JP2006287181A5 - - Google Patents
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- JP2006287181A5 JP2006287181A5 JP2005332335A JP2005332335A JP2006287181A5 JP 2006287181 A5 JP2006287181 A5 JP 2006287181A5 JP 2005332335 A JP2005332335 A JP 2005332335A JP 2005332335 A JP2005332335 A JP 2005332335A JP 2006287181 A5 JP2006287181 A5 JP 2006287181A5
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- JP
- Japan
- Prior art keywords
- substrate
- processed
- processing apparatus
- substrate processing
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 claims 277
- 230000007246 mechanism Effects 0.000 claims 92
- 238000003672 processing method Methods 0.000 claims 36
- 230000006837 decompression Effects 0.000 claims 31
- 230000007723 transport mechanism Effects 0.000 claims 30
- 238000010438 heat treatment Methods 0.000 claims 20
- 238000000034 method Methods 0.000 claims 16
- 230000032258 transport Effects 0.000 claims 16
- 238000011084 recovery Methods 0.000 claims 11
- 238000010894 electron beam technology Methods 0.000 claims 7
- 238000001514 detection method Methods 0.000 claims 6
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005332335A JP2006287181A (ja) | 2005-01-28 | 2005-11-17 | 基板処理装置及び基板処理方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005021098 | 2005-01-28 | ||
JP2005067572 | 2005-03-10 | ||
JP2005332335A JP2006287181A (ja) | 2005-01-28 | 2005-11-17 | 基板処理装置及び基板処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006287181A JP2006287181A (ja) | 2006-10-19 |
JP2006287181A5 true JP2006287181A5 (enrdf_load_stackoverflow) | 2008-12-18 |
Family
ID=37408704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005332335A Withdrawn JP2006287181A (ja) | 2005-01-28 | 2005-11-17 | 基板処理装置及び基板処理方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2006287181A (enrdf_load_stackoverflow) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008300578A (ja) * | 2007-05-30 | 2008-12-11 | Canon Inc | 露光装置およびデバイス製造方法 |
CN102327839A (zh) * | 2010-07-14 | 2012-01-25 | 鸿富锦精密工业(深圳)有限公司 | 滚筒式镀膜设备 |
JP5560148B2 (ja) * | 2010-09-14 | 2014-07-23 | 株式会社日立ハイテクノロジーズ | 検査装置、及び位置決め装置 |
JP6117352B2 (ja) * | 2013-05-30 | 2017-04-19 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
US11676845B2 (en) | 2020-06-30 | 2023-06-13 | Brooks Automation Us, Llc | Automated teach apparatus for robotic systems and method therefor |
JP2022143661A (ja) * | 2021-03-18 | 2022-10-03 | 株式会社Screenホールディングス | 基板塗布装置および基板塗布方法 |
CN113658901B (zh) * | 2021-10-21 | 2022-01-21 | 西安奕斯伟材料科技有限公司 | 晶圆v型缺口中心的定位方法、系统及计算机存储介质 |
WO2025070112A1 (ja) * | 2023-09-26 | 2025-04-03 | 東京エレクトロン株式会社 | 基板処理システム、接合装置及び接合方法 |
-
2005
- 2005-11-17 JP JP2005332335A patent/JP2006287181A/ja not_active Withdrawn
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