JP2004012932A5 - - Google Patents

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Publication number
JP2004012932A5
JP2004012932A5 JP2002167769A JP2002167769A JP2004012932A5 JP 2004012932 A5 JP2004012932 A5 JP 2004012932A5 JP 2002167769 A JP2002167769 A JP 2002167769A JP 2002167769 A JP2002167769 A JP 2002167769A JP 2004012932 A5 JP2004012932 A5 JP 2004012932A5
Authority
JP
Japan
Prior art keywords
pattern
auxiliary
mask
desired pattern
periodic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002167769A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004012932A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002167769A priority Critical patent/JP2004012932A/ja
Priority claimed from JP2002167769A external-priority patent/JP2004012932A/ja
Priority to TW091121661A priority patent/TWI315027B/zh
Priority to EP02256555A priority patent/EP1357426A3/en
Priority to US10/251,581 priority patent/US7107573B2/en
Priority to KR10-2002-0067238A priority patent/KR100533145B1/ko
Publication of JP2004012932A publication Critical patent/JP2004012932A/ja
Priority to KR1020050075017A priority patent/KR100633461B1/ko
Publication of JP2004012932A5 publication Critical patent/JP2004012932A5/ja
Pending legal-status Critical Current

Links

JP2002167769A 2002-04-23 2002-06-07 マスクの製造方法、露光方法及びデバイス製造方法 Pending JP2004012932A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2002167769A JP2004012932A (ja) 2002-06-07 2002-06-07 マスクの製造方法、露光方法及びデバイス製造方法
TW091121661A TWI315027B (en) 2002-04-23 2002-09-20 Mask designing method, and exposure method for illuminatiing a mask and exposing an object
EP02256555A EP1357426A3 (en) 2002-04-23 2002-09-20 Method for setting mask pattern and its illumination condition
US10/251,581 US7107573B2 (en) 2002-04-23 2002-09-20 Method for setting mask pattern and illumination condition
KR10-2002-0067238A KR100533145B1 (ko) 2002-04-23 2002-10-31 마스크패턴 및 그 조명조건의 설정방법
KR1020050075017A KR100633461B1 (ko) 2002-04-23 2005-08-17 마스크패턴 및 그 조명조건의 설정방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002167769A JP2004012932A (ja) 2002-06-07 2002-06-07 マスクの製造方法、露光方法及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2004012932A JP2004012932A (ja) 2004-01-15
JP2004012932A5 true JP2004012932A5 (enExample) 2005-10-13

Family

ID=30434919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002167769A Pending JP2004012932A (ja) 2002-04-23 2002-06-07 マスクの製造方法、露光方法及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2004012932A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7245354B2 (en) 2004-02-03 2007-07-17 Yuri Granik Source optimization for image fidelity and throughput
JP4483612B2 (ja) * 2005-02-09 2010-06-16 ソニー株式会社 フォトマスクの製造方法、および、半導体デバイスの製造方法
US8103977B2 (en) * 2005-04-26 2012-01-24 Renesas Electronics Corporation Semiconductor device and its manufacturing method, semiconductor manufacturing mask, and optical proximity processing method
JP4642584B2 (ja) * 2005-07-29 2011-03-02 キヤノン株式会社 マスク作成方法及び露光方法
KR101427983B1 (ko) * 2007-05-25 2014-09-23 구완회 얼라인먼트 방법 및 장치
JP5529391B2 (ja) * 2008-03-21 2014-06-25 ルネサスエレクトロニクス株式会社 ハーフトーン型位相シフトマスク、そのハーフトーン型位相シフトマスクを有する半導体装置の製造装置、およびそのハーフトーン型位相シフトマスクを用いた半導体装置の製造方法
JP5300354B2 (ja) 2008-07-11 2013-09-25 キヤノン株式会社 生成方法、原版作成方法、露光方法、デバイス製造方法及びプログラム
CN114236969B (zh) * 2021-11-12 2024-08-02 京东方科技集团股份有限公司 一种曝光检测方法及装置

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