JP2007110064A5 - - Google Patents

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Publication number
JP2007110064A5
JP2007110064A5 JP2006027096A JP2006027096A JP2007110064A5 JP 2007110064 A5 JP2007110064 A5 JP 2007110064A5 JP 2006027096 A JP2006027096 A JP 2006027096A JP 2006027096 A JP2006027096 A JP 2006027096A JP 2007110064 A5 JP2007110064 A5 JP 2007110064A5
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JP
Japan
Prior art keywords
laser beam
rectangular
semiconductor film
substrate
rectangle
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2006027096A
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English (en)
Japanese (ja)
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JP2007110064A (ja
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Publication date
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Priority to JP2006027096A priority Critical patent/JP2007110064A/ja
Priority claimed from JP2006027096A external-priority patent/JP2007110064A/ja
Priority to KR1020077029974A priority patent/KR100967072B1/ko
Priority to EP06797813A priority patent/EP1926131A4/en
Priority to US11/916,687 priority patent/US7833871B2/en
Priority to CN2006800229921A priority patent/CN101208778B/zh
Priority to PCT/JP2006/318006 priority patent/WO2007032322A1/ja
Priority to TW095133812A priority patent/TWI342049B/zh
Publication of JP2007110064A publication Critical patent/JP2007110064A/ja
Publication of JP2007110064A5 publication Critical patent/JP2007110064A5/ja
Priority to US12/946,051 priority patent/US8299553B2/en
Priority to US13/608,818 priority patent/US8629522B2/en
Priority to US14/138,273 priority patent/US9058994B2/en
Priority to US14/732,920 priority patent/US20150348781A1/en
Withdrawn legal-status Critical Current

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JP2006027096A 2005-09-14 2006-02-03 レーザアニール方法及び装置 Withdrawn JP2007110064A (ja)

Priority Applications (11)

Application Number Priority Date Filing Date Title
JP2006027096A JP2007110064A (ja) 2005-09-14 2006-02-03 レーザアニール方法及び装置
KR1020077029974A KR100967072B1 (ko) 2005-09-14 2006-09-12 레이저 어닐링 방법 및 장치
EP06797813A EP1926131A4 (en) 2005-09-14 2006-09-12 LASER GLOW PROCESS AND DEVICE
US11/916,687 US7833871B2 (en) 2005-09-14 2006-09-12 Laser annealing method and device
CN2006800229921A CN101208778B (zh) 2005-09-14 2006-09-12 激光退火的方法及装置
PCT/JP2006/318006 WO2007032322A1 (ja) 2005-09-14 2006-09-12 レーザアニール方法及び装置
TW095133812A TWI342049B (en) 2005-09-14 2006-09-13 Method and apparatus for laser annealing
US12/946,051 US8299553B2 (en) 2005-09-14 2010-11-15 Laser annealing method and device
US13/608,818 US8629522B2 (en) 2005-09-14 2012-09-10 Laser annealing method and device
US14/138,273 US9058994B2 (en) 2005-09-14 2013-12-23 Laser annealing method and device
US14/732,920 US20150348781A1 (en) 2005-09-14 2015-06-08 Laser annealing method and device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005266607 2005-09-14
JP2006027096A JP2007110064A (ja) 2005-09-14 2006-02-03 レーザアニール方法及び装置

Publications (2)

Publication Number Publication Date
JP2007110064A JP2007110064A (ja) 2007-04-26
JP2007110064A5 true JP2007110064A5 (enExample) 2009-03-19

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Family Applications (1)

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JP2006027096A Withdrawn JP2007110064A (ja) 2005-09-14 2006-02-03 レーザアニール方法及び装置

Country Status (7)

Country Link
US (5) US7833871B2 (enExample)
EP (1) EP1926131A4 (enExample)
JP (1) JP2007110064A (enExample)
KR (1) KR100967072B1 (enExample)
CN (1) CN101208778B (enExample)
TW (1) TWI342049B (enExample)
WO (1) WO2007032322A1 (enExample)

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