JP2007281257A - Ｉｉｉ族窒化物半導体発光素子 - Google Patents

Ｉｉｉ族窒化物半導体発光素子 Download PDF

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Publication number
JP2007281257A
JP2007281257A JP2006106805A JP2006106805A JP2007281257A JP 2007281257 A JP2007281257 A JP 2007281257A JP 2006106805 A JP2006106805 A JP 2006106805A JP 2006106805 A JP2006106805 A JP 2006106805A JP 2007281257 A JP2007281257 A JP 2007281257A
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JP
Japan
Prior art keywords
layer
group iii
iii nitride
nitride semiconductor
well
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006106805A
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English (en)
Japanese (ja)
Other versions
JP2007281257A5 (enExample
Inventor
Tetsuya Taki
瀧　　哲也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyoda Gosei Co Ltd
Original Assignee
Toyoda Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyoda Gosei Co Ltd filed Critical Toyoda Gosei Co Ltd
Priority to JP2006106805A priority Critical patent/JP2007281257A/ja
Priority to CNB2007100937071A priority patent/CN100490199C/zh
Priority to US11/783,110 priority patent/US8076684B2/en
Publication of JP2007281257A publication Critical patent/JP2007281257A/ja
Publication of JP2007281257A5 publication Critical patent/JP2007281257A5/ja
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/822—Materials of the light-emitting regions
    • H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Led Devices (AREA)
JP2006106805A 2006-04-07 2006-04-07 Ｉｉｉ族窒化物半導体発光素子 Pending JP2007281257A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006106805A JP2007281257A (ja) 2006-04-07 2006-04-07 Ｉｉｉ族窒化物半導体発光素子
CNB2007100937071A CN100490199C (zh) 2006-04-07 2007-04-05 Ⅲ族氮化物半导体发光元件
US11/783,110 US8076684B2 (en) 2006-04-07 2007-04-05 Group III intride semiconductor light emitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006106805A JP2007281257A (ja) 2006-04-07 2006-04-07 Ｉｉｉ族窒化物半導体発光素子

Publications (2)

Publication Number Publication Date
JP2007281257A true JP2007281257A (ja) 2007-10-25
JP2007281257A5 JP2007281257A5 (enExample) 2010-03-11

Family

ID=38604011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006106805A Pending JP2007281257A (ja) 2006-04-07 2006-04-07 Ｉｉｉ族窒化物半導体発光素子

Country Status (3)

Country Link
US (1) US8076684B2 (enExample)
JP (1) JP2007281257A (enExample)
CN (1) CN100490199C (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9318645B2 (en) 2012-10-19 2016-04-19 Sharp Kabushiki Kaisha Nitride semiconductor light-emitting element

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US7018909B2 (en) * 2003-02-28 2006-03-28 S.O.I.Tec Silicon On Insulator Technologies S.A. Forming structures that include a relaxed or pseudo-relaxed layer on a substrate
JPWO2008155958A1 (ja) * 2007-06-15 2010-08-26 ローム株式会社 半導体発光素子及び半導体発光素子の製造方法
EP2151856A1 (en) * 2008-08-06 2010-02-10 S.O.I. TEC Silicon Relaxation of strained layers
EP2151852B1 (en) * 2008-08-06 2020-01-15 Soitec Relaxation and transfer of strained layers
EP2151861A1 (en) * 2008-08-06 2010-02-10 S.O.I. TEC Silicon Passivation of etched semiconductor structures
TWI457984B (zh) 2008-08-06 2014-10-21 Soitec Silicon On Insulator 應變層的鬆弛方法
EP2159836B1 (en) * 2008-08-25 2017-05-31 Soitec Stiffening layers for the relaxation of strained layers
US8575592B2 (en) * 2010-02-03 2013-11-05 Cree, Inc. Group III nitride based light emitting diode structures with multiple quantum well structures having varying well thicknesses
JP4940317B2 (ja) * 2010-02-25 2012-05-30 株式会社東芝 半導体発光素子及びその製造方法
EP2503603B1 (en) * 2011-03-25 2019-09-25 LG Innotek Co., Ltd. Light emitting device and method for manufacturing the same
US9287684B2 (en) * 2011-04-04 2016-03-15 Soraa Laser Diode, Inc. Laser package having multiple emitters with color wheel
CN102368519B (zh) * 2011-10-27 2016-04-20 华灿光电股份有限公司 一种提高半导体二极管多量子阱发光效率的方法
CN102412351B (zh) * 2011-10-27 2016-06-22 华灿光电股份有限公司 提高ESD的复合n-GaN层结构的制备方法
KR101747349B1 (ko) * 2011-12-07 2017-06-28 삼성전자주식회사 반도체 발광소자
JP2013145867A (ja) * 2011-12-15 2013-07-25 Hitachi Cable Ltd 窒化物半導体テンプレート及び発光ダイオード
TWI502767B (zh) * 2012-06-13 2015-10-01 Lextar Electronics Corp 半導體發光結構
CN103035805B (zh) * 2012-12-12 2016-06-01 华灿光电股份有限公司 一种发光二极管外延片及其制备方法
FR3004005B1 (fr) * 2013-03-28 2016-11-25 Commissariat Energie Atomique Diode electroluminescente a multiples puits quantiques et jonction p-n asymetrique
CN109346575B (zh) * 2018-09-03 2020-01-21 淮安澳洋顺昌光电技术有限公司 一种发光二极管外延片及其制备方法
JP6891865B2 (ja) * 2018-10-25 2021-06-18 日亜化学工業株式会社 発光素子
CN110504340B (zh) * 2019-09-18 2021-10-08 福建兆元光电有限公司 一种氮化镓发光二极管led外延片的生长方法
US20220199855A1 (en) * 2020-12-23 2022-06-23 Nichia Corporation Nitride semiconductor light emitting element
CN112951957B (zh) * 2021-03-21 2021-12-21 南通大学 一种耦合量子阱结构深紫外AlGaN基发光二极管

Citations (3)

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JPS58197784A (ja) * 1982-05-12 1983-11-17 Nec Corp 発光ダイオ−ド
JP2000196143A (ja) * 1998-12-25 2000-07-14 Sharp Corp 半導体発光素子
JP2004128443A (ja) * 2002-07-31 2004-04-22 Shin Etsu Handotai Co Ltd 発光素子及びそれを用いた照明装置

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JP2905034B2 (ja) * 1993-05-21 1999-06-14 シャープ株式会社 量子井戸構造体
DE69533511T2 (de) * 1994-07-21 2005-09-15 Matsushita Electric Industrial Co., Ltd., Kadoma Lichtemittierende halbleitervorrichtung und herstellungsverfahren
US5670798A (en) * 1995-03-29 1997-09-23 North Carolina State University Integrated heterostructures of Group III-V nitride semiconductor materials including epitaxial ohmic contact non-nitride buffer layer and methods of fabricating same
JP3543498B2 (ja) 1996-06-28 2004-07-14 豊田合成株式会社 ３族窒化物半導体発光素子
US5684309A (en) * 1996-07-11 1997-11-04 North Carolina State University Stacked quantum well aluminum indium gallium nitride light emitting diodes
US5977612A (en) * 1996-12-20 1999-11-02 Xerox Corporation Semiconductor devices constructed from crystallites
US6169298B1 (en) * 1998-08-10 2001-01-02 Kingmax Technology Inc. Semiconductor light emitting device with conductive window layer
US6459100B1 (en) * 1998-09-16 2002-10-01 Cree, Inc. Vertical geometry ingan LED
DE19952932C1 (de) * 1999-11-03 2001-05-03 Osram Opto Semiconductors Gmbh LED-Weißlichtquelle mit breitbandiger Anregung
US6504171B1 (en) * 2000-01-24 2003-01-07 Lumileds Lighting, U.S., Llc Chirped multi-well active region LED
US7323721B2 (en) * 2004-09-09 2008-01-29 Blue Photonics Inc. Monolithic multi-color, multi-quantum well semiconductor LED
US7751455B2 (en) * 2004-12-14 2010-07-06 Palo Alto Research Center Incorporated Blue and green laser diodes with gallium nitride or indium gallium nitride cladding laser structure
US9018619B2 (en) * 2006-10-09 2015-04-28 Cree, Inc. Quantum wells for light conversion

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
JPS58197784A (ja) * 1982-05-12 1983-11-17 Nec Corp 発光ダイオ−ド
JP2000196143A (ja) * 1998-12-25 2000-07-14 Sharp Corp 半導体発光素子
JP2004128443A (ja) * 2002-07-31 2004-04-22 Shin Etsu Handotai Co Ltd 発光素子及びそれを用いた照明装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9318645B2 (en) 2012-10-19 2016-04-19 Sharp Kabushiki Kaisha Nitride semiconductor light-emitting element

Also Published As

Publication number Publication date
CN101051666A (zh) 2007-10-10
US8076684B2 (en) 2011-12-13
CN100490199C (zh) 2009-05-20
US20070241353A1 (en) 2007-10-18

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