JP2018146760A5 - - Google Patents
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- Publication number
- JP2018146760A5 JP2018146760A5 JP2017041418A JP2017041418A JP2018146760A5 JP 2018146760 A5 JP2018146760 A5 JP 2018146760A5 JP 2017041418 A JP2017041418 A JP 2017041418A JP 2017041418 A JP2017041418 A JP 2017041418A JP 2018146760 A5 JP2018146760 A5 JP 2018146760A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- transfer
- thin film
- pattern
- material film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 claims description 78
- 239000000463 material Substances 0.000 claims description 34
- 239000010409 thin film Substances 0.000 claims description 22
- 239000006096 absorbing agent Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 11
- 238000004519 manufacturing process Methods 0.000 claims 10
- 238000001312 dry etching Methods 0.000 claims 7
- 239000004065 semiconductor Substances 0.000 claims 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 230000000737 periodic effect Effects 0.000 description 8
- 239000010410 layer Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 239000002356 single layer Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017041418A JP6800779B2 (ja) | 2017-03-06 | 2017-03-06 | 転写用マスクの製造方法、および半導体デバイスの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017041418A JP6800779B2 (ja) | 2017-03-06 | 2017-03-06 | 転写用マスクの製造方法、および半導体デバイスの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018146760A JP2018146760A (ja) | 2018-09-20 |
| JP2018146760A5 true JP2018146760A5 (enExample) | 2020-03-12 |
| JP6800779B2 JP6800779B2 (ja) | 2020-12-16 |
Family
ID=63591110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017041418A Active JP6800779B2 (ja) | 2017-03-06 | 2017-03-06 | 転写用マスクの製造方法、および半導体デバイスの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6800779B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021048329A (ja) | 2019-09-19 | 2021-03-25 | キオクシア株式会社 | パターン形成方法及びテンプレートの製造方法 |
| KR102444967B1 (ko) * | 2021-04-29 | 2022-09-16 | 에스케이씨솔믹스 주식회사 | 블랭크 마스크 및 이를 이용한 포토마스크 |
| KR102392332B1 (ko) * | 2021-06-08 | 2022-04-28 | 에스케이씨솔믹스 주식회사 | 블랭크 마스크 및 이를 이용한 포토마스크 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1452009A (zh) * | 2002-04-16 | 2003-10-29 | 林心迪 | 形成微影制程的相偏移光罩的方法 |
| US7482280B2 (en) * | 2005-08-15 | 2009-01-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for forming a lithography pattern |
| JP5144127B2 (ja) * | 2007-05-23 | 2013-02-13 | キヤノン株式会社 | ナノインプリント用のモールドの製造方法 |
| US9791779B2 (en) * | 2014-10-16 | 2017-10-17 | Tokyo Electron Limited | EUV resist etch durability improvement and pattern collapse mitigation |
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2017
- 2017-03-06 JP JP2017041418A patent/JP6800779B2/ja active Active