JP2007311726A - 気相成長装置および気相成長方法。 - Google Patents

気相成長装置および気相成長方法。 Download PDF

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Publication number
JP2007311726A
JP2007311726A JP2006142129A JP2006142129A JP2007311726A JP 2007311726 A JP2007311726 A JP 2007311726A JP 2006142129 A JP2006142129 A JP 2006142129A JP 2006142129 A JP2006142129 A JP 2006142129A JP 2007311726 A JP2007311726 A JP 2007311726A
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Japan
Prior art keywords
vapor phase
phase growth
soaking plate
substrate
plate
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JP2006142129A
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Japanese (ja)
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JP2007311726A5 (enExample
Inventor
Osayuki Makino
修之 牧野
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Sharp Corp
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Sharp Corp
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Priority to JP2006142129A priority Critical patent/JP2007311726A/ja
Publication of JP2007311726A publication Critical patent/JP2007311726A/ja
Publication of JP2007311726A5 publication Critical patent/JP2007311726A5/ja
Pending legal-status Critical Current

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JP2006142129A 2006-05-22 2006-05-22 気相成長装置および気相成長方法。 Pending JP2007311726A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006142129A JP2007311726A (ja) 2006-05-22 2006-05-22 気相成長装置および気相成長方法。

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006142129A JP2007311726A (ja) 2006-05-22 2006-05-22 気相成長装置および気相成長方法。

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JP2007311726A true JP2007311726A (ja) 2007-11-29
JP2007311726A5 JP2007311726A5 (enExample) 2008-08-28

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JP2006142129A Pending JP2007311726A (ja) 2006-05-22 2006-05-22 気相成長装置および気相成長方法。

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015159248A (ja) * 2014-02-25 2015-09-03 東京エレクトロン株式会社 基板処理装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63119525A (ja) * 1986-11-08 1988-05-24 Hitachi Electronics Eng Co Ltd プラズマｃｖｄ装置
JPH05267277A (ja) * 1992-03-23 1993-10-15 Hitachi Electron Eng Co Ltd プラズマｃｖｄ装置
JP2004296482A (ja) * 2003-03-25 2004-10-21 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2004356624A (ja) * 2003-05-07 2004-12-16 Tokyo Electron Ltd 載置台構造及び熱処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63119525A (ja) * 1986-11-08 1988-05-24 Hitachi Electronics Eng Co Ltd プラズマｃｖｄ装置
JPH05267277A (ja) * 1992-03-23 1993-10-15 Hitachi Electron Eng Co Ltd プラズマｃｖｄ装置
JP2004296482A (ja) * 2003-03-25 2004-10-21 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2004356624A (ja) * 2003-05-07 2004-12-16 Tokyo Electron Ltd 載置台構造及び熱処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015159248A (ja) * 2014-02-25 2015-09-03 東京エレクトロン株式会社 基板処理装置

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