JP2006059889A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2006059889A5 JP2006059889A5 JP2004237899A JP2004237899A JP2006059889A5 JP 2006059889 A5 JP2006059889 A5 JP 2006059889A5 JP 2004237899 A JP2004237899 A JP 2004237899A JP 2004237899 A JP2004237899 A JP 2004237899A JP 2006059889 A5 JP2006059889 A5 JP 2006059889A5
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- thin film
- film
- incident light
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 19
- 239000010409 thin film Substances 0.000 claims 11
- 239000010408 film Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 2
- 238000005286 illumination Methods 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 238000009826 distribution Methods 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004237899A JP4498060B2 (ja) | 2004-08-18 | 2004-08-18 | 投影光学系、露光装置及び光学素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004237899A JP4498060B2 (ja) | 2004-08-18 | 2004-08-18 | 投影光学系、露光装置及び光学素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006059889A JP2006059889A (ja) | 2006-03-02 |
| JP2006059889A5 true JP2006059889A5 (enExample) | 2007-09-27 |
| JP4498060B2 JP4498060B2 (ja) | 2010-07-07 |
Family
ID=36107130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004237899A Expired - Fee Related JP4498060B2 (ja) | 2004-08-18 | 2004-08-18 | 投影光学系、露光装置及び光学素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4498060B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1930771A1 (en) * | 2006-12-04 | 2008-06-11 | Carl Zeiss SMT AG | Projection objectives having mirror elements with reflective coatings |
| EP2191332B1 (en) | 2007-08-20 | 2013-05-29 | Carl Zeiss SMT GmbH | Projection objective having mirror elements with reflective coatings |
| JP2010199503A (ja) * | 2009-02-27 | 2010-09-09 | Nikon Corp | 光学素子、露光装置及びデバイス製造方法 |
| DE102009047179B8 (de) | 2009-11-26 | 2016-08-18 | Carl Zeiss Smt Gmbh | Projektionsobjektiv |
| KR102048487B1 (ko) * | 2012-03-28 | 2020-01-22 | 호야 가부시키가이샤 | 다층 반사막 부착 기판의 제조 방법, 반사형 마스크 블랭크의 제조 방법 및 반사형 마스크의 제조 방법 |
| JP5746259B2 (ja) * | 2013-05-07 | 2015-07-08 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 反射コーティングを備えたミラー要素を有する投影対物系 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2569447B2 (ja) * | 1988-11-28 | 1997-01-08 | 株式会社ニコン | 多層膜反射鏡の製造方法 |
| JP2002162566A (ja) * | 2000-11-27 | 2002-06-07 | Nikon Corp | 光学系の設計方法,光学系および投影露光装置 |
| EP1282011B1 (de) * | 2001-08-01 | 2006-11-22 | Carl Zeiss SMT AG | Reflektives Projektionsobjektiv für EUV-Photolithographie |
| JP2003077805A (ja) * | 2001-09-03 | 2003-03-14 | Nikon Corp | 光学系の製造方法およびeuv露光装置 |
-
2004
- 2004-08-18 JP JP2004237899A patent/JP4498060B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI729366B (zh) | 圖案形成裝置 | |
| KR102089835B1 (ko) | 필름 마스크, 이의 제조방법 및 이를 이용한 패턴 형성 방법 | |
| JP2016048379A5 (ja) | マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、反射型マスクブランクの製造方法、反射型マスクの製造方法、透過型マスクブランクの製造方法、透過型マスクの製造方法、及び半導体装置の製造方法 | |
| TW201921162A (zh) | 元件製造方法 | |
| CN101727007A (zh) | 一种用于高深宽比纳米图形加工的反射式表面等离子体成像光刻方法 | |
| EP1947682A4 (en) | MULTILAYER REFLECTIVE MIRROR, METHOD FOR PRODUCING A MULTILAYER REFLECTIVE MIRROR, OPTICAL SYSTEM, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD | |
| TW200405403A (en) | Adjustment method and apparatus of optical system, and exposure apparatus | |
| JP2007134464A5 (enExample) | ||
| JP2005340459A5 (enExample) | ||
| JP2006059889A5 (enExample) | ||
| CN101794070B (zh) | 一种用于缩小投影超分辨成像器件和光刻方法 | |
| JP2007041603A5 (ja) | 超紫外線リソグラフィ用の反射デバイス、それを適用した超紫外線リソグラフィ用マスク、プロジェクション光学系及びリソグラフィ装置 | |
| JP2005141158A5 (enExample) | ||
| TW200941545A (en) | Method for patterning photoresist layer | |
| JP2006058023A5 (enExample) | ||
| CN102621601B (zh) | 一种平面像场超分辨成像透镜的制备方法 | |
| CN101825845A (zh) | 一种用于高深宽比纳米图形加工的表面等离子体成像光刻方法 | |
| WO2007088862A1 (ja) | 高開口数露光装置用ペリクル | |
| JP2008016516A5 (enExample) | ||
| JP2006220903A5 (enExample) | ||
| JP2018146760A5 (enExample) | ||
| TWI402892B (zh) | 使用光罩護膜以圖案化一層之方法 | |
| JP2008277815A5 (enExample) | ||
| JP2008116517A5 (enExample) | ||
| KR100966980B1 (ko) | 반도체 소자의 cd보상 방법 |