JP2007123333A5 - - Google Patents

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Publication number
JP2007123333A5
JP2007123333A5 JP2005309799A JP2005309799A JP2007123333A5 JP 2007123333 A5 JP2007123333 A5 JP 2007123333A5 JP 2005309799 A JP2005309799 A JP 2005309799A JP 2005309799 A JP2005309799 A JP 2005309799A JP 2007123333 A5 JP2007123333 A5 JP 2007123333A5
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JP
Japan
Prior art keywords
pyo
pxo
pattern
pitch
sin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005309799A
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English (en)
Japanese (ja)
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JP2007123333A (ja
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Publication date
Application filed filed Critical
Priority to JP2005309799A priority Critical patent/JP2007123333A/ja
Priority claimed from JP2005309799A external-priority patent/JP2007123333A/ja
Priority to US11/552,295 priority patent/US7547502B2/en
Publication of JP2007123333A publication Critical patent/JP2007123333A/ja
Publication of JP2007123333A5 publication Critical patent/JP2007123333A5/ja
Pending legal-status Critical Current

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JP2005309799A 2005-10-25 2005-10-25 露光方法 Pending JP2007123333A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005309799A JP2007123333A (ja) 2005-10-25 2005-10-25 露光方法
US11/552,295 US7547502B2 (en) 2005-10-25 2006-10-24 Exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005309799A JP2007123333A (ja) 2005-10-25 2005-10-25 露光方法

Publications (2)

Publication Number Publication Date
JP2007123333A JP2007123333A (ja) 2007-05-17
JP2007123333A5 true JP2007123333A5 (enExample) 2008-12-11

Family

ID=37985791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005309799A Pending JP2007123333A (ja) 2005-10-25 2005-10-25 露光方法

Country Status (2)

Country Link
US (1) US7547502B2 (enExample)
JP (1) JP2007123333A (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1857879A1 (en) * 2006-05-15 2007-11-21 Advanced Mask Technology Center GmbH & Co. KG An illumination system and a photolithography apparatus
US7906255B2 (en) * 2007-01-05 2011-03-15 Georgia Tech Research Corporation Photo-masks and methods of fabricating periodic optical structures
JP4635085B2 (ja) 2008-03-03 2011-02-16 株式会社東芝 半導体装置の製造方法
JP2010074026A (ja) * 2008-09-22 2010-04-02 Toshiba Corp 露光方法、及び半導体装置
JP2010199347A (ja) * 2009-02-26 2010-09-09 Canon Inc 露光方法及びデバイス製造方法
KR101087874B1 (ko) * 2009-06-29 2011-11-30 주식회사 하이닉스반도체 광학 근접 효과 보상 방법
JP5665398B2 (ja) 2009-08-10 2015-02-04 キヤノン株式会社 生成方法、作成方法、露光方法、デバイスの製造方法及びプログラム
US8556901B2 (en) 2009-12-31 2013-10-15 DePuy Synthes Products, LLC Reciprocating rasps for use in an orthopaedic surgical procedure
US8506569B2 (en) 2009-12-31 2013-08-13 DePuy Synthes Products, LLC Reciprocating rasps for use in an orthopaedic surgical procedure
JP5617256B2 (ja) * 2010-01-27 2014-11-05 株式会社ニコン 液晶表示素子の製造方法及び露光装置
JP5491272B2 (ja) * 2010-05-07 2014-05-14 キヤノン株式会社 決定方法、露光方法及びプログラム
JP2012064898A (ja) * 2010-09-17 2012-03-29 Toshiba Corp 露光方法及び半導体装置の製造方法
US8486076B2 (en) 2011-01-28 2013-07-16 DePuy Synthes Products, LLC Oscillating rasp for use in an orthopaedic surgical procedure
US8739078B2 (en) * 2012-01-18 2014-05-27 International Business Machines Corporation Near-neighbor trimming of dummy fill shapes with built-in optical proximity corrections for semiconductor applications
US20140313469A1 (en) * 2013-04-22 2014-10-23 Nec Laboratories America, Inc. RECONFIGURABLE 1xN FEW-MODE FIBER OPTICAL SWITCH BASED ON A SPATIAL LIGHT MODULATOR

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11109603A (ja) * 1997-10-06 1999-04-23 Mitsubishi Electric Corp フォトマスクおよび半導体装置の製造方法
US6534242B2 (en) * 1997-11-06 2003-03-18 Canon Kabushiki Kaisha Multiple exposure device formation
JP3323815B2 (ja) 1998-07-21 2002-09-09 キヤノン株式会社 露光方法及び露光装置
JP3768794B2 (ja) * 2000-10-13 2006-04-19 株式会社ルネサステクノロジ 半導体集積回路装置の製造方法
JP3870093B2 (ja) 2002-01-08 2007-01-17 キヤノン株式会社 露光方法及び装置
JP3977096B2 (ja) 2002-02-13 2007-09-19 キヤノン株式会社 マスク、露光方法及びデバイス製造方法
US7107573B2 (en) * 2002-04-23 2006-09-12 Canon Kabushiki Kaisha Method for setting mask pattern and illumination condition
JP3754934B2 (ja) 2002-04-23 2006-03-15 キヤノン株式会社 マスクパターン及び照明条件の設定方法
EP1450206B1 (en) * 2003-02-21 2016-04-20 Canon Kabushiki Kaisha Mask and its manufacturing method, exposure, and semiconductor device fabrication method
JP4886169B2 (ja) * 2003-02-21 2012-02-29 キヤノン株式会社 マスク及びその設計方法、露光方法、並びに、デバイス製造方法
KR101547077B1 (ko) * 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI379344B (en) * 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method

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