123B9 (en) 2012-11-14
DE602004019142D1 (de) 2009-03-05
EP1690139B1 (en) 2009-01-14
EP2040123B1 (en) 2012-06-27
EP2040123A1 (en) 2009-03-25
EP1690139A2 (en) 2006-08-16
KR20100019568A (ko) 2010-02-18
KR101255854B1 (ko) 2013-04-17
KR20060123761A (ko) 2006-12-04
JP2007513372A (ja) 2007-05-24
WO2005054956A3 (en) 2005-11-24
CN1922547A (zh) 2007-02-28

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