JP2006526890A5 - - Google Patents

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Publication number
JP2006526890A5
JP2006526890A5 JP2006508236A JP2006508236A JP2006526890A5 JP 2006526890 A5 JP2006526890 A5 JP 2006526890A5 JP 2006508236 A JP2006508236 A JP 2006508236A JP 2006508236 A JP2006508236 A JP 2006508236A JP 2006526890 A5 JP2006526890 A5 JP 2006526890A5
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JP
Japan
Prior art keywords
destruction
metal surface
catalytic
equations
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006508236A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006526890A (ja
JP4392019B2 (ja
Filing date
Publication date
Priority claimed from DE10325101A external-priority patent/DE10325101A1/de
Application filed filed Critical
Publication of JP2006526890A publication Critical patent/JP2006526890A/ja
Publication of JP2006526890A5 publication Critical patent/JP2006526890A5/ja
Application granted granted Critical
Publication of JP4392019B2 publication Critical patent/JP4392019B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2006508236A 2003-06-03 2004-06-01 マイクロ・ブラインド・ビアの埋め込み方法 Expired - Fee Related JP4392019B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10325101A DE10325101A1 (de) 2003-06-03 2003-06-03 Verfahren zum Auffüllen von µ-Blind-Vias (µ-BVs)
PCT/EP2004/005874 WO2004107834A1 (en) 2003-06-03 2004-06-01 Process for filing micro-blind vias

Publications (3)

Publication Number Publication Date
JP2006526890A JP2006526890A (ja) 2006-11-24
JP2006526890A5 true JP2006526890A5 (enExample) 2007-07-12
JP4392019B2 JP4392019B2 (ja) 2009-12-24

Family

ID=33482448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006508236A Expired - Fee Related JP4392019B2 (ja) 2003-06-03 2004-06-01 マイクロ・ブラインド・ビアの埋め込み方法

Country Status (9)

Country Link
EP (1) EP1629704B1 (enExample)
JP (1) JP4392019B2 (enExample)
KR (1) KR20060004981A (enExample)
CN (1) CN1799294B (enExample)
AT (1) ATE348499T1 (enExample)
DE (2) DE10325101A1 (enExample)
MY (1) MY134649A (enExample)
TW (1) TWI350860B (enExample)
WO (1) WO2004107834A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004045451B4 (de) * 2004-09-20 2007-05-03 Atotech Deutschland Gmbh Galvanisches Verfahren zum Füllen von Durchgangslöchern mit Metallen, insbesondere von Leiterplatten mit Kupfer
ATE484943T1 (de) 2006-03-30 2010-10-15 Atotech Deutschland Gmbh Elektrolytisches verfahren zum füllen von löchern und vertiefungen mit metallen
DE102007036651A1 (de) * 2007-07-25 2009-01-29 A.C.K. Aqua Concept Gmbh Karlsruhe Prozessrecycling galvanischer Bäder
JP4957906B2 (ja) * 2007-07-27 2012-06-20 上村工業株式会社 連続電気銅めっき方法
JP5471276B2 (ja) * 2009-10-15 2014-04-16 上村工業株式会社 電気銅めっき浴及び電気銅めっき方法
CN102427684B (zh) * 2011-11-08 2014-04-23 汕头超声印制板（二厂）有限公司 一种高密度互连印制电路板的制造方法
TWI539033B (zh) * 2013-01-07 2016-06-21 Chang Chun Petrochemical Co Electrolytic copper foil and its preparation method
US11047064B2 (en) 2013-01-10 2021-06-29 Coventya, Inc. Apparatus and method to maintaining trivalent chromium bath plating
MX382861B (es) * 2013-01-10 2025-03-13 Macdermid Inc Aparato y metodo de mantenimiento de eficiencia galvanoplastia con baño de cromo trivalente.
CN103118506B (zh) * 2013-01-22 2016-05-04 金悦通电子（翁源）有限公司 一种焊盘上导通孔的电镀填孔方法
JP2017210644A (ja) * 2016-05-24 2017-11-30 メルテックス株式会社 溶解性銅陽極、電解銅めっき装置、電解銅めっき方法、及び酸性電解銅めっき液の保存方法
CN111705344A (zh) * 2020-07-01 2020-09-25 孙颖睿 一种用于脉冲镀铜工艺的工作液补充方法
CN119481358B (zh) * 2024-11-15 2025-08-22 广东工业大学 一种可用于高倍率锡金属负极和锡锰电池的水系电解液

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4344387C2 (de) * 1993-12-24 1996-09-05 Atotech Deutschland Gmbh Verfahren zur elektrolytischen Abscheidung von Kupfer und Anordnung zur Durchführung des Verfahrens
DE19525509C2 (de) * 1994-07-22 1997-10-02 Lpw Anlagen Gmbh Anwendung der UV/H¶2¶O¶2¶-Oxidationsbehandlung zur betriebsmäßigen Wiederverwendungs- oder Weiterverwendungsaufbereitung eines Bades für die galvanotechnische Beschichtung von Gegenständen mit metallischen Überzügen
US5523001A (en) * 1994-12-30 1996-06-04 At&T Corp. Treatment of electroless plating waste streams
DE19810859A1 (de) * 1998-03-13 1999-09-16 A C K Aqua Concept Gmbh Wasser Kombinationsverfahren zur Behandlung eines schäumend eingestellten galvanischen Bads
DE19915146C1 (de) * 1999-01-21 2000-07-06 Atotech Deutschland Gmbh Verfahren zum galvanischen Bilden von Leiterstrukturen aus hochreinem Kupfer bei der Herstellung von integrierten Schaltungen
JP2001267726A (ja) * 2000-03-22 2001-09-28 Toyota Autom Loom Works Ltd 配線基板の電解メッキ方法及び配線基板の電解メッキ装置
US6942779B2 (en) * 2000-05-25 2005-09-13 Mykrolis Corporation Method and system for regenerating of plating baths
US6881319B2 (en) * 2000-12-20 2005-04-19 Shipley Company, L.L.C. Electrolytic copper plating solution and method for controlling the same
TWI268966B (en) * 2001-06-07 2006-12-21 Shipley Co Llc Electrolytic copper plating method
JP4510369B2 (ja) * 2002-11-28 2010-07-21 日本リーロナール有限会社 電解銅めっき方法

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