JP2007505367A5 - - Google Patents
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- JP2007505367A5 JP2007505367A5 JP2006532953A JP2006532953A JP2007505367A5 JP 2007505367 A5 JP2007505367 A5 JP 2007505367A5 JP 2006532953 A JP2006532953 A JP 2006532953A JP 2006532953 A JP2006532953 A JP 2006532953A JP 2007505367 A5 JP2007505367 A5 JP 2007505367A5
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- JP
- Japan
- Prior art keywords
- segment
- sensitive layer
- radiation sensitive
- support
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 diphenyliodonium hexafluorophosphate Chemical compound 0.000 claims 10
- 230000005855 radiation Effects 0.000 claims 10
- 239000000203 mixture Substances 0.000 claims 6
- 150000003839 salts Chemical class 0.000 claims 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 4
- 230000002209 hydrophobic effect Effects 0.000 claims 4
- 239000003999 initiator Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 239000002243 precursor Substances 0.000 claims 4
- 239000006100 radiation absorber Substances 0.000 claims 4
- 239000011230 binding agent Substances 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 229920005596 polymer binder Polymers 0.000 claims 2
- 239000002491 polymer binding agent Substances 0.000 claims 2
- YBOGGLIJTSTNGC-UHFFFAOYSA-M 2-cyanoethyl(triphenyl)phosphanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCC#N)C1=CC=CC=C1 YBOGGLIJTSTNGC-UHFFFAOYSA-M 0.000 claims 1
- TVIAHRDFWXRZAP-UHFFFAOYSA-N 2-phenoxybenzenediazonium Chemical compound N#[N+]C1=CC=CC=C1OC1=CC=CC=C1 TVIAHRDFWXRZAP-UHFFFAOYSA-N 0.000 claims 1
- LUGVQQXOGHCZNN-UHFFFAOYSA-N 2-phenyliodoniobenzoate Chemical compound [O-]C(=O)C1=CC=CC=C1[I+]C1=CC=CC=C1 LUGVQQXOGHCZNN-UHFFFAOYSA-N 0.000 claims 1
- BMAFNRPGKSUBAX-UHFFFAOYSA-L 4-anilino-2-methoxybenzenediazonium [benzyl(ethenyl)-lambda4-sulfanylidene]-dioxido-oxo-lambda6-sulfane Chemical compound C(=C)S(=S(=O)([O-])[O-])CC1=CC=CC=C1.COC1=C(C=CC(=C1)NC1=CC=CC=C1)[N+]#N.COC1=C(C=CC(=C1)NC1=CC=CC=C1)[N+]#N BMAFNRPGKSUBAX-UHFFFAOYSA-L 0.000 claims 1
- GQLZYMNBOHZTNB-UHFFFAOYSA-M 4-anilino-2-methoxybenzenediazonium;hexadecyl sulfate Chemical compound C1=C([N+]#N)C(OC)=CC(NC=2C=CC=CC=2)=C1.CCCCCCCCCCCCCCCCOS([O-])(=O)=O GQLZYMNBOHZTNB-UHFFFAOYSA-M 0.000 claims 1
- GSFWUNOPQXILSI-UHFFFAOYSA-M 4-anilino-2-methoxybenzenediazonium;octyl sulfate Chemical compound CCCCCCCCOS([O-])(=O)=O.C1=C([N+]#N)C(OC)=CC(NC=2C=CC=CC=2)=C1 GSFWUNOPQXILSI-UHFFFAOYSA-M 0.000 claims 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 1
- 230000001588 bifunctional effect Effects 0.000 claims 1
- RSJLWBUYLGJOBD-UHFFFAOYSA-M diphenyliodanium;chloride Chemical group [Cl-].C=1C=CC=CC=1[I+]C1=CC=CC=C1 RSJLWBUYLGJOBD-UHFFFAOYSA-M 0.000 claims 1
- FFAOSSINTSWWDT-UHFFFAOYSA-M diphenyliodanium;octyl sulfate Chemical compound CCCCCCCCOS([O-])(=O)=O.C=1C=CC=CC=1[I+]C1=CC=CC=C1 FFAOSSINTSWWDT-UHFFFAOYSA-M 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 229920000578 graft copolymer Polymers 0.000 claims 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims 1
- 229920001600 hydrophobic polymer Polymers 0.000 claims 1
- 229910052740 iodine Inorganic materials 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- NTFQXVLCDLIZMU-UHFFFAOYSA-M octyl sulfate;triphenylsulfanium Chemical compound CCCCCCCCOS([O-])(=O)=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 NTFQXVLCDLIZMU-UHFFFAOYSA-M 0.000 claims 1
- WGNAKZGUSRVWRH-UHFFFAOYSA-N p-cresol sulfate Chemical compound CC1=CC=C(OS(O)(=O)=O)C=C1 WGNAKZGUSRVWRH-UHFFFAOYSA-N 0.000 claims 1
- KTNLYTNKBOKXRW-UHFFFAOYSA-N phenyliodanium Chemical compound [IH+]C1=CC=CC=C1 KTNLYTNKBOKXRW-UHFFFAOYSA-N 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
Claims (8)
- オニウム塩およびIR線吸収剤を含む開始剤系と;
重合可能な材料と;
ポリエチレンオキシド・セグメントを含む高分子バインダーと
を含む輻射線感受性組成物。 - 該オニウム塩が、2つの同一のまたは異なる有機置換基を備えた正荷電型超原子価ヨウ素原子を有するヨードニウム塩を含む請求項1に記載の組成物。
- 該オニウム塩が、ジフェニルヨードニウムクロリド、ジフェニルヨードニウムヘキサフルオロホスフェート、ジフェニルヨードニウムヘキサフルオロアンチモネート、ジフェニルヨードニウムオクチルスルフェート、ジフェニルヨードニウムオクチルチオスルフェート、ジフェニルヨードニウム-2-カルボキシレート、4,4'-ジクミルヨードニウムクロリド、4,4'-ジクミルヨードニウムヘキサフルオロホスフェート、4,4'-ジクミルヨードニウムp-トリルスルフェート、[4-[(2-ヒドロキシテトラデシル-オキシ]-フェニル]フェニルヨードニウムヘキサフルオロアンチモネート、N-メトキシ-α-ピシノリニウム-p-トルエンスルホネート、4-メトキシベンゼン-ジアゾニウムテトラフルオロボレート、4,4'-ビス-ドデシルフェニルヨードニウムヘキサフルオロホスフェート、2-シアノエチル-トリフェニルホスホニウムクロリド、ビス-[4-ジフェニルスルホニウムフェニル]スルフィド-ビス-ヘキサフルオロホスフェート、ビス-4-ドデシルフェニルヨードニウムヘキサフルオロアンチモネート、トリフェニルスルホニウムヘキサフルオロアンチモネート、トリフェニルスルホニウムテトラフルオロボレート、トリフェニルスルホニウムオクチルスルフェート、2-メトキシ-4-(フェニルアミノ)-ベンゼンジアゾニウムヘキサデシルスルフェート、2-メトキシ-4-(フェニルアミノ)-ベンゼンジアゾニウムビニルベンジルチオスルフェート、2-メトキシ-4-(フェニルアミノ)-ベンゼンジアゾニウムオクチルスルフェート、2-メトキシ-4-アミノフェニルジアゾニウムヘキサフルオロホスフェート、フェノキシフェニルジアゾニウムヘキサフルオロアンチモネート、またはアニリノフェニルジアゾニウムヘキサフルオロアンチモネートを含む請求項1に記載の組成物。
- 支持体と;
該支持体に塗布された、
オニウム塩およびIR線吸収剤を含む開始剤系と、
重合可能な材料と、
ポリエチレンオキシド・セグメントを含む高分子バインダーと
を含む輻射線感受性層と
を含んで成る画像形成性要素。 - 該画像形成性要素が、機上現像可能な印刷版前駆体である、請求項5に記載の画像形成性要素。
- 支持体を準備し;
該支持体上に、
キャリヤと、
オニウム塩およびIR線吸収剤を含む開始剤系と、
重合可能な材料と
ポリエチレンオキシド・セグメントを含むポリマーを含む高分子バインダーと
を含む塗膜混合物を塗布し;そして
該塗膜混合物を乾燥させることにより、該支持体上に輻射線感受性層を形成する
ことを含む
印刷版前駆体を作製する方法。 - 支持体と、
該支持体に塗布された、
オニウム塩とIR線吸収剤とを含む開始剤系、
重合可能な材料、および
ポリエチレンオキシド・セグメントを含む高分子バインダー
を含む輻射線感受性層と
を含む印刷版前駆体を準備し、
該輻射線感受性層の露光済部分が該輻射線感受性層の未露光部分よりも現像剤中で現像性が低くなるように、輻射線に該輻射線感受性層を像様露光し;そして、
該輻射線感受性層の未露光部分が印刷版前駆体から除去されるように、該像様露光済輻射線感受性層と現像剤とを接触させる
ことを含んで成る印刷版を作製する方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/436,506 US7368215B2 (en) | 2003-05-12 | 2003-05-12 | On-press developable IR sensitive printing plates containing an onium salt initiator system |
PCT/US2004/014719 WO2004101280A1 (en) | 2003-05-12 | 2004-05-11 | On-press developable ir sensitive printing plates containing an onium salt initiator system |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010249754A Division JP5091299B2 (ja) | 2003-05-12 | 2010-11-08 | オニウム塩開始剤系を含有する機上現像可能なir感受性印刷版 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007505367A JP2007505367A (ja) | 2007-03-08 |
JP2007505367A5 true JP2007505367A5 (ja) | 2007-05-24 |
Family
ID=33417176
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006532953A Withdrawn JP2007505367A (ja) | 2003-05-12 | 2004-05-11 | オニウム塩開始剤系を含有する機上現像可能なir感受性印刷版 |
JP2010249754A Expired - Lifetime JP5091299B2 (ja) | 2003-05-12 | 2010-11-08 | オニウム塩開始剤系を含有する機上現像可能なir感受性印刷版 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010249754A Expired - Lifetime JP5091299B2 (ja) | 2003-05-12 | 2010-11-08 | オニウム塩開始剤系を含有する機上現像可能なir感受性印刷版 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7368215B2 (ja) |
EP (1) | EP1622768B1 (ja) |
JP (2) | JP2007505367A (ja) |
CN (1) | CN1784305B (ja) |
WO (1) | WO2004101280A1 (ja) |
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- 2004-05-11 CN CN200480012496.9A patent/CN1784305B/zh not_active Expired - Lifetime
- 2004-05-11 EP EP04751887A patent/EP1622768B1/en not_active Expired - Fee Related
- 2004-05-11 WO PCT/US2004/014719 patent/WO2004101280A1/en active Application Filing
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