JP2007088426A - 半導体電子デバイス - Google Patents
半導体電子デバイス Download PDFInfo
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- JP2007088426A JP2007088426A JP2006193241A JP2006193241A JP2007088426A JP 2007088426 A JP2007088426 A JP 2007088426A JP 2006193241 A JP2006193241 A JP 2006193241A JP 2006193241 A JP2006193241 A JP 2006193241A JP 2007088426 A JP2007088426 A JP 2007088426A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 69
- 239000000758 substrate Substances 0.000 claims abstract description 36
- 239000002131 composite material Substances 0.000 claims abstract description 24
- -1 nitride compound Chemical class 0.000 claims abstract description 9
- 239000013078 crystal Substances 0.000 abstract description 13
- 239000000463 material Substances 0.000 abstract description 9
- 238000010030 laminating Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 249
- 230000005669 field effect Effects 0.000 description 38
- 238000000034 method Methods 0.000 description 6
- 230000015556 catabolic process Effects 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 229910052594 sapphire Inorganic materials 0.000 description 4
- 239000010980 sapphire Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 230000005533 two-dimensional electron gas Effects 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- ZSBXGIUJOOQZMP-JLNYLFASSA-N Matrine Chemical compound C1CC[C@H]2CN3C(=O)CCC[C@@H]3[C@@H]3[C@H]2N1CCC3 ZSBXGIUJOOQZMP-JLNYLFASSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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- H—ELECTRICITY
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- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
- H01L29/7787—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02439—Materials
- H01L21/02455—Group 13/15 materials
- H01L21/02458—Nitrides
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02494—Structure
- H01L21/02496—Layer structure
- H01L21/02505—Layer structure consisting of more than two layers
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02436—Intermediate layers between substrates and deposited layers
- H01L21/02494—Structure
- H01L21/02496—Layer structure
- H01L21/02505—Layer structure consisting of more than two layers
- H01L21/02507—Alternating layers, e.g. superlattice
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- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/15—Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
- H01L29/151—Compositional structures
- H01L29/152—Compositional structures with quantum effects only in vertical direction, i.e. layered structures with quantum effects solely resulting from vertical potential variation
- H01L29/155—Comprising only semiconductor materials
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L29/2003—Nitride compounds
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- H01L29/205—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys in different semiconductor regions, e.g. heterojunctions
Abstract
【解決手段】窒化物系化合物半導体を有する半導体電子デバイスにおいて、基板10上に窒化物系化合物半導体からなるバッファ層20及び半導体動作層30を順次積層してなり、前記バッファ層20は、第1の層22と第2の層23が積層された複合層を1層以上有し、第1の層22を構成する結晶材料の格子定数と第2の層23を構成する結晶材料の格子定数が0.2%以上の差を有する。
【選択図】 図1
Description
まず、本発明の実施の形態1にかかる半導体電子デバイスについて説明する。図1は、本実施の形態1にかかる半導体電子デバイスとしての電界効果トランジスタ100の構成を示す断面図である。この図に示すように、電界効果トランジスタ100は、Siからなる基板10上に窒化物系化合物半導体からなるバッファ層20、半導体動作層30を順次積層し、その上にAl/Ti/Auからなるソース電極41、Pt/Auからなるゲート電極42、Al/Ti/Auからなるドレイン電極43が形成されている。
Δa=|1−a2/a1|×100
つぎに、本発明の実施の形態2にかかる半導体電子デバイスについて説明する。図8は、本実施の形態2にかかる半導体電子デバイスとしての電界効果トランジスタ200の構成を示す断面図である。この図に示すように、電界効果トランジスタ200は、電界効果トランジスタ100の構成をもとに、バッファ層20に替えてバッファ層20Bを備え、このバッファ層20Bは、第1の層22と第2の層23が積層された複合層と半導体動作層30との間に、厚さ5nmのAlN層/厚さ30nmのGaN層(第3の層/第4の層)を交互に10回積層した超格子層26を有している。その他の他の構成は、電界効果トランジスタ100と同様である。
20 バッファ層
21 バッファ層
22 第1の層
23 第2の層
24 歪界面
25 歪導入層
26 超格子層
30 半導体動作層
31 電子走行層
32 電子供給層
33 コンタクト層
41 ソース電極
42 ゲート電極
43 ドレイン電極
Claims (10)
- 基板上にバッファ層と、窒化物系化合物半導体からなる半導体動作層とを順次積層した半導体電子デバイスにおいて、
前記バッファ層は、第1の層と第2の層が積層された複合層を1層以上有し、前記第1の層と前記第2の層との各格子定数の差は、0.2%以上であることを特徴とする半導体電子デバイス。 - 前記複合層は、前記第1の層と前記第2の層の間に、格子定数が前記第1の層の格子定数以上、前記第2の層の格子定数以下である歪導入層を有することを特徴とする請求項1に記載の半導体電子デバイス。
- 前記第1の層の厚さは、200nm以上、1000nm以下であることを特徴とする請求項1または2に記載の半導体電子デバイス。
- 前記第1の層の厚さは、600nm±所定値であり、該所定値は、前記基板の基板径に応じて決定されることを特徴とする請求項1または2に記載の半導体電子デバイス。
- 前記所定値は、前記基板径が4インチの場合、400nmであることを特徴とする請求項4に記載の半導体電子デバイス。
- 前記第2の層の厚さは、0.5nm以上、200nm以下であることを特徴とする請求項3〜5のいずれか一つに記載の半導体電子デバイス。
- 前記バッファ層は、前記複合層を4層以上有することを特徴とする請求項1〜6のいずれか一つに記載の半導体電子デバイス。
- 前記バッファ層は、前記複合層と前記半導体動作層との間に、第3の層と第4の層が交互に積層された超格子層を有することを特徴とする請求項1〜7のいずれか一つに記載の半導体電子デバイス。
- 前記第3の層と前記第4の層の厚さは、各々0.5nm以上、20nm以下であることを特徴とする請求項8に記載の半導体電子デバイス。
- 少なくとも前記第1の層および前記第2の層の成長温度は、各々900℃以上、1300℃以下であることを特徴とする請求項1〜9のいずれか一つに記載の半導体電子デバイス。
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JP2006193241A JP2007088426A (ja) | 2005-08-25 | 2006-07-13 | 半導体電子デバイス |
US11/508,921 US20070045639A1 (en) | 2005-08-25 | 2006-08-24 | Semiconductor electronic device |
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JP2005243814 | 2005-08-25 | ||
JP2006193241A JP2007088426A (ja) | 2005-08-25 | 2006-07-13 | 半導体電子デバイス |
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JP2006193241A Pending JP2007088426A (ja) | 2005-08-25 | 2006-07-13 | 半導体電子デバイス |
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JP (1) | JP2007088426A (ja) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008171842A (ja) * | 2007-01-05 | 2008-07-24 | Furukawa Electric Co Ltd:The | 半導体電子デバイス |
WO2009084431A1 (ja) * | 2007-12-27 | 2009-07-09 | Dowa Electronics Materials Co., Ltd. | 半導体材料、半導体材料の製造方法及び半導体素子 |
JP2009289956A (ja) * | 2008-05-29 | 2009-12-10 | Furukawa Electric Co Ltd:The | 半導体電子デバイス |
JP2010087192A (ja) * | 2008-09-30 | 2010-04-15 | Furukawa Electric Co Ltd:The | 半導体電子デバイスおよび半導体電子デバイスの製造方法 |
JP2010238752A (ja) * | 2009-03-30 | 2010-10-21 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
JP2010251738A (ja) * | 2009-03-27 | 2010-11-04 | Covalent Materials Corp | 窒化物半導体エピタキシャル基板 |
CN102214701A (zh) * | 2010-04-08 | 2011-10-12 | 松下电器产业株式会社 | 氮化物半导体元件 |
US8067787B2 (en) | 2008-02-07 | 2011-11-29 | The Furukawa Electric Co., Ltd | Semiconductor electronic device |
WO2012157228A1 (ja) | 2011-05-17 | 2012-11-22 | 次世代パワーデバイス技術研究組合 | 半導体素子及びその製造方法 |
JP2012256833A (ja) * | 2011-05-16 | 2012-12-27 | Toshiba Corp | 窒化物半導体素子、窒化物半導体ウェーハ及び窒化物半導体層の製造方法 |
JP2013149732A (ja) * | 2012-01-18 | 2013-08-01 | Mitsubishi Electric Corp | へテロ接合電界効果型トランジスタおよびその製造方法 |
US8860038B2 (en) | 2011-09-20 | 2014-10-14 | Furukawa Electric Co., Ltd. | Nitride semiconductor device and manufacturing method for the same |
US9287369B2 (en) | 2012-03-08 | 2016-03-15 | Kabushiki Kaisha Toshiba | Nitride semiconductor element and nitride semiconductor wafer |
TWI577044B (zh) * | 2012-02-17 | 2017-04-01 | 晶元光電股份有限公司 | 半導體裝置與半導體元件 |
JP2018516448A (ja) * | 2014-12-23 | 2018-06-21 | インテグレイテッド ソーラー | 残留歪を相殺するiii−v族材料とシリコンウェハとの間の材料界面のエピタキシャル成長方法 |
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ATE546827T1 (de) * | 2007-08-31 | 2012-03-15 | Fraunhofer Ges Forschung | Halbleiterbauelement und dessen verwendung |
JP4677499B2 (ja) * | 2008-12-15 | 2011-04-27 | Dowaエレクトロニクス株式会社 | 電子デバイス用エピタキシャル基板およびその製造方法 |
JP2010199441A (ja) * | 2009-02-26 | 2010-09-09 | Furukawa Electric Co Ltd:The | 半導体電子デバイスおよび半導体電子デバイスの製造方法 |
JP2011187623A (ja) * | 2010-03-08 | 2011-09-22 | Furukawa Electric Co Ltd:The | 半導体素子、および半導体素子の製造方法 |
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CN106257694A (zh) * | 2016-08-29 | 2016-12-28 | 华南理工大学 | 生长在铝酸镁钪衬底上的led外延片及其制备方法 |
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