JP2007001270A - 液体噴射ヘッド及びその製造方法並びに液体噴射装置 - Google Patents
液体噴射ヘッド及びその製造方法並びに液体噴射装置 Download PDFInfo
- Publication number
- JP2007001270A JP2007001270A JP2005187280A JP2005187280A JP2007001270A JP 2007001270 A JP2007001270 A JP 2007001270A JP 2005187280 A JP2005187280 A JP 2005187280A JP 2005187280 A JP2005187280 A JP 2005187280A JP 2007001270 A JP2007001270 A JP 2007001270A
- Authority
- JP
- Japan
- Prior art keywords
- lower electrode
- piezoelectric
- piezoelectric element
- piezoelectric elements
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 238000001312 dry etching Methods 0.000 claims description 9
- 238000000059 patterning Methods 0.000 claims description 7
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 10
- 230000005684 electric field Effects 0.000 description 7
- 239000012212 insulator Substances 0.000 description 7
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052741 iridium Inorganic materials 0.000 description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910001928 zirconium oxide Inorganic materials 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 1
- 208000016169 Fish-eye disease Diseases 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1635—Manufacturing processes dividing the wafer into individual chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
- B41J2002/14241—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm having a cover around the piezoelectric thin film element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14419—Manifold
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14491—Electrical connection
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
【解決手段】 液滴を噴射するノズル開口21に連通する圧力発生室12が形成された流路形成基板10上に振動板を介して設けられた下電極60、圧電体層70及び上電極80からなる圧電素子300を具備し、前記下電極60が複数の圧電素子300に亘って連続して設けられていると共に、少なくとも前記圧電素子300の間の領域の前記下電極60の端部近傍に他の領域よりも薄い薄肉部61を設ける。
【選択図】 図3
Description
かかる第1の態様では、下電極に薄肉部を設けることにより、複数の圧電素子の端部近傍の電界強度を低くすることができ、圧電素子の中央部に比べて圧電素子の歪み量を低減して、駆動時の耐久性を向上することができる。
かかる第2の態様では、下電極のパターニングを容易に行うことができると共に、圧電体層の膜質を均一化することができ、圧電素子同士で圧電特性のむらがなく、その結果吐出むらのないヘッドを提供できる。
かかる第3の態様では、下電極に切り欠き部を設けることによって、さらに複数の圧電素子の端部近傍の電界強度を低くすることができ、圧電素子の中央部に比べて圧電素子の歪み量を低減して、駆動時の耐久性を向上することができる。
かかる第4の態様では、圧電素子の下電極を圧電体層と同一幅で形成することによって、圧電素子の駆動特性を向上することができる。
かかる第5の態様では、耐久性を向上した液体噴射装置を実現できる。
かかる第6の態様では、下電極に薄肉部を容易に形成することができると共に、薄肉部と圧電体層及び上電極との位置合わせが不要となり、圧電素子の配列密度を高密度にすることができる。
かかる第7の態様では、下電極に切り欠き部を容易に形成することができると共に、切り欠き部と圧電体層及び上電極との位置合わせが不要となり、圧電素子の配列密度を高密度にすることができる。
(実施形態1)
図1は、本発明の実施形態1に係るインクジェット式記録ヘッドの分解斜視図であり、図2は、インクジェット式記録ヘッドの要部平面図であり、図3は、図2(a)のA−A´断面図及びB−B´断面図である。
以上、本発明の実施形態を説明したが、インクジェット式記録ヘッドの基本的構成は上述したものに限定されるものではない。例えば、上述した実施形態1では、下電極膜60の圧電素子300の長手方向の幅を圧力発生室12に相対向する領域内に設けるようにしたが、特にこれに限定されず、下電極膜60の幅が圧力発生室12の外側まで延設されていてもよい。このような場合であっても、下電極膜60に薄肉部61を形成することによって、複数の圧電素子300の端部近傍の実効的な電界強度を低くすることができ、圧電素子300の中央部に比べて圧電素子300の歪み量を低減し、駆動時の耐久性を向上することができる。
Claims (7)
- 液滴を噴射するノズル開口に連通する圧力発生室が形成された流路形成基板上に振動板を介して設けられた下電極、圧電体層及び上電極からなる圧電素子を具備し、
前記下電極が複数の圧電素子に亘って連続して設けられていると共に、少なくとも前記圧電素子の間の領域の前記下電極の端部近傍が、他の領域よりも薄い薄肉部となっていることを特徴とする液体噴射ヘッド。 - 請求項1において、前記下電極の前記他の領域である前記圧電素子の領域及び前記圧電素子の間の中央部が同一厚さで形成されていることを特徴とする液体噴射ヘッド。
- 請求項1又は2において、前記下電極の前記圧電素子の長手方向の幅が、複数の圧電素子に亘って同一幅で形成されていると共に、前記薄肉部の前記圧電素子に隣接する部分には、前記薄肉部と前記圧電素子の領域とを当該圧電素子の並設方向で不連続とする切り欠き部が設けられていることを特徴とする液体噴射ヘッド。
- 請求項3において、前記圧電素子の長手方向の端部の前記下電極が、前記切り欠き部の間で前記圧電体層と同一幅で設けられていることを特徴とする液体噴射ヘッド。
- 請求項1〜4の何れかの液体噴射ヘッドを具備することを特徴とする液体噴射装置。
- 流路形成基板上に振動板を介して下電極を成膜及びパターニングして、複数の圧電素子に亘って共通となる下電極を形成する工程と、前記下電極上に亘って圧電体層及び上電極を形成する工程と、前記流路形成基板の表面に直交する方向から所定角度傾斜した方向からイオンビームを照射することにより、前記上電極及び前記圧電体層を各圧力発生室毎にドライエッチングして前記下電極、前記圧電体層及び前記上電極からなる圧電素子を形成すると共に、前記圧電素子の間の領域の前記下電極の端部近傍を連続してドライエッチングすることにより、当該下電極の他の領域よりも薄い薄肉部を形成することを特徴とする液体噴射ヘッドの製造方法。
- 請求項6において、前記薄肉部を形成する工程では、前記薄肉部の前記圧電素子に隣接する部分には、前記薄肉部と前記圧電素子の領域とを当該圧電素子の並設方向で不連続とする切り欠き部を設けることを特徴とする液体噴射ヘッドの製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005187280A JP4645831B2 (ja) | 2005-06-27 | 2005-06-27 | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 |
US11/475,129 US7641324B2 (en) | 2005-06-27 | 2006-06-27 | Liquid-jet head, method of manufacturing the same, and liquid-jet apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005187280A JP4645831B2 (ja) | 2005-06-27 | 2005-06-27 | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007001270A true JP2007001270A (ja) | 2007-01-11 |
JP2007001270A5 JP2007001270A5 (ja) | 2008-06-05 |
JP4645831B2 JP4645831B2 (ja) | 2011-03-09 |
Family
ID=37566805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005187280A Expired - Fee Related JP4645831B2 (ja) | 2005-06-27 | 2005-06-27 | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7641324B2 (ja) |
JP (1) | JP4645831B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012016900A (ja) * | 2010-07-08 | 2012-01-26 | Seiko Epson Corp | 液滴吐出ヘッド及び液滴吐出装置 |
JP2014172281A (ja) * | 2013-03-08 | 2014-09-22 | Ricoh Co Ltd | 液滴吐出ヘッド及びその製造方法、液体カートリッジ並びに画像形成装置 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101153690B1 (ko) * | 2006-02-20 | 2012-06-18 | 삼성전기주식회사 | 잉크젯 헤드의 압전 액츄에이터 및 그 형성 방법 |
JP2008036890A (ja) * | 2006-08-02 | 2008-02-21 | Seiko Epson Corp | 液体噴射ヘッド及び液体噴射装置 |
US8298430B2 (en) * | 2007-10-25 | 2012-10-30 | Tdk Corporation | Method of etching magnetoresistive film by using a plurality of metal hard masks |
FR2950197A1 (fr) * | 2009-09-15 | 2011-03-18 | Commissariat Energie Atomique | Membrane piezoelectrique a actionnement optimise et procede de fabrication de la membrane |
JP5900294B2 (ja) * | 2012-11-12 | 2016-04-06 | ブラザー工業株式会社 | 液体吐出装置及び圧電アクチュエータ |
JP5856105B2 (ja) * | 2013-06-28 | 2016-02-09 | 東芝テック株式会社 | インクジェットヘッド及びインクジェット記録装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998018632A1 (fr) * | 1996-10-28 | 1998-05-07 | Seiko Epson Corporation | Tete d'enregistrement a jet d'encre |
JPH11227196A (ja) * | 1998-02-18 | 1999-08-24 | Seiko Epson Corp | インクジェット記録ヘッド及びその製造方法 |
JP2000246892A (ja) * | 1999-02-26 | 2000-09-12 | Seiko Epson Corp | インクジェット式記録ヘッド及びインクジェット式記録装置 |
JP2006198996A (ja) * | 2005-01-24 | 2006-08-03 | Seiko Epson Corp | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ATE249341T1 (de) * | 1999-11-15 | 2003-09-15 | Seiko Epson Corp | Tintenstrahldruckkopf und tintenstrahlaufzeichnungsvorrichtung |
-
2005
- 2005-06-27 JP JP2005187280A patent/JP4645831B2/ja not_active Expired - Fee Related
-
2006
- 2006-06-27 US US11/475,129 patent/US7641324B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998018632A1 (fr) * | 1996-10-28 | 1998-05-07 | Seiko Epson Corporation | Tete d'enregistrement a jet d'encre |
JPH11227196A (ja) * | 1998-02-18 | 1999-08-24 | Seiko Epson Corp | インクジェット記録ヘッド及びその製造方法 |
JP2000246892A (ja) * | 1999-02-26 | 2000-09-12 | Seiko Epson Corp | インクジェット式記録ヘッド及びインクジェット式記録装置 |
JP2006198996A (ja) * | 2005-01-24 | 2006-08-03 | Seiko Epson Corp | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012016900A (ja) * | 2010-07-08 | 2012-01-26 | Seiko Epson Corp | 液滴吐出ヘッド及び液滴吐出装置 |
JP2014172281A (ja) * | 2013-03-08 | 2014-09-22 | Ricoh Co Ltd | 液滴吐出ヘッド及びその製造方法、液体カートリッジ並びに画像形成装置 |
Also Published As
Publication number | Publication date |
---|---|
US20060290748A1 (en) | 2006-12-28 |
JP4645831B2 (ja) | 2011-03-09 |
US7641324B2 (en) | 2010-01-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4645831B2 (ja) | 液体噴射ヘッド及びその製造方法並びに液体噴射装置 | |
JP2009196329A (ja) | 液体噴射ヘッドの製造方法 | |
JP2005088441A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP3812658B2 (ja) | インクジェット式記録ヘッド及びその製造方法並びにインクジェット式記録装置 | |
JP2004001431A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2009143002A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP4340048B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP3661775B2 (ja) | インクジェット式記録ヘッドの製造方法 | |
JP3555653B2 (ja) | インクジェット式記録ヘッド及びその製造方法 | |
JP2006218716A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2009051104A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2006248166A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2000211134A (ja) | インクジェット式記録ヘッド及びインクジェット式記録装置 | |
JP4344929B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2006218776A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2005119199A (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2004082623A (ja) | 液体噴射ヘッド | |
JP2000246896A (ja) | インクジェット式記録ヘッド及びインクジェット式記録装置 | |
JP2001270114A (ja) | インクジェット式記録ヘッド及びその製造方法並びにインクジェット式記録装置 | |
JP5849407B2 (ja) | 液体噴射ヘッド及び液体噴射装置 | |
JP2006224609A (ja) | 液体噴射ヘッドの製造方法 | |
JP2002187271A (ja) | インクジェット式記録ヘッド及びインクジェット式記録装置 | |
JP2002059555A (ja) | インクジェット式記録ヘッド及びその製造方法並びにインクジェット式記録装置 | |
JP2010228276A (ja) | 液体噴射ヘッド及び液体噴射装置並びにアクチュエーター装置 | |
JP3485014B2 (ja) | インクジェット式記録ヘッド及びインクジェット式記録装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080421 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080421 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100818 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101005 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101110 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101123 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131217 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4645831 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |