JP2007311726A5 - - Google Patents
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- Publication number
- JP2007311726A5 JP2007311726A5 JP2006142129A JP2006142129A JP2007311726A5 JP 2007311726 A5 JP2007311726 A5 JP 2007311726A5 JP 2006142129 A JP2006142129 A JP 2006142129A JP 2006142129 A JP2006142129 A JP 2006142129A JP 2007311726 A5 JP2007311726 A5 JP 2007311726A5
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- phase growth
- substrate
- soaking plate
- growth apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002791 soaking Methods 0.000 claims description 25
- 238000001947 vapour-phase growth Methods 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 230000000452 restraining effect Effects 0.000 claims description 6
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000000034 method Methods 0.000 claims 2
- 239000012071 phase Substances 0.000 claims 1
- 229910052594 sapphire Inorganic materials 0.000 claims 1
- 239000010980 sapphire Substances 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 description 6
- 239000008186 active pharmaceutical agent Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006142129A JP2007311726A (ja) | 2006-05-22 | 2006-05-22 | 気相成長装置および気相成長方法。 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006142129A JP2007311726A (ja) | 2006-05-22 | 2006-05-22 | 気相成長装置および気相成長方法。 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007311726A JP2007311726A (ja) | 2007-11-29 |
| JP2007311726A5 true JP2007311726A5 (enExample) | 2008-08-28 |
Family
ID=38844276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006142129A Pending JP2007311726A (ja) | 2006-05-22 | 2006-05-22 | 気相成長装置および気相成長方法。 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007311726A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6303592B2 (ja) * | 2014-02-25 | 2018-04-04 | 東京エレクトロン株式会社 | 基板処理装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63119525A (ja) * | 1986-11-08 | 1988-05-24 | Hitachi Electronics Eng Co Ltd | プラズマｃｖｄ装置 |
| JPH05267277A (ja) * | 1992-03-23 | 1993-10-15 | Hitachi Electron Eng Co Ltd | プラズマｃｖｄ装置 |
| JP4286568B2 (ja) * | 2003-03-25 | 2009-07-01 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP4238772B2 (ja) * | 2003-05-07 | 2009-03-18 | 東京エレクトロン株式会社 | 載置台構造及び熱処理装置 |
-
2006
- 2006-05-22 JP JP2006142129A patent/JP2007311726A/ja active Pending
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