JP2006510046A - ポジ画像形成性厚膜組成物 - Google Patents
ポジ画像形成性厚膜組成物 Download PDFInfo
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- JP2006510046A JP2006510046A JP2004559365A JP2004559365A JP2006510046A JP 2006510046 A JP2006510046 A JP 2006510046A JP 2004559365 A JP2004559365 A JP 2004559365A JP 2004559365 A JP2004559365 A JP 2004559365A JP 2006510046 A JP2006510046 A JP 2006510046A
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- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 230000002186 photoactivation Effects 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000006862 quantum yield reaction Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000000807 solvent casting Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- BPCBXWVRESTYBG-UHFFFAOYSA-N tert-butyl 3-phenylprop-2-eneperoxoate Chemical compound CC(C)(C)OOC(=O)C=CC1=CC=CC=C1 BPCBXWVRESTYBG-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US43139202P | 2002-12-06 | 2002-12-06 | |
| PCT/US2003/038810 WO2004053593A2 (en) | 2002-12-06 | 2003-12-05 | Positive imageable thick film compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006510046A true JP2006510046A (ja) | 2006-03-23 |
| JP2006510046A5 JP2006510046A5 (https=) | 2007-02-01 |
Family
ID=32507722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004559365A Pending JP2006510046A (ja) | 2002-12-06 | 2003-12-05 | ポジ画像形成性厚膜組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US20040170925A1 (https=) |
| EP (1) | EP1567917A2 (https=) |
| JP (1) | JP2006510046A (https=) |
| KR (1) | KR20050084150A (https=) |
| CN (1) | CN1742233A (https=) |
| AU (1) | AU2003293441A1 (https=) |
| WO (1) | WO2004053593A2 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007526936A (ja) * | 2004-02-05 | 2007-09-20 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 厚膜ペーストと適合性のｕｖ放射遮断保護層 |
| WO2014034768A1 (ja) * | 2012-08-31 | 2014-03-06 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、並びに、タッチパネル表示装置 |
| WO2014065351A1 (ja) * | 2012-10-26 | 2014-05-01 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、有機ｅｌ表示装置、液晶表示装置、並びに、タッチパネル表示装置 |
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| AU2003287660A1 (en) * | 2002-11-15 | 2004-06-15 | E.I. Du Pont De Nemours And Company | Process for using protective layers in the fabrication of electronic devices |
| GB0227902D0 (en) * | 2002-11-29 | 2003-01-08 | Ingenia Holdings Ltd | Template |
| WO2005052691A1 (ja) * | 2003-11-25 | 2005-06-09 | Murata Manufacturing Co., Ltd. | 厚膜パターンの形成方法、電子部品の製造方法、およびフォトリソグラフィー用感光性ペースト |
| KR101042667B1 (ko) * | 2004-07-05 | 2011-06-20 | 주식회사 동진쎄미켐 | 포토레지스트 조성물 |
| KR20060090520A (ko) * | 2005-02-07 | 2006-08-11 | 삼성전자주식회사 | 감광성 수지 및 상기 감광성 수지로 이루어진 패턴을포함하는 박막 표시판 및 그 제조 방법 |
| US7247419B2 (en) | 2005-04-11 | 2007-07-24 | Az Electronic Materials Usa Corp. | Nanocomposite photosensitive composition and use thereof |
| US7524606B2 (en) * | 2005-04-11 | 2009-04-28 | Az Electronic Materials Usa Corp. | Nanocomposite photoresist composition for imaging thick films |
| JP4861767B2 (ja) | 2005-07-26 | 2012-01-25 | 富士フイルム株式会社 | ポジ型レジスト組成物およびそれを用いたパターン形成方法 |
| KR101166016B1 (ko) | 2006-04-26 | 2012-07-19 | 삼성에스디아이 주식회사 | 전자 방출원 형성용 조성물, 이로부터 제조된 전자 방출원및 상기 전자 방출원을 구비한 전자 방출 소자 |
| JP4751773B2 (ja) * | 2006-06-09 | 2011-08-17 | 太陽ホールディングス株式会社 | 光硬化性組成物及びそれを用いて形成した焼成物パターン |
| WO2008065827A1 (fr) * | 2006-11-28 | 2008-06-05 | Tokyo Ohka Kogyo Co., Ltd. | Composition de résine photosensible de type positif chimiquement amplifié pour film épais, film sec chimiquement amplifié pour film épais, et procédé de fabrication d'un motif de résine photosensible sur film épais |
| KR101034346B1 (ko) * | 2006-12-22 | 2011-05-16 | 주식회사 엘지화학 | 탄소 나노 튜브를 통한 내열성 개선의 감광성 수지 조성물 |
| US8310069B2 (en) * | 2007-10-05 | 2012-11-13 | Texas Instruements Incorporated | Semiconductor package having marking layer |
| CN101861282A (zh) * | 2007-11-15 | 2010-10-13 | 纳幕尔杜邦公司 | 碳纳米管的保护 |
| US20110012035A1 (en) * | 2009-07-15 | 2011-01-20 | Texas Instruments Incorporated | Method for Precision Symbolization Using Digital Micromirror Device Technology |
| US20130189524A1 (en) * | 2012-01-19 | 2013-07-25 | Brewer Science Inc. | Viscous fugitive polymer-based carbon nanotube coatings |
| WO2014150577A1 (en) | 2013-03-15 | 2014-09-25 | Sinovia Technologies | Photoactive transparent conductive films, method of making them and touch sensitive device comprising said films |
| JP6564196B2 (ja) * | 2014-03-20 | 2019-08-21 | 東京応化工業株式会社 | 厚膜用化学増幅型ポジ型感光性樹脂組成物 |
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-
2003
- 2003-12-04 US US10/728,210 patent/US20040170925A1/en not_active Abandoned
- 2003-12-05 AU AU2003293441A patent/AU2003293441A1/en not_active Abandoned
- 2003-12-05 WO PCT/US2003/038810 patent/WO2004053593A2/en not_active Ceased
- 2003-12-05 CN CNA2003801092354A patent/CN1742233A/zh active Pending
- 2003-12-05 EP EP03790390A patent/EP1567917A2/en not_active Withdrawn
- 2003-12-05 KR KR1020057010117A patent/KR20050084150A/ko not_active Ceased
- 2003-12-05 JP JP2004559365A patent/JP2006510046A/ja active Pending
-
2008
- 2008-03-05 US US12/042,772 patent/US20080166666A1/en not_active Abandoned
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007526936A (ja) * | 2004-02-05 | 2007-09-20 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 厚膜ペーストと適合性のｕｖ放射遮断保護層 |
| WO2014034768A1 (ja) * | 2012-08-31 | 2014-03-06 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、並びに、タッチパネル表示装置 |
| JPWO2014034768A1 (ja) * | 2012-08-31 | 2016-08-08 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、並びに、タッチパネル表示装置 |
| TWI585522B (zh) * | 2012-08-31 | 2017-06-01 | 富士軟片股份有限公司 | 感光性樹脂組成物、硬化物及其製造方法、樹脂圖案的製造方法、硬化膜、液晶顯示裝置、有機ｅｌ顯示裝置、以及觸控面板顯示裝置 |
| WO2014065351A1 (ja) * | 2012-10-26 | 2014-05-01 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、有機ｅｌ表示装置、液晶表示装置、並びに、タッチパネル表示装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| AU2003293441A8 (en) | 2004-06-30 |
| US20040170925A1 (en) | 2004-09-02 |
| KR20050084150A (ko) | 2005-08-26 |
| WO2004053593A2 (en) | 2004-06-24 |
| WO2004053593A3 (en) | 2004-10-28 |
| AU2003293441A1 (en) | 2004-06-30 |
| CN1742233A (zh) | 2006-03-01 |
| EP1567917A2 (en) | 2005-08-31 |
| US20080166666A1 (en) | 2008-07-10 |
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