TW200708892A - Photo curable composition, color filter and method of producing thereof - Google Patents

Photo curable composition, color filter and method of producing thereof

Info

Publication number
TW200708892A
TW200708892A TW095125466A TW95125466A TW200708892A TW 200708892 A TW200708892 A TW 200708892A TW 095125466 A TW095125466 A TW 095125466A TW 95125466 A TW95125466 A TW 95125466A TW 200708892 A TW200708892 A TW 200708892A
Authority
TW
Taiwan
Prior art keywords
color filter
curable composition
producing
photo curable
photo
Prior art date
Application number
TW095125466A
Other languages
Chinese (zh)
Inventor
Shigeyuki Dan
Kotaro Okabe
Tsutomu Okita
Original Assignee
Fujifilm Electronic Materials
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials filed Critical Fujifilm Electronic Materials
Publication of TW200708892A publication Critical patent/TW200708892A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

This invention provides a photo curable composition comprising alkali-soluble resins having photo-polymerization initiation groups in molecules and polymeric compounds, and a color filter using these compositions and a producing method thereof.
TW095125466A 2005-07-12 2006-07-12 Photo curable composition, color filter and method of producing thereof TW200708892A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005203120 2005-07-12
JP2006177996A JP2007047756A (en) 2005-07-12 2006-06-28 Photocurable composition, color filter, and method for producing same

Publications (1)

Publication Number Publication Date
TW200708892A true TW200708892A (en) 2007-03-01

Family

ID=37850583

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095125466A TW200708892A (en) 2005-07-12 2006-07-12 Photo curable composition, color filter and method of producing thereof

Country Status (3)

Country Link
JP (1) JP2007047756A (en)
KR (1) KR20070008448A (en)
TW (1) TW200708892A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4983310B2 (en) * 2007-02-28 2012-07-25 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP2010024434A (en) * 2008-03-03 2010-02-04 Fujifilm Corp Curing composition, and color filter
DE102009001775A1 (en) * 2009-03-24 2010-09-30 Evonik Röhm Gmbh (Meth) acrylate polymers and their use as polymer-bound UV initiators or addition to UV-curable resins
TWI817068B (en) * 2020-12-29 2023-10-01 住華科技股份有限公司 Photoresist structure, color filter and display device using coloring resin composition
WO2022149510A1 (en) * 2021-01-06 2022-07-14 富士フイルム株式会社 Light-absorbing filters, optical filter, self-luminescent display device, organic electroluminescent display device, liquid-crystal display device, and method for producing optical filter

Also Published As

Publication number Publication date
KR20070008448A (en) 2007-01-17
JP2007047756A (en) 2007-02-22

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