JP2007052966A - 表示装置および表示装置の製造方法 - Google Patents
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
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- 229910052782 aluminium Inorganic materials 0.000 description 2
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
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- 229910052697 platinum Inorganic materials 0.000 description 2
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
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- H—ELECTRICITY
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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Abstract
【解決手段】基板2上の各画素aに下部電極4をパターン形成する。各画素a間に、下部電極4よりも光吸収率の高い導電性材料からなる光吸収層9を備えた構成の補助配線Nを形成する。下部電極4と補助配線Nとが形成された基板2上に、下部電極4を覆う状態で有機層5を形成する。有機層5側からのレーザ光の照射により有機層5の下部に露出した光吸収層9においてレーザ光を熱変換し、光吸収層9の上部における有機層5部分を選択的に除去する。下部電極4との間に有機層5を狭持させると共に有機層5が除去された光吸収層9部分において補助配線Nに接続された上部電極6を、基板2上に形成する。
【選択図】図1
Description
図1は本第1実施形態に係る表示装置を説明するための平面模式図である。この図に示す表示装置1は、アクティブマトリックス駆動の表示装置であり、基板2上の各画素aに対応させて複数の有機電界発光素子ELを配列形成してなる。また、画素a−a間には、以下に説明するように有機電界発光素子ELに接続された補助配線Nが設けられている。
図6は、本第2実施形態に係る表示装置1’の構成を説明するための断面模式図である。この図6は、先の図1におけるA−A’断面に相当している。そして、図6(a)に示す第2実施形態の表示装置1’と、第1実施形態で説明した表示装置1との異なるところは、補助配線N’の構成にあり、他の構成は同様であることとする。
図7は、本第3実施形態に係る表示装置1”の構成を説明するための断面模式図である。この図7は、先の図1におけるA−A’断面に相当している。そして、図7(a)に示す第3実施形態の表示装置1”と、第1実施形態で説明した表示装置1との異なるところは、補助配線N”の構成にあり、他の構成は同様であることとする。
Claims (9)
- 下部電極と上部電極との間に有機層を狭持してなる有機電界発光素子を基板上に複数配列してなる表示装置において、
基板上の各画素にパターン形成された下部電極と、
前記下部電極よりも光吸収率の高い導電性材料からなる光吸収層を備え、前記基板上の画素間に設けられた補助配線と、
前記下部電極と補助配線とが形成された前記基板上に、当該下部電極を覆うと共に前記補助配線における前記光吸収層部分を露出する状態で設けられた有機層と、
前記下部電極との間に前記有機層を狭持すると共に、当該有機層から露出された前記光吸収層において前記補助配線に接続された上部電極とを備えた
ことを特徴とする表示装置。 - 請求項1記載の表示装置において、
前記補助配線は、前記光吸収層のみで構成されている
ことを特徴とする表示装置。 - 請求項1記載の表示装置において、
前記補助配線は、前記光吸収層と共に、当該光吸収層よりも導電性の高い材料からなる高導電層とを用いて構成されている
ことを特徴とする表示装置。 - 請求項3記載の表示装置において、
前記高導電層は、前記下部電極と同一材料で構成されている
ことを特徴とする表示装置。 - 請求項1記載の表示装置において、
前記基板は、前記下部電極に接続された画素回路を備える
ことを特徴とする表示装置。 - 請求項1記載の表示装置において、
前記上部電極は、光透過性を有する
ことを特徴とする表示装置。 - 下部電極と上部電極との間に有機層を狭持してなる有機電界発光素子を基板上に複数配列してなる表示装置の製造方法であって、
基板上の各画素に下部電極をパターン形成する工程と、
前記基板上の各画素間に、前記下部電極よりも光吸収率の高い導電性材料からなる光吸収層を備えた補助配線を形成する工程と、
前記下部電極と補助配線とが形成された前記基板上に、少なくとも当該下部電極を覆う状態で有機層を形成する工程と、
前記有機層側からのレーザ光の照射により当該有機層の下部に露出した前記光吸収層において当該レーザ光を熱変換し、当該光吸収層の上部における当該有機層部分を選択的に除去する工程と、
前記下部電極との間に前記有機層を狭持させると共に前記有機層が除去された前記光吸収層部分において前記補助配線に接続された上部電極を、前記基板上に形成する工程とを行う
ことを特徴とする表示装置の製造方法。 - 請求項7記載の表示装置の製造方法において、
前記レーザ光は、前記基板に対する全面に対して照射される
ことを特徴とする表示装置の製造方法。 - 請求項7記載の表示装置の製造方法において、
前記補助配線は、前記光吸収層と共に、当該光吸収層よりも導電性の高い材料からなる高導電層とを用いて構成され、
前記下部電極を形成する工程では、前記高導電層を同時に形成する
ことを特徴とする表示装置の製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005236298A JP4449857B2 (ja) | 2005-08-17 | 2005-08-17 | 表示装置の製造方法 |
US11/463,796 US7666707B2 (en) | 2005-08-17 | 2006-08-10 | Display device and method for manufacturing display device |
CN200610121207.XA CN100551177C (zh) | 2005-08-17 | 2006-08-17 | 显示装置及显示装置的制造方法 |
US12/645,635 US8120021B2 (en) | 2005-08-17 | 2009-12-23 | Display device and method for manufacturing display device |
US13/347,884 US20120104942A1 (en) | 2005-08-17 | 2012-01-11 | Display device and method for manufacturing display device |
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JP2005236298A JP4449857B2 (ja) | 2005-08-17 | 2005-08-17 | 表示装置の製造方法 |
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Publication Number | Publication Date |
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JP2007052966A true JP2007052966A (ja) | 2007-03-01 |
JP4449857B2 JP4449857B2 (ja) | 2010-04-14 |
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JP2005236298A Expired - Fee Related JP4449857B2 (ja) | 2005-08-17 | 2005-08-17 | 表示装置の製造方法 |
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US (3) | US7666707B2 (ja) |
JP (1) | JP4449857B2 (ja) |
CN (1) | CN100551177C (ja) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007103098A (ja) * | 2005-09-30 | 2007-04-19 | Seiko Epson Corp | 有機el装置の製造方法、有機el装置及び電子機器 |
JP2009295479A (ja) * | 2008-06-06 | 2009-12-17 | Sony Corp | 有機発光素子およびその製造方法ならびに表示装置 |
JP2010027210A (ja) * | 2008-07-15 | 2010-02-04 | Canon Inc | 有機発光素子の製造方法及び有機発光素子 |
JP2010538440A (ja) * | 2007-09-04 | 2010-12-09 | グローバル オーエルイーディー テクノロジー リミティド ライアビリティ カンパニー | 上面発光型oledデバイスの製造 |
KR20110112122A (ko) * | 2010-04-06 | 2011-10-12 | 삼성모바일디스플레이주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
WO2012096232A1 (ja) * | 2011-01-13 | 2012-07-19 | 株式会社カネカ | 有機el発光素子およびその製造方法 |
KR20140078357A (ko) * | 2012-12-17 | 2014-06-25 | 엘지디스플레이 주식회사 | 유기발광다이오드 표시장치의 제조 방법 |
WO2014157657A1 (ja) * | 2013-03-29 | 2014-10-02 | 大日本印刷株式会社 | 素子製造方法および素子製造装置 |
JP2015510692A (ja) * | 2012-01-23 | 2015-04-09 | テトラサン インコーポレイテッド | 金属層からのコーティングの選択的除去およびその太陽電池用途 |
JP2015222730A (ja) * | 2013-09-02 | 2015-12-10 | 大日本印刷株式会社 | トップエミッション型有機エレクトロルミネッセンス表示装置 |
KR20160051754A (ko) * | 2013-09-02 | 2016-05-11 | 다이니폰 인사츠 가부시키가이샤 | 톱 에미션형 유기 일렉트로루미네센스 표시 장치 및 그 제조 방법 |
KR20160066673A (ko) * | 2014-12-02 | 2016-06-13 | 삼성디스플레이 주식회사 | 유기발광 디스플레이 장치 및 그 제조방법 |
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2006
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- 2006-08-17 CN CN200610121207.XA patent/CN100551177C/zh not_active Expired - Fee Related
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2009
- 2009-12-23 US US12/645,635 patent/US8120021B2/en not_active Expired - Fee Related
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- 2012-01-11 US US13/347,884 patent/US20120104942A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
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JP4449857B2 (ja) | 2010-04-14 |
US7666707B2 (en) | 2010-02-23 |
US20100097411A1 (en) | 2010-04-22 |
US8120021B2 (en) | 2012-02-21 |
CN100551177C (zh) | 2009-10-14 |
US20070080356A1 (en) | 2007-04-12 |
CN1917725A (zh) | 2007-02-21 |
US20120104942A1 (en) | 2012-05-03 |
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