JP2006210777A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2006210777A JP2006210777A JP2005023049A JP2005023049A JP2006210777A JP 2006210777 A JP2006210777 A JP 2006210777A JP 2005023049 A JP2005023049 A JP 2005023049A JP 2005023049 A JP2005023049 A JP 2005023049A JP 2006210777 A JP2006210777 A JP 2006210777A
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Abstract
【解決手段】セラミック多層配線基板120と、セラミック多層配線基板120のチップ搭載領域にフリップ接続されたシリコンチップ110と、セラミック多層配線基板120のシリコンチップ110が搭載される側に設けられた外部接続バンプ161および外部接続バンプ163と、を有する。シリコンチップ110は、表面電極109と裏面電極117と、を有する。セラミック多層配線基板120は、導電材料により構成される配線層を有し、配線層は、セラミック多層配線基板120の表面および内部に設けられた多層配線層を構成する。そして、シリコンチップ110の表面電極109と、外部接続バンプ163および外部接続バンプ161とが、多層配線層中の多層配線を介して電気的に接続される。実装基板にバンプ161,163と裏面電極117が電気的に接続される。
【選択図】図2
Description
絶縁基板と、
前記絶縁基板のチップ搭載領域にフリップ接続された半導体チップと、
前記絶縁基板の前記半導体チップが搭載される側に設けられた外部実装端子と、
を有し、
前記半導体チップが、当該半導体チップの素子形成面に設けられた表面電極と、裏面に設けられた裏面電極と、を有し、
前記絶縁基板が、導電材料により構成される配線層を有し、
前記配線層が、前記絶縁基板の表面および内部に設けられた多層配線層を構成し、
前記半導体チップの前記表面電極と、前記外部実装端子とが、前記多層配線層中の多層配線を介して電気的に接続されることを特徴とする半導体装置が提供される。
図1は、本実施形態に係る半導体装置の構成を示す斜視図である。また、図2(a)は、図1のA−A’断面図である。なお、図2(a)には、図1の上下を反転させた状態が示されている。
シリコンチップ110は、当該シリコンチップ110の素子形成面に設けられた表面電極(第二の表面電極109)と、裏面に設けられた裏面電極117と、を有する。
セラミック多層配線基板120は、導電材料により構成される配線(第一の配線123等)層を有し、配線層は、セラミック多層配線基板120の表面および内部に設けられた多層配線(第一の配線123、第二の配線127、第三の配線131、第三の配線132、第四の配線135、第四の配線137、第四の配線139、第四の配線141)層を構成する。
シリコンチップ110の第二の表面電極109と、外部接続バンプ161とは、電気的に並列接続された異なる層の多層配線層を介して電気的に接続される。
セラミック多層配線基板120の線膨張係数は、3ppm/℃以上10ppm/℃以下である。
また、半導体装置100は、複数の表面電極(第一の表面電極107、第二の表面電極109)と、複数の外部実装端子(外部接続バンプ161、外部接続バンプ163)と、を有する。そして、セラミック多層配線基板120において、配線層が、複数の導通経路を構成し、第一の表面電極107および第二の表面電極109が、異なる導通経路を経由して、異なる外部実装端子、具体的には、それぞれ外部接続バンプ163および外部接続バンプ161に電気的に接続される。
シリコンチップ110の第一の表面電極107と、外部接続バンプ163とは、多層配線層中の配線を介して電気的に接続される。この経路は、上述した第二の表面電極109と外部接続バンプ161とを接続する配線経路とは異なり、複数の配線層を経由している必要はなく、セラミック多層配線基板120に設けられた少なくとも一層の配線を経由していればよい。
また、セラミック多層配線基板120に、多層配線を接続する導電性の貫通プラグ(接続プラグ149等)が設けられている。接続プラグ149等の貫通プラグは、第一の表面電極107または第二の表面電極109の直上に設けられている。
なお、本明細書において、貫通プラグ(接続プラグ149等)は、一つの導電部材により構成されている場合には限られず、複数の導電部材が積層された構成であってもよい。たとえば、複数の配線と、隣接する複数の配線間を接続するプラグとが積層されてなる構造であってもよい。この構造は、柱状、さらに具体的には円柱状の領域を占めることができる。また、貫通プラグは、表面電極やバンプの直上以外にも複数配置することができる。
外部接続バンプ161および外部接続バンプ163は、シリコンチップ110の側方に設けられた導電性のバンプである。
第一の表面電極107および第二の表面電極109と配線層中の配線(第四の配線139および第四の配線135)とがバンプ接続されて、シリコンチップ110がセラミック多層配線基板120にフリップ接続されており、外部接続バンプ163および外部接続バンプ161が、第一の表面電極107および第二の表面電極109と第四の配線139および第四の配線135とを接続するバンプ(バンプ115、バンプ116)よりも大きいバンプである。
シリコンチップ110は縦型のMOSトランジスタを有する。多層配線層中の多層配線を介して外部接続バンプ161および外部接続バンプ163とそれぞれ電気的に接続される第二の表面電極109および第一の表面電極107は、それぞれ、縦型のMOSトランジスタのソース電極およびゲート電極である。また、裏面電極117は、縦型のMOSトランジスタのドレイン電極である。
(I)外部接続バンプ163から、第四の配線141、接続プラグ145、第三の配線132、接続プラグ143、第四の配線139、およびバンプ116を経由してシリコンチップ110の第一の表面電極107に至る経路、
(II)外部接続バンプ161から、第四の配線137と、第三の配線131、第二の配線127および第一の配線123の少なくとも一つと、第四の配線135と、バンプ115とを経由して第二の表面電極109に至る経路。
半導体装置100においては、シリコンチップ110の表面電極形成面すなわち素子形成面がセラミック多層配線基板120に対向している。セラミックスの熱膨張係数はシリコン基板101の熱膨張係数に近い。このため、半導体装置100に熱履歴を与えた際に、シリコン基板101とプリント配線基板130との熱膨張係数の違いにより、シリコンチップ110とセラミック多層配線基板120との接続部分、具体的には第一の表面電極107および第二の表面電極109への応力の集中を抑制することができる。よって、シリコン基板101の素子形成面に設けられた表面電極またはその近傍の加熱に対する耐久性を向上させることができる。
第一の実施形態においては、セラミック多層配線基板120上に設けられた外部実装端子がバンプである場合を例に説明したが、セラミック多層配線基板120の下面に導電部材を露出させて、これを外部実装端子として用いることもできる。
101 シリコン基板
103 パッド
105 パッド
107 表面電極
109 表面電極
110 シリコンチップ
113 パッシベーション膜
115 バンプ
116 バンプ
117 裏面電極
120 セラミック多層配線基板
123 第一の配線
125 第二の絶縁層
127 第二の配線
129 第三の絶縁層
130 プリント配線基板
131 第三の配線
132 第三の配線
133 第四の絶縁層
135 第四の配線
137 第四の配線
139 第四の配線
140 半導体装置
141 第四の配線
143 接続プラグ
145 接続プラグ
147 接続プラグ
149 接続プラグ
150 セラミック多層配線基板
151 接続プラグ
153 接続プラグ
155 保護膜
161 外部接続バンプ
163 外部接続バンプ
171 貫通孔
173 貫通プラグ
175 外部配線
177 外部配線
179 応力集中領域
181 第四の配線
183 第五の絶縁層
185 第五の配線
187 第六の絶縁層
189 第六の配線
191 第七の絶縁層
193 第七の配線
195 第七の配線
Claims (8)
- 絶縁基板と、
前記絶縁基板のチップ搭載領域にフリップ接続された半導体チップと、
前記絶縁基板の前記半導体チップが搭載される側に設けられた外部実装端子と、
を有し、
前記半導体チップが、当該半導体チップの素子形成面に設けられた表面電極と、裏面に設けられた裏面電極と、を有し、
前記絶縁基板が、導電材料により構成される配線層を有し、
前記配線層が、前記絶縁基板の表面および内部に設けられた多層配線層を構成し、
前記半導体チップの前記表面電極と、前記外部実装端子とが、前記多層配線層中の多層配線を介して電気的に接続されることを特徴とする半導体装置。 - 請求項1に記載の半導体装置において、
前記表面電極が、電気的に並列接続された異なる層の前記多層配線層を介して前記外部実装端子に電気的に接続されることを特徴とする半導体装置。 - 請求項1または2に記載の半導体装置において、
前記絶縁基板に、前記多層配線間を接続する導電性の貫通プラグが設けられたことを特徴とする半導体装置。 - 請求項3に記載の半導体装置において、前記貫通プラグが、前記表面電極の直上に設けられたことを特徴とする半導体装置。
- 請求項1乃至4いずれかに記載の半導体装置において、前記外部実装端子が、前記半導体チップの側方に設けられた導電性のバンプであることを特徴とする半導体装置。
- 請求項5に記載の半導体装置において、前記表面電極と前記配線層中の配線とがバンプ接続されて、前記半導体チップが前記絶縁基板にフリップ接続されており、
前記外部実装端子が、前記表面電極と前記配線とを接続するバンプよりも大きいバンプであることを特徴とする半導体装置。 - 請求項1乃至6いずれかに記載の半導体装置において、前記絶縁基板の線膨張係数が3ppm/℃以上10ppm/℃以下であることを特徴とする半導体装置。
- 請求項1乃至7いずれかに記載の半導体装置において、
複数の前記表面電極と、複数の前記外部実装端子と、を有し、
前記半導体チップが、縦型のMOSトランジスタを有し、
前記多層配線層中の多層配線を介して前記外部実装端子と電気的に接続される前記表面電極が、前記縦型のMOSトランジスタのソース電極であるとともに、
前記裏面電極が前記縦型のMOSトランジスタのドレイン電極であることを特徴とする半導体装置。
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US7723837B2 (en) | 2010-05-25 |
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CN1819173A (zh) | 2006-08-16 |
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