JP2007313641A5 - - Google Patents

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Publication number
JP2007313641A5
JP2007313641A5 JP2007138566A JP2007138566A JP2007313641A5 JP 2007313641 A5 JP2007313641 A5 JP 2007313641A5 JP 2007138566 A JP2007138566 A JP 2007138566A JP 2007138566 A JP2007138566 A JP 2007138566A JP 2007313641 A5 JP2007313641 A5 JP 2007313641A5
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JP
Japan
Prior art keywords
polymer
polishing
polymer matrix
asperity
polishing pad
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Application number
JP2007138566A
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English (en)
Japanese (ja)
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JP5346446B2 (ja
JP2007313641A (ja
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Priority claimed from US11/442,077 external-priority patent/US7445847B2/en
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Publication of JP2007313641A publication Critical patent/JP2007313641A/ja
Publication of JP2007313641A5 publication Critical patent/JP2007313641A5/ja
Application granted granted Critical
Publication of JP5346446B2 publication Critical patent/JP5346446B2/ja
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JP2007138566A 2006-05-25 2007-05-25 ケミカルメカニカル研磨パッド Active JP5346446B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/442,077 US7445847B2 (en) 2006-05-25 2006-05-25 Chemical mechanical polishing pad
US11/442,077 2006-05-25

Publications (3)

Publication Number Publication Date
JP2007313641A JP2007313641A (ja) 2007-12-06
JP2007313641A5 true JP2007313641A5 (https=) 2010-07-01
JP5346446B2 JP5346446B2 (ja) 2013-11-20

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ID=38622487

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007138566A Active JP5346446B2 (ja) 2006-05-25 2007-05-25 ケミカルメカニカル研磨パッド

Country Status (7)

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US (1) US7445847B2 (https=)
JP (1) JP5346446B2 (https=)
KR (1) KR101360622B1 (https=)
CN (1) CN100540225C (https=)
DE (1) DE102007024459A1 (https=)
FR (1) FR2901499B1 (https=)
TW (1) TWI418443B (https=)

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