JP2007243049A5 - - Google Patents

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Publication number
JP2007243049A5
JP2007243049A5 JP2006066300A JP2006066300A JP2007243049A5 JP 2007243049 A5 JP2007243049 A5 JP 2007243049A5 JP 2006066300 A JP2006066300 A JP 2006066300A JP 2006066300 A JP2006066300 A JP 2006066300A JP 2007243049 A5 JP2007243049 A5 JP 2007243049A5
Authority
JP
Japan
Prior art keywords
insulating film
manufacturing
semiconductor device
film
gate electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006066300A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007243049A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006066300A priority Critical patent/JP2007243049A/ja
Priority claimed from JP2006066300A external-priority patent/JP2007243049A/ja
Priority to PCT/JP2007/052930 priority patent/WO2007105413A1/ja
Priority to TW096108314A priority patent/TW200742078A/zh
Publication of JP2007243049A publication Critical patent/JP2007243049A/ja
Publication of JP2007243049A5 publication Critical patent/JP2007243049A5/ja
Pending legal-status Critical Current

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JP2006066300A 2006-03-10 2006-03-10 半導体装置 Pending JP2007243049A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006066300A JP2007243049A (ja) 2006-03-10 2006-03-10 半導体装置
PCT/JP2007/052930 WO2007105413A1 (ja) 2006-03-10 2007-02-19 半導体装置
TW096108314A TW200742078A (en) 2006-03-10 2007-03-09 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006066300A JP2007243049A (ja) 2006-03-10 2006-03-10 半導体装置

Publications (2)

Publication Number Publication Date
JP2007243049A JP2007243049A (ja) 2007-09-20
JP2007243049A5 true JP2007243049A5 (enExample) 2009-03-12

Family

ID=38509251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006066300A Pending JP2007243049A (ja) 2006-03-10 2006-03-10 半導体装置

Country Status (3)

Country Link
JP (1) JP2007243049A (enExample)
TW (1) TW200742078A (enExample)
WO (1) WO2007105413A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202007018735U1 (de) 2007-06-16 2009-03-12 Gea Tuchenhagen Gmbh Doppelsitzventil
JP6169107B2 (ja) 2012-02-03 2017-07-26 ゲーエーアー トゥーヘンハーゲン ゲーエムベーハー 複座弁の座を洗浄するための方法、およびこの方法を実行するための複座弁
DE102012003892A1 (de) 2012-02-28 2013-08-29 Gea Tuchenhagen Gmbh Verfahren zur Reinigung eines Ventils
WO2013185790A1 (de) 2012-06-16 2013-12-19 Gea Tuchenhagen Gmbh Sitzreinigungsfähiges doppelsitzventil
US10833166B2 (en) 2016-07-15 2020-11-10 Rohm Co., Ltd. Semiconductor device including an MIS structure
CN114373802A (zh) * 2021-12-09 2022-04-19 广州华星光电半导体显示技术有限公司 Tft基板、液晶显示面板及显示装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3688631B2 (ja) * 2001-11-22 2005-08-31 株式会社東芝 半導体装置の製造方法
JP3776889B2 (ja) * 2003-02-07 2006-05-17 株式会社東芝 半導体装置およびその製造方法
JPWO2005038929A1 (ja) * 2003-10-15 2007-02-08 日本電気株式会社 半導体装置の製造方法
JP4526995B2 (ja) * 2004-04-09 2010-08-18 東京エレクトロン株式会社 ゲート絶縁膜の形成方法ならびにコンピュータ読取可能な記憶媒体およびコンピュータプログラム
JP2005317583A (ja) * 2004-04-27 2005-11-10 Renesas Technology Corp 半導体装置およびその製造方法

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