JP2007073833A - 減圧乾燥装置及び基板乾燥方法 - Google Patents

減圧乾燥装置及び基板乾燥方法 Download PDF

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Publication number
JP2007073833A
JP2007073833A JP2005260835A JP2005260835A JP2007073833A JP 2007073833 A JP2007073833 A JP 2007073833A JP 2005260835 A JP2005260835 A JP 2005260835A JP 2005260835 A JP2005260835 A JP 2005260835A JP 2007073833 A JP2007073833 A JP 2007073833A
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JP
Japan
Prior art keywords
substrate
drying apparatus
support
support surface
lift plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005260835A
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English (en)
Japanese (ja)
Inventor
Takashi Kakimura
崇 柿村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP2005260835A priority Critical patent/JP2007073833A/ja
Priority to KR1020060070671A priority patent/KR100875347B1/ko
Priority to CNB2006101081815A priority patent/CN100517570C/zh
Priority to TW095131598A priority patent/TWI312857B/zh
Publication of JP2007073833A publication Critical patent/JP2007073833A/ja
Pending legal-status Critical Current

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  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2005260835A 2005-09-08 2005-09-08 減圧乾燥装置及び基板乾燥方法 Pending JP2007073833A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005260835A JP2007073833A (ja) 2005-09-08 2005-09-08 減圧乾燥装置及び基板乾燥方法
KR1020060070671A KR100875347B1 (ko) 2005-09-08 2006-07-27 감압 건조 장치 및 기판 건조 방법
CNB2006101081815A CN100517570C (zh) 2005-09-08 2006-07-31 减压干燥装置及基板干燥方法
TW095131598A TWI312857B (en) 2005-09-08 2006-08-28 Low pressure dryer and substrate drying method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005260835A JP2007073833A (ja) 2005-09-08 2005-09-08 減圧乾燥装置及び基板乾燥方法

Publications (1)

Publication Number Publication Date
JP2007073833A true JP2007073833A (ja) 2007-03-22

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ID=37858546

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JP2005260835A Pending JP2007073833A (ja) 2005-09-08 2005-09-08 減圧乾燥装置及び基板乾燥方法

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JP (1) JP2007073833A (zh)
CN (1) CN100517570C (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114688853A (zh) * 2022-04-02 2022-07-01 永新县华纬生物质能源有限公司 一种生物质颗粒燃料干燥成型设备及其使用方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103272539B (zh) 2013-05-07 2015-08-12 李光武 减压干燥制备气凝胶的方法
JP6639175B2 (ja) * 2015-09-29 2020-02-05 東京エレクトロン株式会社 乾燥装置及び乾燥処理方法
CN105783438B (zh) * 2016-03-09 2018-09-18 武汉华星光电技术有限公司 一种减压加热干燥装置
CN106111487B (zh) * 2016-06-27 2019-11-12 昆山国显光电有限公司 一种基板减压干燥系统及其干燥方法
CN107894741B (zh) * 2017-11-06 2020-03-17 西安交通大学 一种溶液环境可控的高性能薄膜制备装备
JP2021096961A (ja) * 2019-12-17 2021-06-24 東京エレクトロン株式会社 減圧乾燥装置および減圧乾燥方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6414919A (en) * 1987-07-09 1989-01-19 Dainippon Printing Co Ltd Chucking device
JPH02122741U (zh) * 1989-03-16 1990-10-09
JP2002198416A (ja) * 2000-12-27 2002-07-12 Tokyo Electron Ltd 処理装置
JP2002313895A (ja) * 2001-04-12 2002-10-25 Dainippon Screen Mfg Co Ltd 基板保持装置および基板処理装置
JP2003017402A (ja) * 2001-04-17 2003-01-17 Tokyo Electron Ltd 基板の処理方法及び基板の処理システム

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6414919A (en) * 1987-07-09 1989-01-19 Dainippon Printing Co Ltd Chucking device
JPH02122741U (zh) * 1989-03-16 1990-10-09
JP2002198416A (ja) * 2000-12-27 2002-07-12 Tokyo Electron Ltd 処理装置
JP2002313895A (ja) * 2001-04-12 2002-10-25 Dainippon Screen Mfg Co Ltd 基板保持装置および基板処理装置
JP2003017402A (ja) * 2001-04-17 2003-01-17 Tokyo Electron Ltd 基板の処理方法及び基板の処理システム

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114688853A (zh) * 2022-04-02 2022-07-01 永新县华纬生物质能源有限公司 一种生物质颗粒燃料干燥成型设备及其使用方法
CN114688853B (zh) * 2022-04-02 2023-04-25 永新县华纬生物质能源有限公司 一种生物质颗粒燃料干燥成型设备及其使用方法

Also Published As

Publication number Publication date
CN1928475A (zh) 2007-03-14
CN100517570C (zh) 2009-07-22

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