JP2007157696A - プラズマリアクタ内のイオン密度、イオンエネルギー分布及びイオン解離の独立した制御 - Google Patents
プラズマリアクタ内のイオン密度、イオンエネルギー分布及びイオン解離の独立した制御 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
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- H01J37/32082—Radio frequency generated discharge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
- H01J37/32165—Plural frequencies
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- H—ELECTRICITY
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- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
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- H01L21/67063—Apparatus for fluid treatment for etching
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Abstract
【解決手段】3つの各周波数の少なくとも3つのRF電源からのRF電力をリアクタ内のプラズマに結合し、少なくとも3つのRF電源の第1対の電源レベル間の比を設定することによりイオンエネルギー分布形状を設定し、少なくとも3つのRF電源の第2対の電源レベル間の比を選択することによりイオン解離及びイオン密度を設定する。3つの各周波数は、低周波周波数、高周波周波数及び超高周波周波数であって、第1対は低周波及び高周波周波数に相当し、第2対は高周波及び超高周波周波数に相当する。
【選択図】図16
Description
Claims (20)
- プラズマリアクタ内でワークピースを処理する方法であって、
3つの各周波数の少なくとも3つのRF電源からのRF電力を前記リアクタ内のプラズマに結合し、
前記少なくとも3つのRF電源の第1対の電力レベル間の比を選択することによりイオンエネルギー分布形状を設定し、
前記少なくとも3つのRF電源の第2対の電力レベル間の比を選択することによりイオン解離及びイオン密度を設定することを含む方法。 - 前記少なくとも3つの各周波数が低周波周波数、高周波周波数及び超高周波周波数を含み、前記第1対が前記低周波及び高周波周波数に相当し、前記第2対が前記高周波及び超高周波周波数に相当する請求項1記載の方法。
- 前記電源が4つのRF電源を含み、前記第1対が高周波周波数及び低周波周波数に相当し、前記第2対が超高周波周波数及び他の周波数に相当する請求項1記載の方法。
- 前記第2対が上部超高周波周波数及び低部超高周波周波数に相当する請求項3記載の方法。
- RF電力を結合する工程が前記他の周波数を誘導源電力アプリケータを通じて結合することを含む請求項3記載の方法。
- RF電力を結合する工程が前記他の周波数をトロイダルプラズマ源電力アプリケータを通じて結合することを含む請求項3記載の方法。
- RF電力を結合する工程が前記少なくとも3つの周波数を前記リアクタのウエハ支持ぺデスタルを通じて結合することを含む請求項1記載の方法。
- RF電力を結合する工程が前記低周波及び高周波周波数の電力をウエハ支持ペデスタルを通じて結合し、前記超高周波周波数の電力をリアクタのシーリングを通じて結合することを含む請求項2記載の方法。
- 前記超高周波周波数の電力を結合する工程が前記超高周波周波数の電力をシーリング電極に印加することを含む請求項8の方法。
- 前記第1対がイオン遷移周波数未満である第1周波数及び前記イオン遷移周波数超過である第2周波数を含む請求項1記載の方法。
- 前記イオンエネルギー分布を設定する工程がイオンエネルギー分布の1対のピーク間のエネルギー差を調節することを含む請求項10記載の方法。
- 前記イオンエネルギー分布を設定する工程がイオンエネルギー分布の1対のピークのうちの他方に相対する一方の近くのイオン個数を調節することを含む請求項10記載の方法。
- 前記イオンエネルギー分布を設定する工程がイオンエネルギー分布の1対のピークのうちの1つのエネルギーを調節することを含む請求項10記載の方法。
- プラズマリアクタ内でワークピースを処理する方法であって、
3つの各周波数の3つのRF電源からのRF電力及び磁界を前記リアクタ内のプラズマに結合し、
前記少なくとも3つのRF電源の第1対の電力レベル間の比を選択することによりイオンエネルギー分布形状を設定し、
前記3つのRF電源の残りの1つの電力レベルと前記磁界の強度間の比を選択することによりイオン解離及びイオン密度を設定することを含む方法。 - 前記少なくとも3つの各周波数が低周波周波数、高周波周波数及び超高周波周波数を含み、前記第1対が前記低周波及び高周波周波数に相当し、前記残りのRF電源が超高周波周波数に相当する請求項14記載の方法。
- 前記磁界が低周波磁界である請求項14記載の方法。
- RF電力を結合する工程が前記残りのRF源電力アプリケータを誘導的に結合された源電力アプリケータに結合することを含む請求項14記載の方法。
- RF電力を結合する工程が前記残りのRF電源をトロイダルプラズマ源電力アプリケータに結合することを含む請求項14記載の方法。
- RF電力を結合する工程が前記3つの周波数を前記リアクタのウエハ支持ペデスタルを通じて結合することを含む請求項14記載の方法。
- RF電力を結合する工程が低周波及び高周波周波数をウエハ支持ペデスタルを通じで結合し、超高周波周波数をリアクタのシーリングを通じて結合することを含む請求項14記載の方法。
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Also Published As
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KR20070042460A (ko) | 2007-04-23 |
US20070087455A1 (en) | 2007-04-19 |
US20070084563A1 (en) | 2007-04-19 |
US7695633B2 (en) | 2010-04-13 |
TWI376731B (en) | 2012-11-11 |
KR101322361B1 (ko) | 2013-11-05 |
CN1953635A (zh) | 2007-04-25 |
US7695983B2 (en) | 2010-04-13 |
TW200717621A (en) | 2007-05-01 |
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