JP4498059B2 - 光学素子、露光装置及び成膜方法 - Google Patents

光学素子、露光装置及び成膜方法 Download PDF

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Publication number
JP4498059B2
JP4498059B2 JP2004237241A JP2004237241A JP4498059B2 JP 4498059 B2 JP4498059 B2 JP 4498059B2 JP 2004237241 A JP2004237241 A JP 2004237241A JP 2004237241 A JP2004237241 A JP 2004237241A JP 4498059 B2 JP4498059 B2 JP 4498059B2
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Japan
Prior art keywords
optical system
film
thin film
optical element
reflecting surface
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Expired - Fee Related
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JP2004237241A
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Japanese (ja)
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JP2006058023A5 (enExample
JP2006058023A (ja
Inventor
正磨 加藤
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Canon Inc
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Canon Inc
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Priority to JP2004237241A priority Critical patent/JP4498059B2/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
JP2004237241A 2004-08-17 2004-08-17 光学素子、露光装置及び成膜方法 Expired - Fee Related JP4498059B2 (ja)

Priority Applications (1)

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JP2004237241A JP4498059B2 (ja) 2004-08-17 2004-08-17 光学素子、露光装置及び成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004237241A JP4498059B2 (ja) 2004-08-17 2004-08-17 光学素子、露光装置及び成膜方法

Publications (3)

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JP2006058023A JP2006058023A (ja) 2006-03-02
JP2006058023A5 JP2006058023A5 (enExample) 2007-09-27
JP4498059B2 true JP4498059B2 (ja) 2010-07-07

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JP2004237241A Expired - Fee Related JP4498059B2 (ja) 2004-08-17 2004-08-17 光学素子、露光装置及び成膜方法

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JP (1) JP4498059B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5269079B2 (ja) 2007-08-20 2013-08-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射コーティングを備えたミラー要素を有する投影対物系
US9606447B2 (en) * 2012-05-21 2017-03-28 Nikon Corporation Reflective mirror, projection optical system, exposure apparatus, and device manufacturing method
JP5746259B2 (ja) * 2013-05-07 2015-07-08 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射コーティングを備えたミラー要素を有する投影対物系
TWI650607B (zh) * 2014-10-21 2019-02-11 日商Ａｇｃ股份有限公司 Euvl用附反射層之基板及其製造方法、以及euvl用反射型光罩基底及euvl用反射型光罩
JP7625938B2 (ja) 2021-03-31 2025-02-04 セイコーエプソン株式会社 虚像表示装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09251097A (ja) * 1996-03-15 1997-09-22 Nikon Corp Ｘ線リソグラフィー用反射縮小結像光学系
JP2002162566A (ja) * 2000-11-27 2002-06-07 Nikon Corp 光学系の設計方法，光学系および投影露光装置
DE50208750D1 (de) * 2001-08-01 2007-01-04 Zeiss Carl Smt Ag Reflektives Projektionsobjektiv für EUV-Photolithographie
JP2004031808A (ja) * 2002-06-27 2004-01-29 Nikon Corp 露光装置の投影光学系、該投影光学系を備えた露光装置及び該露光装置を用いた露光方法

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Publication number Publication date
JP2006058023A (ja) 2006-03-02

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