JP2006504806A5 - - Google Patents
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- JP2006504806A5 JP2006504806A5 JP2005502217A JP2005502217A JP2006504806A5 JP 2006504806 A5 JP2006504806 A5 JP 2006504806A5 JP 2005502217 A JP2005502217 A JP 2005502217A JP 2005502217 A JP2005502217 A JP 2005502217A JP 2006504806 A5 JP2006504806 A5 JP 2006504806A5
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Applications Claiming Priority (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42294602P | 2002-10-31 | 2002-10-31 | |
| US42294702P | 2002-10-31 | 2002-10-31 | |
| US42628402P | 2002-11-14 | 2002-11-14 | |
| US42746102P | 2002-11-18 | 2002-11-18 | |
| US44632003P | 2003-02-07 | 2003-02-07 | |
| US45371803P | 2003-04-18 | 2003-04-18 | |
| US45371903P | 2003-04-18 | 2003-04-18 | |
| US45371703P | 2003-04-18 | 2003-04-18 | |
| US10/685,777 US6884901B2 (en) | 2002-10-31 | 2003-10-16 | Methods for making metallocene compounds |
| US10/685,785 US7927658B2 (en) | 2002-10-31 | 2003-10-16 | Deposition processes using group 8 (VIII) metallocene precursors |
| US10/686,254 US6919468B2 (en) | 2002-10-31 | 2003-10-16 | Asymmetric group 8 (VIII) metallocene compounds |
| PCT/US2003/034498 WO2004042354A2 (en) | 2002-10-31 | 2003-10-30 | Methods for making metallocene compounds |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006504806A JP2006504806A (ja) | 2006-02-09 |
| JP2006504806A5 true JP2006504806A5 (https=) | 2010-05-06 |
| JP4560484B2 JP4560484B2 (ja) | 2010-10-13 |
Family
ID=32315054
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005502216A Expired - Fee Related JP4538407B2 (ja) | 2002-10-31 | 2003-10-30 | 非対称性第８（ｖｉｉｉ）族メタロセン化合物 |
| JP2005502215A Expired - Fee Related JP4542506B2 (ja) | 2002-10-31 | 2003-10-30 | 第８（ｖｉｉｉ）族メタロセン前駆物質を用いた蒸着法 |
| JP2005502217A Expired - Fee Related JP4560484B2 (ja) | 2002-10-31 | 2003-10-30 | メタロセン化合物製造方法 |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005502216A Expired - Fee Related JP4538407B2 (ja) | 2002-10-31 | 2003-10-30 | 非対称性第８（ｖｉｉｉ）族メタロセン化合物 |
| JP2005502215A Expired - Fee Related JP4542506B2 (ja) | 2002-10-31 | 2003-10-30 | 第８（ｖｉｉｉ）族メタロセン前駆物質を用いた蒸着法 |
Country Status (6)
| Country | Link |
|---|---|
| EP (3) | EP1556395B1 (https=) |
| JP (3) | JP4538407B2 (https=) |
| KR (3) | KR101150551B1 (https=) |
| AU (3) | AU2003301874A1 (https=) |
| TW (1) | TWI274082B (https=) |
| WO (3) | WO2004042354A2 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7048968B2 (en) | 2003-08-22 | 2006-05-23 | Micron Technology, Inc. | Methods of depositing materials over substrates, and methods of forming layers over substrates |
| US6987063B2 (en) | 2004-06-10 | 2006-01-17 | Freescale Semiconductor, Inc. | Method to reduce impurity elements during semiconductor film deposition |
| US7816550B2 (en) * | 2005-02-10 | 2010-10-19 | Praxair Technology, Inc. | Processes for the production of organometallic compounds |
| US7485338B2 (en) * | 2005-03-31 | 2009-02-03 | Tokyo Electron Limited | Method for precursor delivery |
| JP2009007270A (ja) * | 2007-06-27 | 2009-01-15 | Tosoh Corp | ルテニウム化合物の製造方法および薄膜の製造方法 |
| KR101598485B1 (ko) * | 2014-06-20 | 2016-02-29 | 주식회사 유진테크 머티리얼즈 | 성막용 전구체 조성물 및 이를 이용한 박막 형성 방법 |
| KR101636491B1 (ko) | 2014-07-09 | 2016-07-05 | 한국화학연구원 | 루테늄 화합물, 이의 제조 방법 및 이를 이용하여 박막을 형성하는 방법 |
| KR102486128B1 (ko) | 2020-12-30 | 2023-01-06 | 에스케이트리켐 주식회사 | 유기금속 할로겐화물을 함유하는 금속막 형성용 전구체, 이를 이용한 금속막 형성 방법 및 상기 금속막을 포함하는 반도체 소자. |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3294685A (en) * | 1952-04-21 | 1966-12-27 | Gulf Research Development Co | Organic compositions containing a metallo cyclopentadienyl |
| US3035978A (en) * | 1957-08-12 | 1962-05-22 | Ici Ltd | Ferrocene hematinic compositions and therapy |
| GB864198A (en) * | 1959-01-07 | 1961-03-29 | Ici Ltd | A process for the manufacture of ferrocene derivatives |
| BE623679A (https=) * | 1961-10-18 | |||
| US3535356A (en) * | 1968-06-11 | 1970-10-20 | Gulf Research Development Co | Process for producing dicyclopentadienyliron compounds |
| US4066569A (en) * | 1975-12-30 | 1978-01-03 | Hughes Aircraft Company | Dopants for dynamic scattering liquid crystals |
| PL124360B1 (en) * | 1980-02-27 | 1983-01-31 | Politechnika Gdanska | Process for preparing ruthenocene |
| JPH02250892A (ja) * | 1989-03-24 | 1990-10-08 | Idemitsu Kosan Co Ltd | 新規フェロセン誘導体，それを含有する界面活性剤及び有機薄膜の製造方法 |
| JPH1125589A (ja) * | 1997-07-04 | 1999-01-29 | Matsushita Electric Ind Co Ltd | 磁気記録再生装置 |
| JP3371328B2 (ja) * | 1997-07-17 | 2003-01-27 | 株式会社高純度化学研究所 | ビス（アルキルシクロペンタジエニル）ルテニウム錯 体の製造方法およびそれを用いたルテニウム含有薄膜 の製造方法 |
| JP2000281694A (ja) * | 1999-03-29 | 2000-10-10 | Tanaka Kikinzoku Kogyo Kk | 有機金属気相エピタキシー用の有機金属化合物 |
| JP2001122887A (ja) * | 1999-10-25 | 2001-05-08 | Tanaka Kikinzoku Kogyo Kk | 化学気相蒸着用の有機金属化合物及びその有機金属化合物の製造方法並びにその有機金属化合物を用いた薄膜の製造方法 |
| JP4162366B2 (ja) * | 2000-03-31 | 2008-10-08 | 田中貴金属工業株式会社 | Ｃｖｄ薄膜形成プロセス及びｃｖｄ薄膜製造装置 |
| US6921712B2 (en) * | 2000-05-15 | 2005-07-26 | Asm International Nv | Process for producing integrated circuits including reduction using gaseous organic compounds |
| JP4512248B2 (ja) * | 2000-09-26 | 2010-07-28 | 田中貴金属工業株式会社 | ビス（アルキルシクロペンタジエニル）ルテニウムの製造方法及びその方法により製造されるビス（アルキルシクロペンタジエニル）ルテニウム並びにルテニウム薄膜又はルテニウム化合物薄膜の化学気相蒸着方法 |
| JP4759126B2 (ja) * | 2000-10-11 | 2011-08-31 | 田中貴金属工業株式会社 | 化学気相蒸着用の有機金属化合物及び化学気相蒸着用の有機金属化合物の製造方法並びに貴金属薄膜及び貴金属化合物薄膜の化学気相蒸着方法 |
| JP3598055B2 (ja) * | 2000-11-08 | 2004-12-08 | 田中貴金属工業株式会社 | ビス（アルキルシクロペンタジエニル）ルテニウムの製造方法及びその製造方法により製造されるビス（アルキルシクロペンタジエニル）ルテニウム並びにルテニウム薄膜又はルテニウム化合物薄膜の製造方法 |
| US20020161253A1 (en) * | 2001-04-30 | 2002-10-31 | Boulder Scientific Company | Synthesis of bis (cyclopentadienyl) and bis (indenyl) ruthenium complexes |
| US6521772B1 (en) * | 2001-09-27 | 2003-02-18 | Praxair Technology, Inc. | Synthesis of substituted ruthenocene complexes |
| US6653236B2 (en) * | 2002-03-29 | 2003-11-25 | Micron Technology, Inc. | Methods of forming metal-containing films over surfaces of semiconductor substrates; and semiconductor constructions |
-
2003
- 2003-10-29 TW TW092130102A patent/TWI274082B/zh not_active IP Right Cessation
- 2003-10-30 EP EP03810820.5A patent/EP1556395B1/en not_active Expired - Lifetime
- 2003-10-30 JP JP2005502216A patent/JP4538407B2/ja not_active Expired - Fee Related
- 2003-10-30 JP JP2005502215A patent/JP4542506B2/ja not_active Expired - Fee Related
- 2003-10-30 WO PCT/US2003/034498 patent/WO2004042354A2/en not_active Ceased
- 2003-10-30 KR KR1020057007501A patent/KR101150551B1/ko not_active Expired - Fee Related
- 2003-10-30 EP EP03810818A patent/EP1556527B1/en not_active Expired - Lifetime
- 2003-10-30 AU AU2003301874A patent/AU2003301874A1/en not_active Abandoned
- 2003-10-30 AU AU2003301884A patent/AU2003301884A1/en not_active Abandoned
- 2003-10-30 EP EP03810819A patent/EP1556394A4/en not_active Withdrawn
- 2003-10-30 KR KR1020057007554A patent/KR100995223B1/ko not_active Expired - Fee Related
- 2003-10-30 KR KR1020057007504A patent/KR100997838B1/ko not_active Expired - Lifetime
- 2003-10-30 JP JP2005502217A patent/JP4560484B2/ja not_active Expired - Fee Related
- 2003-10-30 AU AU2003301873A patent/AU2003301873A1/en not_active Abandoned
- 2003-10-30 WO PCT/US2003/034494 patent/WO2004041753A2/en not_active Ceased
- 2003-10-30 WO PCT/US2003/034497 patent/WO2004041832A2/en not_active Ceased
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