JP2007505367A5 - - Google Patents
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- JP2007505367A5 JP2007505367A5 JP2006532953A JP2006532953A JP2007505367A5 JP 2007505367 A5 JP2007505367 A5 JP 2007505367A5 JP 2006532953 A JP2006532953 A JP 2006532953A JP 2006532953 A JP2006532953 A JP 2006532953A JP 2007505367 A5 JP2007505367 A5 JP 2007505367A5
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- JP
- Japan
- Prior art keywords
- segment
- sensitive layer
- radiation sensitive
- support
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 diphenyliodonium hexafluorophosphate Chemical compound 0.000 claims 10
- 230000005855 radiation Effects 0.000 claims 10
- 239000000203 mixture Substances 0.000 claims 6
- 150000003839 salts Chemical class 0.000 claims 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 4
- 230000002209 hydrophobic effect Effects 0.000 claims 4
- 239000003999 initiator Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 239000002243 precursor Substances 0.000 claims 4
- 239000006100 radiation absorber Substances 0.000 claims 4
- 239000011230 binding agent Substances 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 229920005596 polymer binder Polymers 0.000 claims 2
- 239000002491 polymer binding agent Substances 0.000 claims 2
- YBOGGLIJTSTNGC-UHFFFAOYSA-M 2-cyanoethyl(triphenyl)phosphanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCC#N)C1=CC=CC=C1 YBOGGLIJTSTNGC-UHFFFAOYSA-M 0.000 claims 1
- TVIAHRDFWXRZAP-UHFFFAOYSA-N 2-phenoxybenzenediazonium Chemical compound N#[N+]C1=CC=CC=C1OC1=CC=CC=C1 TVIAHRDFWXRZAP-UHFFFAOYSA-N 0.000 claims 1
- LUGVQQXOGHCZNN-UHFFFAOYSA-N 2-phenyliodoniobenzoate Chemical compound [O-]C(=O)C1=CC=CC=C1[I+]C1=CC=CC=C1 LUGVQQXOGHCZNN-UHFFFAOYSA-N 0.000 claims 1
- BMAFNRPGKSUBAX-UHFFFAOYSA-L 4-anilino-2-methoxybenzenediazonium [benzyl(ethenyl)-lambda4-sulfanylidene]-dioxido-oxo-lambda6-sulfane Chemical compound C(=C)S(=S(=O)([O-])[O-])CC1=CC=CC=C1.COC1=C(C=CC(=C1)NC1=CC=CC=C1)[N+]#N.COC1=C(C=CC(=C1)NC1=CC=CC=C1)[N+]#N BMAFNRPGKSUBAX-UHFFFAOYSA-L 0.000 claims 1
- GQLZYMNBOHZTNB-UHFFFAOYSA-M 4-anilino-2-methoxybenzenediazonium;hexadecyl sulfate Chemical compound C1=C([N+]#N)C(OC)=CC(NC=2C=CC=CC=2)=C1.CCCCCCCCCCCCCCCCOS([O-])(=O)=O GQLZYMNBOHZTNB-UHFFFAOYSA-M 0.000 claims 1
- GSFWUNOPQXILSI-UHFFFAOYSA-M 4-anilino-2-methoxybenzenediazonium;octyl sulfate Chemical compound CCCCCCCCOS([O-])(=O)=O.C1=C([N+]#N)C(OC)=CC(NC=2C=CC=CC=2)=C1 GSFWUNOPQXILSI-UHFFFAOYSA-M 0.000 claims 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 1
- 230000001588 bifunctional effect Effects 0.000 claims 1
- RSJLWBUYLGJOBD-UHFFFAOYSA-M diphenyliodanium;chloride Chemical group [Cl-].C=1C=CC=CC=1[I+]C1=CC=CC=C1 RSJLWBUYLGJOBD-UHFFFAOYSA-M 0.000 claims 1
- FFAOSSINTSWWDT-UHFFFAOYSA-M diphenyliodanium;octyl sulfate Chemical compound CCCCCCCCOS([O-])(=O)=O.C=1C=CC=CC=1[I+]C1=CC=CC=C1 FFAOSSINTSWWDT-UHFFFAOYSA-M 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 229920000578 graft copolymer Polymers 0.000 claims 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims 1
- 229920001600 hydrophobic polymer Polymers 0.000 claims 1
- 229910052740 iodine Inorganic materials 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- NTFQXVLCDLIZMU-UHFFFAOYSA-M octyl sulfate;triphenylsulfanium Chemical compound CCCCCCCCOS([O-])(=O)=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 NTFQXVLCDLIZMU-UHFFFAOYSA-M 0.000 claims 1
- WGNAKZGUSRVWRH-UHFFFAOYSA-N p-cresol sulfate Chemical compound CC1=CC=C(OS(O)(=O)=O)C=C1 WGNAKZGUSRVWRH-UHFFFAOYSA-N 0.000 claims 1
- KTNLYTNKBOKXRW-UHFFFAOYSA-N phenyliodanium Chemical compound [IH+]C1=CC=CC=C1 KTNLYTNKBOKXRW-UHFFFAOYSA-N 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
Claims (8)
- オニウム塩およびIR線吸収剤を含む開始剤系と；
重合可能な材料と；
ポリエチレンオキシド・セグメントを含む高分子バインダーと
を含む輻射線感受性組成物。 - 該オニウム塩が、2つの同一のまたは異なる有機置換基を備えた正荷電型超原子価ヨウ素原子を有するヨードニウム塩を含む請求項1に記載の組成物。
- 該オニウム塩が、ジフェニルヨードニウムクロリド、ジフェニルヨードニウムヘキサフルオロホスフェート、ジフェニルヨードニウムヘキサフルオロアンチモネート、ジフェニルヨードニウムオクチルスルフェート、ジフェニルヨードニウムオクチルチオスルフェート、ジフェニルヨードニウム-2-カルボキシレート、4,4'-ジクミルヨードニウムクロリド、4,4'-ジクミルヨードニウムヘキサフルオロホスフェート、4,4'-ジクミルヨードニウムp-トリルスルフェート、[4-[(2-ヒドロキシテトラデシル-オキシ]-フェニル]フェニルヨードニウムヘキサフルオロアンチモネート、N-メトキシ-α-ピシノリニウム-p-トルエンスルホネート、4-メトキシベンゼン-ジアゾニウムテトラフルオロボレート、4,4'-ビス-ドデシルフェニルヨードニウムヘキサフルオロホスフェート、2-シアノエチル-トリフェニルホスホニウムクロリド、ビス-[4-ジフェニルスルホニウムフェニル]スルフィド-ビス-ヘキサフルオロホスフェート、ビス-4-ドデシルフェニルヨードニウムヘキサフルオロアンチモネート、トリフェニルスルホニウムヘキサフルオロアンチモネート、トリフェニルスルホニウムテトラフルオロボレート、トリフェニルスルホニウムオクチルスルフェート、2-メトキシ-4-(フェニルアミノ)-ベンゼンジアゾニウムヘキサデシルスルフェート、2-メトキシ-4-(フェニルアミノ)-ベンゼンジアゾニウムビニルベンジルチオスルフェート、2-メトキシ-4-(フェニルアミノ)-ベンゼンジアゾニウムオクチルスルフェート、2-メトキシ-4-アミノフェニルジアゾニウムヘキサフルオロホスフェート、フェノキシフェニルジアゾニウムヘキサフルオロアンチモネート、またはアニリノフェニルジアゾニウムヘキサフルオロアンチモネートを含む請求項1に記載の組成物。
- 該高分子バインダーが、疎水性ポリマー主鎖と、
式：
によって表される複数のペンダント基とを含むグラフト・コポリマーである
請求項1に記載の組成物。 - 支持体と；
該支持体に塗布された、
オニウム塩およびIR線吸収剤を含む開始剤系と、
重合可能な材料と、
ポリエチレンオキシド・セグメントを含む高分子バインダーと
を含む輻射線感受性層と
を含んで成る画像形成性要素。 - 該画像形成性要素が、機上現像可能な印刷版前駆体である、請求項5に記載の画像形成性要素。
- 支持体を準備し；
該支持体上に、
キャリヤと、
オニウム塩およびIR線吸収剤を含む開始剤系と、
重合可能な材料と
ポリエチレンオキシド・セグメントを含むポリマーを含む高分子バインダーと
を含む塗膜混合物を塗布し；そして
該塗膜混合物を乾燥させることにより、該支持体上に輻射線感受性層を形成する
ことを含む
印刷版前駆体を作製する方法。 - 支持体と、
該支持体に塗布された、
オニウム塩とIR線吸収剤とを含む開始剤系、
重合可能な材料、および
ポリエチレンオキシド・セグメントを含む高分子バインダー
を含む輻射線感受性層と
を含む印刷版前駆体を準備し、
該輻射線感受性層の露光済部分が該輻射線感受性層の未露光部分よりも現像剤中で現像性が低くなるように、輻射線に該輻射線感受性層を像様露光し;そして、
該輻射線感受性層の未露光部分が印刷版前駆体から除去されるように、該像様露光済輻射線感受性層と現像剤とを接触させる
ことを含んで成る印刷版を作製する方法。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/436,506 US7368215B2 (en) | 2003-05-12 | 2003-05-12 | On-press developable IR sensitive printing plates containing an onium salt initiator system |
| PCT/US2004/014719 WO2004101280A1 (en) | 2003-05-12 | 2004-05-11 | On-press developable ir sensitive printing plates containing an onium salt initiator system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010249754A Division JP5091299B2 (ja) | 2003-05-12 | 2010-11-08 | オニウム塩開始剤系を含有する機上現像可能なｉｒ感受性印刷版 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007505367A JP2007505367A (ja) | 2007-03-08 |
| JP2007505367A5 true JP2007505367A5 (ja) | 2007-05-24 |
Family
ID=33417176
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006532953A Withdrawn JP2007505367A (ja) | 2003-05-12 | 2004-05-11 | オニウム塩開始剤系を含有する機上現像可能なｉｒ感受性印刷版 |
| JP2010249754A Expired - Lifetime JP5091299B2 (ja) | 2003-05-12 | 2010-11-08 | オニウム塩開始剤系を含有する機上現像可能なｉｒ感受性印刷版 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010249754A Expired - Lifetime JP5091299B2 (ja) | 2003-05-12 | 2010-11-08 | オニウム塩開始剤系を含有する機上現像可能なｉｒ感受性印刷版 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7368215B2 (ja) |
| EP (1) | EP1622768B1 (ja) |
| JP (2) | JP2007505367A (ja) |
| CN (1) | CN1784305B (ja) |
| WO (1) | WO2004101280A1 (ja) |
Families Citing this family (103)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4266077B2 (ja) * | 2001-03-26 | 2009-05-20 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷方法 |
| US7592128B2 (en) * | 2001-04-04 | 2009-09-22 | Eastman Kodak Company | On-press developable negative-working imageable elements |
| JP4161850B2 (ja) * | 2003-05-13 | 2008-10-08 | コニカミノルタエムジー株式会社 | 感光性組成物、感光性平版印刷版、及びその画像形成方法 |
| JP2005047181A (ja) * | 2003-07-30 | 2005-02-24 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法、平版印刷方法および平版印刷原版 |
| US7214469B2 (en) | 2003-12-26 | 2007-05-08 | Fujifilm Corporation | Lithographic printing plate precursor and lithographic printing method |
| JP4345513B2 (ja) * | 2004-02-12 | 2009-10-14 | コニカミノルタエムジー株式会社 | 感光性平版印刷版 |
| JP5089866B2 (ja) | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | 平版印刷方法 |
| JP2006181838A (ja) * | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US7189494B2 (en) * | 2005-05-26 | 2007-03-13 | Eastman Kodak Company | On-press developable imageable element comprising a tetraarylborate salt |
| DE602005005804T2 (de) * | 2005-06-21 | 2009-04-09 | Agfa Graphics N.V. | Wärmeempfindliches Bildaufzeichnungselement |
| US7153632B1 (en) | 2005-08-03 | 2006-12-26 | Eastman Kodak Company | Radiation-sensitive compositions and imageable materials |
| GB0516515D0 (en) * | 2005-08-11 | 2005-09-21 | Sun Chemical Bv | A jet ink and ink jet printing process |
| JP4675719B2 (ja) * | 2005-08-29 | 2011-04-27 | 富士フイルム株式会社 | 平版印刷方法及び平版印刷版原版 |
| US7966934B2 (en) * | 2005-11-04 | 2011-06-28 | Gary Ganghui Teng | Process for on-press developing overcoat-free lithographic printing plate |
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| WO2007091442A1 (ja) * | 2006-02-10 | 2007-08-16 | Konica Minolta Medical & Graphic, Inc. | 平版印刷版材料 |
| ATE517758T1 (de) * | 2006-03-17 | 2011-08-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithografiedruckform |
| US7910768B2 (en) | 2006-05-17 | 2011-03-22 | American Dye Source, Inc. | Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
| US7226709B1 (en) | 2006-06-20 | 2007-06-05 | Eastman Kodak Company | Digital mask-forming film and method of use |
| RU2434024C2 (ru) * | 2006-08-24 | 2011-11-20 | Америкэн Дай Сорс Инк. | Реакционноспособные полимерные частицы, поглощающие инфракрасное излучение в ближней области, способы их получения и их применение |
| US7544462B2 (en) | 2007-02-22 | 2009-06-09 | Eastman Kodak Company | Radiation-sensitive composition and elements with basic development enhancers |
| US7429445B1 (en) * | 2007-03-07 | 2008-09-30 | Eastman Kodak Company | Negative-working imageable elements and methods of use |
| US7781143B2 (en) * | 2007-05-31 | 2010-08-24 | Eastman Kodak Company | Negative-working imageable elements and methods of use |
| US7799504B2 (en) | 2007-06-05 | 2010-09-21 | Eastman Kodak Company | Mask film to form relief images and method of use |
| US8133651B2 (en) * | 2007-11-21 | 2012-03-13 | Gary Ganghui Teng | Lithographic printing plate comprising alkaline soluble and alkaline insoluble polymeric binders |
| US8084182B2 (en) | 2008-04-29 | 2011-12-27 | Eastman Kodak Company | On-press developable elements and methods of use |
| US8092984B2 (en) * | 2008-09-02 | 2012-01-10 | Gary Ganghui Teng | Lithographic printing plate having specific polymeric binders |
| US20100151385A1 (en) | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
| US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
| US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
| US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
| US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| JP5277039B2 (ja) * | 2009-03-30 | 2013-08-28 | 富士フイルム株式会社 | 平版印刷版原版およびその製版方法 |
| US8221960B2 (en) | 2009-06-03 | 2012-07-17 | Eastman Kodak Company | On-press development of imaged elements |
| US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
| US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
| US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
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| US8426104B2 (en) | 2009-10-08 | 2013-04-23 | Eastman Kodak Company | Negative-working imageable elements |
| US8936899B2 (en) | 2012-09-04 | 2015-01-20 | Eastman Kodak Company | Positive-working lithographic printing plate precursors and use |
| US20110097666A1 (en) | 2009-10-27 | 2011-04-28 | Celin Savariar-Hauck | Lithographic printing plate precursors |
| AU2010312263B2 (en) | 2009-10-29 | 2013-10-03 | Mylan Group | Gallotannic compounds for lithographic printing plate coating compositions |
| US8329383B2 (en) | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| GB201000643D0 (en) * | 2010-01-15 | 2010-03-03 | Vivacta Ltd | A method for sensing a chemical |
| US20110236832A1 (en) | 2010-03-26 | 2011-09-29 | Celin Savariar-Hauck | Lithographic processing solutions and methods of use |
| US8916156B2 (en) | 2010-07-02 | 2014-12-23 | Rembrandt Enterprises, Inc. | Isolated egg protein and egg lipid materials, and methods for producing the same |
| US8642038B2 (en) | 2010-07-02 | 2014-02-04 | Rembrandt Enterprises, Inc. | Isolated egg protein and egg lipid materials, and methods for producing the same |
| KR101841000B1 (ko) * | 2010-07-28 | 2018-03-22 | 스미또모 가가꾸 가부시키가이샤 | 포토레지스트 조성물 |
| CN101930174B (zh) * | 2010-09-17 | 2012-01-25 | 同济大学 | 一类含三苯胺为推电子基团的双光子光生酸剂及其制备方法 |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| US20120129093A1 (en) | 2010-11-18 | 2012-05-24 | Moshe Levanon | Silicate-free developer compositions |
| US8939080B2 (en) | 2010-11-18 | 2015-01-27 | Eastman Kodak Company | Methods of processing using silicate-free developer compositions |
| US8530143B2 (en) | 2010-11-18 | 2013-09-10 | Eastman Kodak Company | Silicate-free developer compositions |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| US8530142B2 (en) | 2011-03-15 | 2013-09-10 | Eastman Kodak Company | Flexographic printing plate precursor, imaging assembly, and use |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8703381B2 (en) | 2011-08-31 | 2014-04-22 | Eastman Kodak Company | Lithographic printing plate precursors for on-press development |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| JP5690696B2 (ja) * | 2011-09-28 | 2015-03-25 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US20130255515A1 (en) | 2012-03-27 | 2013-10-03 | Celin Savariar-Hauck | Positive-working lithographic printing plate precursors |
| JP5579217B2 (ja) | 2012-03-27 | 2014-08-27 | 富士フイルム株式会社 | 平版印刷版原版 |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| CN102775363B (zh) * | 2012-08-06 | 2014-10-29 | 恒昌涂料（惠阳）有限公司 | 一种聚氨酯丙烯酸酯光敏树脂低聚物及制备方法 |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| US8927197B2 (en) | 2012-11-16 | 2015-01-06 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| CN103881034B (zh) * | 2012-12-21 | 2016-03-09 | 乐凯华光印刷科技有限公司 | 一种激光热塑性纳微米颗粒及其合成方法与用其制作的平印版 |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| US8945813B2 (en) | 2013-04-18 | 2015-02-03 | Eastman Kodak Company | Mask forming imageable material and use |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| US9417524B1 (en) | 2015-03-10 | 2016-08-16 | Eastman Kodak Company | Infrared radiation-sensitive lithographic printing plate precursors |
| US20170021656A1 (en) | 2015-07-24 | 2017-01-26 | Kevin Ray | Lithographic imaging and printing with negative-working photoresponsive printing members |
| US20170217149A1 (en) | 2016-01-28 | 2017-08-03 | Eastman Kodak Company | Negatively-working lithographic printing plate precursor and method |
| US10960656B2 (en) | 2016-04-01 | 2021-03-30 | Eastman Kodak Company | Negatively-working lithographic printing plate precursor and method |
| CN106313870B (zh) | 2016-08-19 | 2018-06-15 | 浙江康尔达新材料股份有限公司 | 一种可成像涂层、热敏阴图平版印刷版及其制版方法 |
| US20180157176A1 (en) | 2016-12-02 | 2018-06-07 | Eastman Kodak Company | Lithographic printing plate precursor and use |
| EP3566099B1 (en) | 2017-01-04 | 2021-02-24 | Eastman Kodak Company | Negative-working lithographic printing plate precursor and use |
| US10828884B2 (en) | 2017-03-02 | 2020-11-10 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
| EP3644761A4 (en) | 2017-06-26 | 2021-03-24 | Michael Foods, Inc. | FRACTIONATION OF EGG YELLOW |
| US10576730B2 (en) | 2017-07-19 | 2020-03-03 | Eastman Kodak Company | Method for preparing lithographic printing plates |
| JP7319282B2 (ja) | 2018-02-16 | 2023-08-01 | ミラクロン コーポレーション | マスク要素前駆体およびレリーフ像形成システム |
| MX2020014054A (es) * | 2018-07-20 | 2021-05-27 | Illumina Inc | Composicion de resina y celdas de flujo que incluyen la misma. |
| US20200096865A1 (en) | 2018-09-21 | 2020-03-26 | Eastman Kodak Company | Lithographic printing plate precursor and color-forming composition |
| US20210078350A1 (en) | 2019-09-17 | 2021-03-18 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US11117412B2 (en) | 2019-10-01 | 2021-09-14 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
| EP3815900A1 (en) | 2019-10-31 | 2021-05-05 | Agfa Nv | A lithographic printing plate precursor and method for making hydrophobic resin particles |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| US11714354B2 (en) | 2020-03-25 | 2023-08-01 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US11760081B2 (en) | 2020-09-04 | 2023-09-19 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| CN112094365B (zh) * | 2020-09-16 | 2023-04-25 | 湖北固润科技股份有限公司 | 含红外吸收光敏剂、引发剂及链烯基醚和/或氧杂环丁烷类化合物的光固化性组合物 |
| CN116490365A (zh) | 2020-12-04 | 2023-07-25 | 伊斯曼柯达公司 | 平版印版前体和使用方法 |
| WO2022132444A1 (en) | 2020-12-17 | 2022-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and method of use |
| WO2022212032A1 (en) | 2021-04-01 | 2022-10-06 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| EP4101830A1 (en) | 2021-06-10 | 2022-12-14 | FEW Chemicals GmbH | Novel diaryliodonium salt mixtures as low molecular weight photoinitiators with minimized crystallization behavior and elevated solubility |
| US20230091079A1 (en) | 2021-07-23 | 2023-03-23 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US20230314935A1 (en) | 2022-03-03 | 2023-10-05 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US20240061337A1 (en) | 2022-08-04 | 2024-02-22 | Eastman Kodak Company | Lithographic printing plate precursors, methods of using and manufacture |
| US20240069439A1 (en) | 2022-08-12 | 2024-02-29 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4937159A (en) | 1985-11-20 | 1990-06-26 | The Mead Corporation | Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers |
| US4751102A (en) | 1987-07-27 | 1988-06-14 | The Mead Corporation | Radiation-curable ink and coating compositions containing ionic dye compounds as initiators |
| US5204222A (en) | 1988-07-16 | 1993-04-20 | Hoechst Aktiengesellschaft | Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates |
| GB9004337D0 (en) | 1990-02-27 | 1990-04-25 | Minnesota Mining & Mfg | Preparation and use of dyes |
| JPH0511439A (ja) | 1990-09-13 | 1993-01-22 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| JP2677457B2 (ja) | 1991-01-22 | 1997-11-17 | 日本ペイント株式会社 | 光重合性組成物 |
| US5369990A (en) * | 1993-04-08 | 1994-12-06 | Ford Motor Company | Remote mount air flow sensor |
| US5800965A (en) | 1996-02-29 | 1998-09-01 | Mitsubishi Chemical Corporation | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it |
| EP0931647B1 (en) * | 1998-01-23 | 2003-04-02 | Agfa-Gevaert | A heat sensitive element and a method for producing lithographic plates therewith |
| US6511782B1 (en) | 1998-01-23 | 2003-01-28 | Agfa-Gevaert | Heat sensitive element and a method for producing lithographic plates therewith |
| DE19834745A1 (de) | 1998-08-01 | 2000-02-03 | Agfa Gevaert Ag | Strahlungsempfindliches Gemisch mit IR-absorbierenden, anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial |
| JP2000309174A (ja) * | 1999-04-26 | 2000-11-07 | Fuji Photo Film Co Ltd | 平版印刷版用原版 |
| JP2001270919A (ja) | 2000-01-17 | 2001-10-02 | Toyo Gosei Kogyo Kk | 高分子化合物及びその製造方法並びに感光性組成物及びパターン形成方法 |
| US6660446B2 (en) | 2000-05-30 | 2003-12-09 | Fuji Photo Film Co., Ltd. | Heat-sensitive composition and planographic printing plate |
| JP4156784B2 (ja) | 2000-07-25 | 2008-09-24 | 富士フイルム株式会社 | ネガ型画像記録材料及び画像形成方法 |
| DE60124635T2 (de) | 2000-08-21 | 2007-09-13 | Fuji Photo Film Co., Ltd., Minami-Ashigara | Bildaufzeichnungsmaterial |
| US6482571B1 (en) | 2000-09-06 | 2002-11-19 | Gary Ganghui Teng | On-press development of thermosensitive lithographic plates |
| US6548222B2 (en) | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
| US6576401B2 (en) | 2001-09-14 | 2003-06-10 | Gary Ganghui Teng | On-press developable thermosensitive lithographic plates utilizing an onium or borate salt initiator |
| JP2002082429A (ja) | 2000-09-08 | 2002-03-22 | Fuji Photo Film Co Ltd | ネガ型画像記録材料 |
| US6824946B2 (en) | 2000-10-03 | 2004-11-30 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
| US6740470B2 (en) * | 2001-02-08 | 2004-05-25 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
| JP3856298B2 (ja) * | 2001-02-08 | 2006-12-13 | 富士フイルムホールディングス株式会社 | 平版印刷版原版 |
| JP4512281B2 (ja) | 2001-02-22 | 2010-07-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版 |
| JP2002251008A (ja) * | 2001-02-23 | 2002-09-06 | Fuji Photo Film Co Ltd | 画像記録材料 |
| US6582882B2 (en) | 2001-04-04 | 2003-06-24 | Kodak Polychrome Graphics Llc | Imageable element comprising graft polymer |
| US6899994B2 (en) * | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
| US6692890B2 (en) | 2001-04-04 | 2004-02-17 | Kodak Polychrome Graphics Llc | Substrate improvements for thermally imageable composition and methods of preparation |
| US6846614B2 (en) | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
| US6759177B2 (en) | 2001-05-17 | 2004-07-06 | Fuji Photo Film Co., Ltd. | Photosensitive composition and planographic printing plate precursor |
| JP4303898B2 (ja) * | 2001-06-05 | 2009-07-29 | 富士フイルム株式会社 | 平版印刷版用原版 |
| JP2003001957A (ja) * | 2001-06-22 | 2003-01-08 | Fuji Photo Film Co Ltd | 平版印刷版用原板 |
| JP2003084432A (ja) | 2001-09-10 | 2003-03-19 | Fuji Photo Film Co Ltd | 平版印刷版用原版 |
| US6890701B2 (en) * | 2001-09-11 | 2005-05-10 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
| JP4216494B2 (ja) * | 2001-09-21 | 2009-01-28 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP2003202671A (ja) * | 2002-01-08 | 2003-07-18 | Fuji Photo Film Co Ltd | 画像記録材料 |
| US7105270B2 (en) * | 2002-01-31 | 2006-09-12 | Fuji Photo Film Co., Ltd. | Fluoroaliphatic group-containing copolymer |
| EP1346843A1 (en) * | 2002-03-22 | 2003-09-24 | Fuji Photo Film Co., Ltd. | Image forming method |
| US6936384B2 (en) | 2002-08-01 | 2005-08-30 | Kodak Polychrome Graphics Llc | Infrared-sensitive composition containing a metallocene derivative |
-
2003
- 2003-05-12 US US10/436,506 patent/US7368215B2/en not_active Expired - Lifetime
-
2004
- 2004-05-11 JP JP2006532953A patent/JP2007505367A/ja not_active Withdrawn
- 2004-05-11 CN CN200480012496.9A patent/CN1784305B/zh not_active Expired - Lifetime
- 2004-05-11 EP EP04751887A patent/EP1622768B1/en not_active Expired - Fee Related
- 2004-05-11 WO PCT/US2004/014719 patent/WO2004101280A1/en active Application Filing
-
2010
- 2010-11-08 JP JP2010249754A patent/JP5091299B2/ja not_active Expired - Lifetime
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