JP2007250529A5 - - Google Patents

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Publication number
JP2007250529A5
JP2007250529A5 JP2007031474A JP2007031474A JP2007250529A5 JP 2007250529 A5 JP2007250529 A5 JP 2007250529A5 JP 2007031474 A JP2007031474 A JP 2007031474A JP 2007031474 A JP2007031474 A JP 2007031474A JP 2007250529 A5 JP2007250529 A5 JP 2007250529A5
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Japan
Prior art keywords
work piece
charged particle
particle beam
directing
source
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JP2007031474A
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English (en)
Japanese (ja)
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JP5600371B2 (ja
JP2007250529A (ja
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Publication of JP2007250529A5 publication Critical patent/JP2007250529A5/ja
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JP2007031474A 2006-02-15 2007-02-13 荷電粒子ビーム処理のための保護層のスパッタリング・コーティング Active JP5600371B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77339606P 2006-02-15 2006-02-15
US60/773,396 2006-02-15

Publications (3)

Publication Number Publication Date
JP2007250529A JP2007250529A (ja) 2007-09-27
JP2007250529A5 true JP2007250529A5 (https=) 2010-04-02
JP5600371B2 JP5600371B2 (ja) 2014-10-01

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JP2007031474A Active JP5600371B2 (ja) 2006-02-15 2007-02-13 荷電粒子ビーム処理のための保護層のスパッタリング・コーティング

Country Status (3)

Country Link
US (1) US7675049B2 (https=)
EP (2) EP2209047B1 (https=)
JP (1) JP5600371B2 (https=)

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JP2008171800A (ja) 2006-10-31 2008-07-24 Fei Co 荷電粒子ビーム処理用保護層
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JP5595054B2 (ja) 2010-01-29 2014-09-24 株式会社日立ハイテクサイエンス 電子顕微鏡及び試料分析方法
US9187815B2 (en) * 2010-03-12 2015-11-17 United Technologies Corporation Thermal stabilization of coating material vapor stream
US20110223317A1 (en) * 2010-03-12 2011-09-15 United Technologies Corporation Direct thermal stabilization for coating application
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US9041793B2 (en) * 2012-05-17 2015-05-26 Fei Company Scanning microscope having an adaptive scan
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EP3249676B1 (en) * 2016-05-27 2018-10-03 FEI Company Dual-beam charged-particle microscope with in situ deposition functionality
FR3080947B1 (fr) * 2018-05-02 2021-02-19 Centre Nat Rech Scient Microscope electronique en transmission equipe d'au moins une source de jet de matiere balistique
DE102020112220B9 (de) * 2020-05-06 2022-05-25 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät zum Abtragen mindestens eines Materials von einer Materialeinheit und Anordnen des Materials an einem Objekt
US11749496B2 (en) * 2021-06-21 2023-09-05 Fei Company Protective shutter for charged particle microscope
US12308207B2 (en) * 2022-08-18 2025-05-20 Applied Materials Israel Ltd. Enhanced deposition rate by thermal isolation cover for GIS manipulator
CN120752724A (zh) 2023-03-07 2025-10-03 卡尔蔡司Smt有限责任公司 带电粒子束成像的样品制备

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