JP2005025098A5 - - Google Patents

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Publication number
JP2005025098A5
JP2005025098A5 JP2003270205A JP2003270205A JP2005025098A5 JP 2005025098 A5 JP2005025098 A5 JP 2005025098A5 JP 2003270205 A JP2003270205 A JP 2003270205A JP 2003270205 A JP2003270205 A JP 2003270205A JP 2005025098 A5 JP2005025098 A5 JP 2005025098A5
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JP
Japan
Prior art keywords
intensity
image
light
pattern
minimum
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JP2003270205A
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English (en)
Japanese (ja)
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JP4950411B2 (ja
JP2005025098A (ja
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Priority to JP2003270205A priority Critical patent/JP4950411B2/ja
Priority claimed from JP2003270205A external-priority patent/JP4950411B2/ja
Publication of JP2005025098A publication Critical patent/JP2005025098A/ja
Publication of JP2005025098A5 publication Critical patent/JP2005025098A5/ja
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Publication of JP4950411B2 publication Critical patent/JP4950411B2/ja
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JP2003270205A 2003-07-01 2003-07-01 光学リソグラフィー用ボルテックス位相シフトマスク Expired - Lifetime JP4950411B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003270205A JP4950411B2 (ja) 2003-07-01 2003-07-01 光学リソグラフィー用ボルテックス位相シフトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003270205A JP4950411B2 (ja) 2003-07-01 2003-07-01 光学リソグラフィー用ボルテックス位相シフトマスク

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009292358A Division JP2010102354A (ja) 2009-12-24 2009-12-24 光学リソグラフィー用ボルテックス位相シフトマスク

Publications (3)

Publication Number Publication Date
JP2005025098A JP2005025098A (ja) 2005-01-27
JP2005025098A5 true JP2005025098A5 (enExample) 2010-10-07
JP4950411B2 JP4950411B2 (ja) 2012-06-13

Family

ID=34190230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003270205A Expired - Lifetime JP4950411B2 (ja) 2003-07-01 2003-07-01 光学リソグラフィー用ボルテックス位相シフトマスク

Country Status (1)

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JP (1) JP4950411B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5757413B2 (ja) * 2011-06-29 2015-07-29 大日本印刷株式会社 位相変調マスク、露光装置および露光方法
KR102688206B1 (ko) * 2017-11-16 2024-07-24 고쿠리츠다이가쿠호진 나가오카기쥬츠가가쿠다이가쿠 광 발생 장치, 광 발생 장치를 구비하는 노광 장치, 노광 시스템, 광 발생 방법, 및 노광 포토 레지스트 제조 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05249649A (ja) * 1992-03-03 1993-09-28 Fujitsu Ltd フォトマスクおよびその製造方法
JP4402195B2 (ja) * 1999-04-22 2010-01-20 キヤノン株式会社 フォトマスク、パターン形成方法及びデバイス製造方法
US6277527B1 (en) * 1999-04-29 2001-08-21 International Business Machines Corporation Method of making a twin alternating phase shift mask
JP3443377B2 (ja) * 1999-12-02 2003-09-02 聯華電子股▲分▼有限公司 ３つの異なる位相シフト領域を有する位相シフトマスクおよびその製造方法

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