JP2007047756A - 光硬化性組成物、カラーフィルタ及びその製造方法 - Google Patents

光硬化性組成物、カラーフィルタ及びその製造方法 Download PDF

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Publication number
JP2007047756A
JP2007047756A JP2006177996A JP2006177996A JP2007047756A JP 2007047756 A JP2007047756 A JP 2007047756A JP 2006177996 A JP2006177996 A JP 2006177996A JP 2006177996 A JP2006177996 A JP 2006177996A JP 2007047756 A JP2007047756 A JP 2007047756A
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JP
Japan
Prior art keywords
group
photocurable composition
acid
alkali
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006177996A
Other languages
English (en)
Japanese (ja)
Inventor
Masayuki Dan
誠之 團
Kotaro Okabe
孝太郎 岡部
Tsutomu Okita
務 沖田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Electronic Materials Co Ltd
Original Assignee
Fujifilm Electronic Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials Co Ltd filed Critical Fujifilm Electronic Materials Co Ltd
Priority to JP2006177996A priority Critical patent/JP2007047756A/ja
Priority to KR1020060065433A priority patent/KR20070008448A/ko
Priority to TW095125466A priority patent/TW200708892A/zh
Publication of JP2007047756A publication Critical patent/JP2007047756A/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
JP2006177996A 2005-07-12 2006-06-28 光硬化性組成物、カラーフィルタ及びその製造方法 Withdrawn JP2007047756A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006177996A JP2007047756A (ja) 2005-07-12 2006-06-28 光硬化性組成物、カラーフィルタ及びその製造方法
KR1020060065433A KR20070008448A (ko) 2005-07-12 2006-07-12 광경화성 조성물, 컬러필터 및 그 제조방법
TW095125466A TW200708892A (en) 2005-07-12 2006-07-12 Photo curable composition, color filter and method of producing thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005203120 2005-07-12
JP2006177996A JP2007047756A (ja) 2005-07-12 2006-06-28 光硬化性組成物、カラーフィルタ及びその製造方法

Publications (1)

Publication Number Publication Date
JP2007047756A true JP2007047756A (ja) 2007-02-22

Family

ID=37850583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006177996A Withdrawn JP2007047756A (ja) 2005-07-12 2006-06-28 光硬化性組成物、カラーフィルタ及びその製造方法

Country Status (3)

Country Link
JP (1) JP2007047756A (ko)
KR (1) KR20070008448A (ko)
TW (1) TW200708892A (ko)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008209850A (ja) * 2007-02-28 2008-09-11 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
WO2009110434A1 (ja) * 2008-03-03 2009-09-11 富士フイルム株式会社 硬化性組成物、およびカラーフィルタ
JP2012521453A (ja) * 2009-03-24 2012-09-13 エボニック レーム ゲゼルシャフト ミット ベシュレンクテル ハフツング （メタ）アクリレートポリマー並びに前記ポリマーを、ポリマーに結合された紫外線開始剤として又は紫外線硬化性樹脂への添加剤として用いる使用
WO2022149510A1 (ja) * 2021-01-06 2022-07-14 富士フイルム株式会社 光吸収フィルタ、光学フィルタ、自発光表示装置、有機エレクトロルミネッセンス表示装置及び液晶表示装置、並びに、光学フィルタの製造方法
TWI817068B (zh) * 2020-12-29 2023-10-01 住華科技股份有限公司 應用著色樹脂組成物之光阻結構、彩色濾光片和顯示裝置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008209850A (ja) * 2007-02-28 2008-09-11 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
WO2009110434A1 (ja) * 2008-03-03 2009-09-11 富士フイルム株式会社 硬化性組成物、およびカラーフィルタ
JP2012521453A (ja) * 2009-03-24 2012-09-13 エボニック レーム ゲゼルシャフト ミット ベシュレンクテル ハフツング （メタ）アクリレートポリマー並びに前記ポリマーを、ポリマーに結合された紫外線開始剤として又は紫外線硬化性樹脂への添加剤として用いる使用
TWI817068B (zh) * 2020-12-29 2023-10-01 住華科技股份有限公司 應用著色樹脂組成物之光阻結構、彩色濾光片和顯示裝置
WO2022149510A1 (ja) * 2021-01-06 2022-07-14 富士フイルム株式会社 光吸収フィルタ、光学フィルタ、自発光表示装置、有機エレクトロルミネッセンス表示装置及び液晶表示装置、並びに、光学フィルタの製造方法

Also Published As

Publication number Publication date
KR20070008448A (ko) 2007-01-17
TW200708892A (en) 2007-03-01

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