JP2007507580A5 - - Google Patents

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Publication number
JP2007507580A5
JP2007507580A5 JP2006532863A JP2006532863A JP2007507580A5 JP 2007507580 A5 JP2007507580 A5 JP 2007507580A5 JP 2006532863 A JP2006532863 A JP 2006532863A JP 2006532863 A JP2006532863 A JP 2006532863A JP 2007507580 A5 JP2007507580 A5 JP 2007507580A5
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JP
Japan
Prior art keywords
photoacid generator
ionic photoacid
generator according
monomers
sulfonate ester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006532863A
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English (en)
Japanese (ja)
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JP2007507580A (ja
JP4680915B2 (ja
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Priority claimed from US10/444,124 external-priority patent/US7122294B2/en
Application filed filed Critical
Publication of JP2007507580A publication Critical patent/JP2007507580A/ja
Publication of JP2007507580A5 publication Critical patent/JP2007507580A5/ja
Application granted granted Critical
Publication of JP4680915B2 publication Critical patent/JP4680915B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2006532863A 2003-05-22 2004-05-07 過フッ素化多官能性アニオンを有する光酸発生剤 Expired - Fee Related JP4680915B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/444,124 US7122294B2 (en) 2003-05-22 2003-05-22 Photoacid generators with perfluorinated multifunctional anions
PCT/US2004/014348 WO2004107051A2 (en) 2003-05-22 2004-05-07 Photoacid generators with perfluorinated multifunctional anions

Publications (3)

Publication Number Publication Date
JP2007507580A JP2007507580A (ja) 2007-03-29
JP2007507580A5 true JP2007507580A5 (https=) 2007-06-28
JP4680915B2 JP4680915B2 (ja) 2011-05-11

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Family Applications (1)

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JP2006532863A Expired - Fee Related JP4680915B2 (ja) 2003-05-22 2004-05-07 過フッ素化多官能性アニオンを有する光酸発生剤

Country Status (6)

Country Link
US (1) US7122294B2 (https=)
EP (1) EP1625447B1 (https=)
JP (1) JP4680915B2 (https=)
KR (1) KR101070032B1 (https=)
CN (1) CN1802607B (https=)
WO (1) WO2004107051A2 (https=)

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US9551928B2 (en) * 2009-04-06 2017-01-24 Fujifilm Corporation Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith
JP5617844B2 (ja) * 2009-10-20 2014-11-05 Jsr株式会社 感放射線性樹脂組成物
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JP5618757B2 (ja) * 2010-06-29 2014-11-05 富士フイルム株式会社 半導体用レジスト組成物、並びに、この組成物を用いたレジスト膜及びパターン形成方法
KR20120001609A (ko) * 2010-06-29 2012-01-04 후지필름 가부시키가이샤 반도체용 레지스트 조성물, 및 이 조성물을 사용한 레지스트막과 패턴 형성 방법
US9156785B2 (en) 2010-11-15 2015-10-13 Rohm And Haas Electronic Materials Llc Base reactive photoacid generators and photoresists comprising same
US20120122031A1 (en) * 2010-11-15 2012-05-17 International Business Machines Corporation Photoresist composition for negative development and pattern forming method using thereof
US8614047B2 (en) 2011-08-26 2013-12-24 International Business Machines Corporation Photodecomposable bases and photoresist compositions
JP2013079232A (ja) 2011-09-30 2013-05-02 Rohm & Haas Electronic Materials Llc 光酸発生剤およびこれを含むフォトレジスト
JP6002430B2 (ja) * 2012-05-08 2016-10-05 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、化合物
US10031416B2 (en) 2013-08-07 2018-07-24 Toyo Gosei Co., Ltd. Reagent for enhancing generation of chemical species
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KR102093677B1 (ko) 2015-11-05 2020-03-26 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물, 패턴 형성 방법, 및 전자 디바이스의 제조 방법
US10831100B2 (en) * 2017-11-20 2020-11-10 Rohm And Haas Electronic Materials, Llc Iodine-containing photoacid generators and compositions comprising the same
CN109928904A (zh) 2017-11-30 2019-06-25 罗门哈斯电子材料有限责任公司 两性离子化合物和包括其的光致抗蚀剂
JP6965232B2 (ja) * 2017-11-30 2021-11-10 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC 塩およびそれを含むフォトレジスト
CN111479693B (zh) * 2017-12-13 2023-06-16 3M创新有限公司 含有三烷基硼烷络合物引发剂和光酸的光学透明粘合剂
WO2020158337A1 (ja) * 2019-01-28 2020-08-06 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
KR102888292B1 (ko) * 2020-10-30 2025-11-19 주식회사 엘지화학 술포닐플루오라이드기 함유 화합물 및 이의 제조방법
KR102828427B1 (ko) * 2020-10-30 2025-07-02 주식회사 엘지화학 변성 공액디엔계 중합체, 이의 제조방법 및 이를 포함하는 고무 조성물
US20240368000A1 (en) * 2021-06-25 2024-11-07 University Of Washington Carbon removal from seawater and other liquids using photoactive compounds
WO2023120250A1 (ja) * 2021-12-23 2023-06-29 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、及び化合物
JP7791860B2 (ja) * 2022-07-19 2025-12-24 デュポン エレクトロニック マテリアルズ インターナショナル，エルエルシー 光酸発生剤、フォトレジスト組成物及びパターン形成方法
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