JP4950411B2 - 光学リソグラフィー用ボルテックス位相シフトマスク - Google Patents

光学リソグラフィー用ボルテックス位相シフトマスク Download PDF

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Publication number
JP4950411B2
JP4950411B2 JP2003270205A JP2003270205A JP4950411B2 JP 4950411 B2 JP4950411 B2 JP 4950411B2 JP 2003270205 A JP2003270205 A JP 2003270205A JP 2003270205 A JP2003270205 A JP 2003270205A JP 4950411 B2 JP4950411 B2 JP 4950411B2
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Japan
Prior art keywords
intensity
phase shift
light
point
mask
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Japanese (ja)
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JP2005025098A5 (enExample
JP2005025098A (ja
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デイヴィッド レヴェンソン マーク
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Publication of JP2005025098A5 publication Critical patent/JP2005025098A5/ja
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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2003270205A 2003-07-01 2003-07-01 光学リソグラフィー用ボルテックス位相シフトマスク Expired - Lifetime JP4950411B2 (ja)

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JP2003270205A JP4950411B2 (ja) 2003-07-01 2003-07-01 光学リソグラフィー用ボルテックス位相シフトマスク

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JP2003270205A JP4950411B2 (ja) 2003-07-01 2003-07-01 光学リソグラフィー用ボルテックス位相シフトマスク

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JP2009292358A Division JP2010102354A (ja) 2009-12-24 2009-12-24 光学リソグラフィー用ボルテックス位相シフトマスク

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JP2005025098A JP2005025098A (ja) 2005-01-27
JP2005025098A5 JP2005025098A5 (enExample) 2010-10-07
JP4950411B2 true JP4950411B2 (ja) 2012-06-13

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI805647B (zh) * 2017-11-16 2023-06-21 國立大學法人長岡技術科學大學 光產生裝置、具備光產生裝置的曝光裝置、曝光系統、光產生方法、及曝光光阻的製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5757413B2 (ja) * 2011-06-29 2015-07-29 大日本印刷株式会社 位相変調マスク、露光装置および露光方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05249649A (ja) * 1992-03-03 1993-09-28 Fujitsu Ltd フォトマスクおよびその製造方法
JP4402195B2 (ja) * 1999-04-22 2010-01-20 キヤノン株式会社 フォトマスク、パターン形成方法及びデバイス製造方法
US6277527B1 (en) * 1999-04-29 2001-08-21 International Business Machines Corporation Method of making a twin alternating phase shift mask
JP3443377B2 (ja) * 1999-12-02 2003-09-02 聯華電子股▲分▼有限公司 ３つの異なる位相シフト領域を有する位相シフトマスクおよびその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI805647B (zh) * 2017-11-16 2023-06-21 國立大學法人長岡技術科學大學 光產生裝置、具備光產生裝置的曝光裝置、曝光系統、光產生方法、及曝光光阻的製造方法

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