JP2007004934A - 磁気ヘッドスライダ用材料、磁気ヘッドスライダ、及び磁気ヘッドスライダ用材料の製造方法 - Google Patents
磁気ヘッドスライダ用材料、磁気ヘッドスライダ、及び磁気ヘッドスライダ用材料の製造方法 Download PDFInfo
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Abstract
【解決手段】 本発明の磁気ヘッドスライダ用材料は、アルミナ110および炭化チタン120を含む焼結体1からなる磁気ヘッドスライダ用材料であって、焼結体1の切断面におけるアルミナ結晶粒110および炭化チタン結晶粒120の占める面積のうち、結晶粒径が200nm以上350nm以下であるアルミナ結晶粒110および炭化チタン結晶粒120の占める面積比率が80%以上である。
【選択図】図1
Description
まず、本実施形態に係る磁気ヘッドスライダ用材料について説明する。本実施形態に係る磁気ヘッドスライダ用材料は、アルミナ(Al2O3)及び炭化チタン(TiC)を含む焼結体である。ここで、焼結体において、アルミナや炭化チタンはそれぞれ結晶粒を形成している。
上述した本発明に係る焼結体の実施形態のうち、アルミナ、炭化チタン及び炭素を含み、且つ、炭素を含む薄膜がアルミナ結晶粒間の粒界に存在する焼結体の構造を、図1を参照して説明する。図1は、本実施形態にかかる、アルミナ、炭化チタン及び炭素を含む焼結体1の模式断面図を示す。図1に示されるように、焼結体1において、アルミナはアルミナ結晶粒110を形成し、炭化チタンは炭化チタン結晶粒120を形成し、さらにアルミナ結晶粒110間に炭素を含む薄膜130が存在している。
続いて、本発明に係る磁気ヘッドスライダ用材料の製造方法について説明する。先ず、磁気ヘッドスライダ用材料の第1の製造方法について説明する。
次に、この磁気ヘッドスライダ用材料を用いた磁気ヘッドスライダについて図2を参照して説明する。
まず、アルミナ粉末(平均粒径0.25μm)、炭化チタン粉末(平均粒径0.3μm、炭素を0.1質量%含む)、及び炭素粉末(カーボンブラック、平均粒径14nm)を、表1に示す配合割合となるよう所定量秤量し、ボールミル中でIPA(イソプロピルアルコール;沸点82.4℃)と共に30分粉砕して混合し、その後窒素中で150℃でスプレー造粒し造粒物を得た。なお、表1に示される遊離炭素の量は、炭素粉末由来のものと、炭化チタン粉末由来のものとの合計値である。
得られた磁気ヘッドスライダ用材料の任意の5箇所からTEM観察用試料を切り出した。切り出した試料の切断面を走査型電子顕微鏡「SS−550」(島津製作所製)で観察し、SS−550の粒子解析ソフトウェアにより、アルミナ結晶粒及び炭化チタン結晶粒の平均結晶粒径を算出した。さらに、5箇所の試料間で平均した。得られたアルミナ結晶粒及び炭化チタン結晶粒のそれぞれの平均結晶粒径(μm)を表2に示す。
さらに、SS−550で観察された切断面の画像を画像処理することにより、円相当粒子径が200nm未満であるアルミナ結晶粒及び炭化チタン結晶粒の切断面に占める面積、円相当粒子径が200nm以上350nm以下であるアルミナ結晶粒及び炭化チタン結晶粒の切断面に占める面積、円相当粒子径が350nmを超えるアルミナ結晶粒及び炭化チタン結晶粒の切断面に占める面積をそれぞれ求めた。そして、アルミナ結晶粒及び炭化チタン結晶粒の切断面に占める総面積に対する各粒径範囲の面積比率(%)を算出した。さらに、5箇所の試料間で平均した。このようにして得られた各粒径範囲毎の面積比率(%)を表2に示す。
得られた磁気ヘッドスライダ用材料を20×20×1.8mm程度の切片に切り出し試験片を作製した。そして、0.1μm径のダイアモンド粒子を含むスラリーを用い、片面研磨機を用いてこの試験片を研磨した。ここで、研磨条件は、スズ皿の回転数37.5回/min、荷重2550g、オスカーモータ回転数55回/min、研磨時間10分とした。そして、研磨前後の厚みを測定し、厚みの変化を研磨時間で除することにより試験片の研磨速度を取得した。なお、研磨速度は、下記比較例1の値を100とする規格化を行い、下記の判定基準に基づいて表2に記号で示した。
○:比較例1の値に対して150%以上
×:比較例1の値に対して100%以下
島津製作所製の試験機を用い、JIS R1601(1995)の条件で上記試験片の抗折強度を測定した。抗折強度が400MPa以上の場合を、強度が十分であるとして記号「○」で表2に示し、抗折強度が400MPa未満の場合を、強度が不十分であるとして記号「×」で表2に示した。
上記試験片の電気抵抗をJIS R1637(1998)に基づいて測定した。電気抵抗が106Ω・cm以下の場合を、十分に低い電気抵抗を有しているとして記号「○」で表2に示し、電気抵抗が106Ω・cmを超える場合を、電気抵抗が高すぎるとして記号「×」で表2に示した。
アルミナ粉末、炭化チタン粉末及び炭素粉末の配合量を表1に示す割合としたこと以外は実施例1と同様にして、実施例2の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
アルミナ粉末、炭化チタン粉末及び炭素粉末の配合量を表1に示す割合としたこと以外は実施例1と同様にして、実施例3の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
平均粒径0.25μmのアルミナ粉末の代わりに、平均粒径0.30μmのアルミナ粉末を用い、平均粒径0.30μmの炭化チタン粉末(炭素を0.1質量%含む)の代わりに、平均粒径0.25μmの炭化チタン粉末(炭素を0.1質量%含む)を用いたこと以外は実施例1と同様にして、実施例4の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
平均粒径0.25μmのアルミナ粉末の代わりに、平均粒径0.30μmのアルミナ粉末を用い、平均粒径0.30μmの炭化チタン粉末(炭素を0.1質量%含む)の代わりに、平均粒径0.25μmの炭化チタン粉末(炭素を0.1質量%含む)を用いたこと以外は実施例2と同様にして、実施例5の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
平均粒径0.25μmのアルミナ粉末の代わりに、平均粒径0.30μmのアルミナ粉末を用い、平均粒径0.30μmの炭化チタン粉末(炭素を0.1質量%含む)の代わりに、平均粒径0.25μmの炭化チタン粉末(炭素を0.1質量%含む)を用いたこと以外は実施例3と同様にして、実施例6の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
実施例1において、焼結温度を1650℃としたこと以外は実施例1と同様にして、実施例7の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
実施例2において、焼結温度を1650℃としたこと以外は実施例2と同様にして、実施例8の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
実施例3において、焼結温度を1650℃としたこと以外は実施例3と同様にして、実施例9の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
アルミナ粉末、炭化チタン粉末及び炭素粉末の配合量を表1に示す割合としたこと以外は実施例1と同様にして、比較例1の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
アルミナ粉末、炭化チタン粉末及び炭素粉末の配合量を表1に示す割合としたこと以外は実施例1と同様にして、比較例2の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
実施例1において、500℃から焼結温度(1680℃)までの昇温速度を2℃/分としたこと以外は実施例1と同様にして、比較例3の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
実施例1において、焼結温度を1600℃としたこと以外は実施例1と同様にして、比較例4の磁気ヘッドスライダ用材料を得た。得られた磁気ヘッドスライダ用材料について、実施例1と同様の評価を行った。結果を表2に示す。
Claims (7)
- アルミナおよび炭化チタンを含む焼結体からなる磁気ヘッドスライダ用材料であって、
前記焼結体の切断面におけるアルミナ結晶粒および炭化チタン結晶粒の占める面積のうち、結晶粒径が200nm以上350nm以下であるアルミナ結晶粒および炭化チタン結晶粒の占める面積比率が80%以上である、磁気ヘッドスライダ用材料。 - 前記焼結体が、炭素をさらに含む、請求項1に記載の磁気ヘッドスライダ用材料。
- 前記炭素の含有量が、アルミナ、炭化チタンおよび炭素の総質量を100質量部としたときに0.4〜3.0質量部である、請求項2に記載の磁気ヘッドスライダ用材料。
- 前記焼結体が、前記アルミナ結晶粒間の粒界に炭素を含む薄膜を有する、請求項2又は3に記載の磁気ヘッドスライダ用材料。
- 前記焼結体が、チタニアをさらに含む、請求項1〜4のうちのいずれか1項に記載の磁気ヘッドスライダ用材料。
- 請求項1〜5のうちのいずれか1項に記載の磁気ヘッドスライダ用材料から作られた基板と、前記基板上に形成された、薄膜磁気ヘッドを含む積層体と、を備える、磁気ヘッドスライダ。
- アルミナ粒子、炭化チタン粒子および炭素を含む成形体を用意する工程と、
前記成形体を非酸化性雰囲気中、所定の焼結温度で焼結させて焼結体を製造する焼結工程と、を備え、
前記アルミナ粒子および前記炭化チタン粒子の平均粒径が0.35μm以下であり、且つ、前記炭素の含有量が、アルミナ粒子、炭化チタン粒子および炭素の総質量を100質量部としたときに0.4〜3.0質量部であり、
前記焼結工程において、前記焼結温度を1650℃以上とし、500℃から当該焼結温度まで昇温するときの昇温速度を5℃/分以上とする、磁気ヘッドスライダ用材料の製造方法。
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US11/429,221 US7381670B2 (en) | 2005-06-27 | 2006-05-08 | Material for magnetic head slider, magnetic head slider, and method of producing material for magnetic head slider |
CNB2006100942499A CN100399426C (zh) | 2005-06-27 | 2006-06-27 | 磁头滑块用材料、磁头滑块及磁头滑块用材料的制造方法 |
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JP2010055685A (ja) * | 2008-08-28 | 2010-03-11 | Kyocera Corp | 磁気ヘッド用基板および磁気ヘッドならびに磁気記録装置 |
US8318330B2 (en) | 2007-06-27 | 2012-11-27 | Kyocera Corporation | Magnetic read/write head substrate |
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JP5148502B2 (ja) * | 2006-11-07 | 2013-02-20 | 京セラ株式会社 | セラミック焼結体とそれを用いた磁気ヘッド用基板および磁気ヘッドならびに記録媒体駆動装置 |
JP5228850B2 (ja) * | 2008-11-28 | 2013-07-03 | Tdk株式会社 | 焼結体 |
JP5062152B2 (ja) * | 2008-11-28 | 2012-10-31 | Tdk株式会社 | 焼結体の製造方法 |
US8208222B2 (en) * | 2009-06-22 | 2012-06-26 | Seagate Technology Llc | Slider body with selective hard component removal |
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US4902651A (en) * | 1986-06-20 | 1990-02-20 | Sumitomo Special Metals, Co. | Material for magnetic head substrate member |
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JPH07315916A (ja) * | 1994-05-25 | 1995-12-05 | Tokin Corp | 薄膜ヘッド用基板材料 |
JP2554604B2 (ja) * | 1995-03-24 | 1996-11-13 | ティーディーケイ株式会社 | 磁気ヘッドスライダ用セラミック材料 |
JP2000103667A (ja) * | 1998-09-30 | 2000-04-11 | Kyocera Corp | Al2O3−TiC系焼結体及びこれを用いた薄膜磁気ヘッド用基板 |
JP2000215430A (ja) * | 1999-01-26 | 2000-08-04 | Tdk Corp | 磁気ヘッドおよびその製造方法並びに磁気ディスク装置 |
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JP4009292B2 (ja) * | 2005-01-06 | 2007-11-14 | Tdk株式会社 | 磁気ヘッドスライダ用材料、磁気ヘッドスライダ、及び磁気ヘッドスライダ用材料の製造方法 |
JP4765719B2 (ja) * | 2005-06-27 | 2011-09-07 | Tdk株式会社 | 焼結体、磁気ヘッドスライダ、及び焼結体の製造方法 |
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US8318330B2 (en) | 2007-06-27 | 2012-11-27 | Kyocera Corporation | Magnetic read/write head substrate |
JP2010055685A (ja) * | 2008-08-28 | 2010-03-11 | Kyocera Corp | 磁気ヘッド用基板および磁気ヘッドならびに磁気記録装置 |
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