JP2006058023A5 - - Google Patents
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- Publication number
- JP2006058023A5 JP2006058023A5 JP2004237241A JP2004237241A JP2006058023A5 JP 2006058023 A5 JP2006058023 A5 JP 2006058023A5 JP 2004237241 A JP2004237241 A JP 2004237241A JP 2004237241 A JP2004237241 A JP 2004237241A JP 2006058023 A5 JP2006058023 A5 JP 2006058023A5
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- thin film
- element according
- optical system
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 14
- 239000010409 thin film Substances 0.000 claims 6
- 239000010408 film Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 2
- 238000009826 distribution Methods 0.000 claims 2
- 238000005286 illumination Methods 0.000 claims 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004237241A JP4498059B2 (ja) | 2004-08-17 | 2004-08-17 | 光学素子、露光装置及び成膜方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004237241A JP4498059B2 (ja) | 2004-08-17 | 2004-08-17 | 光学素子、露光装置及び成膜方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006058023A JP2006058023A (ja) | 2006-03-02 |
| JP2006058023A5 true JP2006058023A5 (enExample) | 2007-09-27 |
| JP4498059B2 JP4498059B2 (ja) | 2010-07-07 |
Family
ID=36105620
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004237241A Expired - Fee Related JP4498059B2 (ja) | 2004-08-17 | 2004-08-17 | 光学素子、露光装置及び成膜方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4498059B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5269079B2 (ja) | 2007-08-20 | 2013-08-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 反射コーティングを備えたミラー要素を有する投影対物系 |
| US9606447B2 (en) * | 2012-05-21 | 2017-03-28 | Nikon Corporation | Reflective mirror, projection optical system, exposure apparatus, and device manufacturing method |
| JP5746259B2 (ja) * | 2013-05-07 | 2015-07-08 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 反射コーティングを備えたミラー要素を有する投影対物系 |
| TWI650607B (zh) * | 2014-10-21 | 2019-02-11 | 日商Ａｇｃ股份有限公司 | Euvl用附反射層之基板及其製造方法、以及euvl用反射型光罩基底及euvl用反射型光罩 |
| JP7625938B2 (ja) | 2021-03-31 | 2025-02-04 | セイコーエプソン株式会社 | 虚像表示装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09251097A (ja) * | 1996-03-15 | 1997-09-22 | Nikon Corp | Ｘ線リソグラフィー用反射縮小結像光学系 |
| JP2002162566A (ja) * | 2000-11-27 | 2002-06-07 | Nikon Corp | 光学系の設計方法，光学系および投影露光装置 |
| DE50208750D1 (de) * | 2001-08-01 | 2007-01-04 | Zeiss Carl Smt Ag | Reflektives Projektionsobjektiv für EUV-Photolithographie |
| JP2004031808A (ja) * | 2002-06-27 | 2004-01-29 | Nikon Corp | 露光装置の投影光学系、該投影光学系を備えた露光装置及び該露光装置を用いた露光方法 |
-
2004
- 2004-08-17 JP JP2004237241A patent/JP4498059B2/ja not_active Expired - Fee Related
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