JP2006059889A5 - - Google Patents

Claims (11)

An optical element in which a thin film is formed on a reflecting surface that reflects incident light,
Optical element characterized in that the thickness of the thin film is deposited on the small Kunar so as the incident angle of the incident light at the reflecting surface becomes larger. An optical element in which a thin film is formed on a reflecting surface that reflects incident light,
Optical element film thickness of the thin film on the rotational symmetry axis of the optical element, being larger than the thickness of the thin film of the peripheral portion away from the axis of rotational symmetry. The film thickness distributions, the optical element according to claim 1 or claim 2, wherein a rotational symmetric der Rukoto around the rotational symmetry axis of the optical element.   The optical element according to claim 1, wherein an incident angle of the incident light with respect to the reflecting surface is 4 ° or more and 15 ° or less.   The optical element according to claim 1, wherein the thin film is a multilayer film.   6. The optical element according to claim 5, wherein the multilayer film is configured by repeatedly laminating two layers including a silicon layer and a molybdenum layer.   The optical element according to claim 6, wherein the number of repetitions is 40. An illumination optical system that illuminates the reticle with light from a light source;
An exposure apparatus comprising: a projection optical system that projects the reticle pattern onto a substrate;
An exposure apparatus, wherein at least one of the illumination optical system and the projection optical system includes the optical element according to any one of claims 1 to 7. Exposing the substrate with the exposure apparatus according to claim 8;
And developing the exposed substrate. A device manufacturing method. A film forming method for forming a thin film on a reflective surface of a reflective optical element that reflects incident light,
Deposition method characterized by depositing the film thickness is small Kunar so of the thin film according to the incident angle of the incident light at the reflecting surface becomes larger. A film forming method for forming a thin film on a reflective surface of a reflective optical element that reflects incident light,
Film forming method thickness of the thin film on the rotational symmetry axis of the optical element, characterized in that deposited on the size Kunar so than the thickness of the thin film of the peripheral portion away from the axis of rotational symmetry.