JP2007152546A5 - - Google Patents

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Publication number
JP2007152546A5
JP2007152546A5 JP2006284910A JP2006284910A JP2007152546A5 JP 2007152546 A5 JP2007152546 A5 JP 2007152546A5 JP 2006284910 A JP2006284910 A JP 2006284910A JP 2006284910 A JP2006284910 A JP 2006284910A JP 2007152546 A5 JP2007152546 A5 JP 2007152546A5
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JP
Japan
Prior art keywords
layer
forming
resist mask
sacrificial layer
sacrificial
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JP2006284910A
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English (en)
Japanese (ja)
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JP4907297B2 (ja
JP2007152546A (ja
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Priority to JP2006284910A priority Critical patent/JP4907297B2/ja
Priority claimed from JP2006284910A external-priority patent/JP4907297B2/ja
Publication of JP2007152546A publication Critical patent/JP2007152546A/ja
Publication of JP2007152546A5 publication Critical patent/JP2007152546A5/ja
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Publication of JP4907297B2 publication Critical patent/JP4907297B2/ja
Expired - Fee Related legal-status Critical Current
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JP2006284910A 2005-11-11 2006-10-19 微小構造体及び微小電気機械式装置の作製方法 Expired - Fee Related JP4907297B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006284910A JP4907297B2 (ja) 2005-11-11 2006-10-19 微小構造体及び微小電気機械式装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005327538 2005-11-11
JP2005327538 2005-11-11
JP2006284910A JP4907297B2 (ja) 2005-11-11 2006-10-19 微小構造体及び微小電気機械式装置の作製方法

Publications (3)

Publication Number Publication Date
JP2007152546A JP2007152546A (ja) 2007-06-21
JP2007152546A5 true JP2007152546A5 (cg-RX-API-DMAC7.html) 2009-09-03
JP4907297B2 JP4907297B2 (ja) 2012-03-28

Family

ID=38237528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006284910A Expired - Fee Related JP4907297B2 (ja) 2005-11-11 2006-10-19 微小構造体及び微小電気機械式装置の作製方法

Country Status (1)

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JP (1) JP4907297B2 (cg-RX-API-DMAC7.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009078190A1 (ja) * 2007-12-17 2009-06-25 Toppan Printing Co., Ltd. パターン形成方法およびパターン形成体
JP5374077B2 (ja) 2008-06-16 2013-12-25 ローム株式会社 Ｍｅｍｓセンサ
JP2010098518A (ja) * 2008-10-16 2010-04-30 Rohm Co Ltd Ｍｅｍｓセンサの製造方法およびｍｅｍｓセンサ
JP2010251396A (ja) * 2009-04-13 2010-11-04 Toyota Central R&D Labs Inc 可動部分と配線路を備えている装置
JP2011005556A (ja) * 2009-06-23 2011-01-13 Semiconductor Energy Lab Co Ltd 半導体装置及びその作製方法
JP5918292B2 (ja) * 2014-03-26 2016-05-18 株式会社半導体エネルギー研究所 半導体装置
AR102056A1 (es) 2014-08-28 2017-02-01 Microdose Therapeutx Inc Inhalador de polvo seco de marea con activación de sensor de presión en miniatura

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3348786B2 (ja) * 2000-01-11 2002-11-20 日本電気株式会社 フォトマスク、パターン形成方法、半導体集積回路
JP2001277197A (ja) * 2000-03-30 2001-10-09 Seiko Epson Corp 微細構造体の製造方法
JP2002200599A (ja) * 2000-10-30 2002-07-16 Sony Corp 三次元構造体の作製方法
US7060522B2 (en) * 2001-11-07 2006-06-13 Xerox Corporation Membrane structures for micro-devices, micro-devices including same and methods for making same
JP2004012668A (ja) * 2002-06-05 2004-01-15 Nippon Telegr & Teleph Corp <Ntt> 光スイッチ装置及びその製造方法
EP1556307A1 (en) * 2002-10-24 2005-07-27 Koninklijke Philips Electronics N.V. Method for manufacturing a micro-electromechanical device and micro-electromechanical device obtained therewith

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