JP2006220903A5 - - Google Patents
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- JP2006220903A5 JP2006220903A5 JP2005034108A JP2005034108A JP2006220903A5 JP 2006220903 A5 JP2006220903 A5 JP 2006220903A5 JP 2005034108 A JP2005034108 A JP 2005034108A JP 2005034108 A JP2005034108 A JP 2005034108A JP 2006220903 A5 JP2006220903 A5 JP 2006220903A5
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- dielectric film
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- 230000003287 optical Effects 0.000 claims 45
- 239000002184 metal Substances 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 8
- 238000005286 illumination Methods 0.000 claims 2
Claims (8)
前記金属膜層は、７０ｎｍ以上の物理膜厚を有し、
前記誘電体膜層は、前記光の波長λに対して、前記基板側から順に、
（０．５〜１）×λ／４の光学膜厚を有する第１の層と、
（２〜３．５）×λ／４の光学膜厚を有する第２の層と、
（１〜１．５）×λ／４の光学膜厚を有する第３の層と、
（１〜１．８）×λ／４の光学膜厚を有する第４の層と、
（０．７〜１．８）×λ／４の光学膜厚を有する第５の層と、
（１．３〜１．５）×λ／４の光学膜厚を有する第６の層と、
（１．３〜２）×λ／４の光学膜厚を有する第７の層と、
（０．９〜１．５）×λ／４の光学膜厚を有する第８の層と、
（１．８〜２．８）×λ／４の光学膜厚を有する第９の層と、
（０．１〜０．５）×λ／４の光学膜厚を有する第１０の層とを有することを特徴とする反射ミラー。 On the substrate, a metal film layer, a first dielectric film having a refractive index of 1.35 to 1.55 and a second dielectric film having a refractive index of 1.85 to 2.4 are alternately arranged. A reflection mirror having a multilayer film of nine or more layers composed of a dielectric film layer laminated on the metal film layer, and reflecting light;
The metal film layer has a physical film thickness of 70 nm or more,
The dielectric film layer is sequentially from the substrate side with respect to the wavelength λ of the light.
A first layer having a (0.5-1) optical film thickness of × λ / 4,
A second layer having an optical thickness of (2 to 3.5) × λ / 4;
A third layer having an optical thickness of (1 to 1.5) × λ / 4;
A fourth layer having an optical thickness of (1 to 1.8) × λ / 4;
A fifth layer having an optical thickness of (0.7 to 1.8) × λ / 4;
A sixth layer having an optical thickness of (1.3 to 1.5) × λ / 4;
A seventh layer having a (1.3-2) optical thickness of × λ / 4,
An eighth layer having an optical thickness of (0.9 to 1.5) × λ / 4;
A ninth layer having an optical thickness of (1.8 to 2.8) × λ / 4;
And a tenth layer having an optical film thickness of (0.1 to 0.5) × λ / 4.
前記金属膜層は、７０ｎｍ以上の物理膜厚を有し、
前記誘電体膜層は、前記光の波長λに対して、前記基板側から順に、
（０．２〜０．８）×λ／４の光学膜厚を有する第１の層と、
（２．４〜３．０）×λ／４の光学膜厚を有する第２の層と、
（０．８〜１．６）×λ／４の光学膜厚を有する第３の層と、
（１〜１．８）×λ／４の光学膜厚を有する第４の層と、
（１．３〜２）×λ／４の光学膜厚を有する第５の層と、
（０．７〜１．３）×λ／４の光学膜厚を有する第６の層と、
（１．４〜２．０）×λ／４の光学膜厚を有する第７の層と、
（１．１〜１．７）×λ／４の光学膜厚を有する第８の層と、
（２．５〜３．１）×λ／４の光学膜厚を有する第９の層とを有することを特徴とする反射ミラー。 On the substrate, a metal film layer, a first dielectric film having a refractive index of 1.35 to 1.55 and a second dielectric film having a refractive index of 1.85 to 2.4 are alternately arranged. A reflection mirror having a multilayer film of nine or more layers composed of a dielectric film layer laminated on the metal film layer, and reflecting light;
The metal film layer has a physical film thickness of 70 nm or more,
The dielectric film layer is sequentially from the substrate side with respect to the wavelength λ of the light.
A first layer having an optical film thickness of (0.2 to 0.8) × λ / 4;
A second layer having a (2.4 to 3.0) having an optical thickness of × λ / 4,
A third layer having an optical thickness of (0.8 to 1.6) × λ / 4;
A fourth layer having an optical thickness of (1 to 1.8) × λ / 4;
A fifth layer having a (1.3-2) optical thickness of × λ / 4,
A sixth layer having an optical thickness of (0.7 to 1.3) × λ / 4;
A seventh layer having an optical thickness of (1.4 to 2.0) × λ / 4;
An eighth layer having an optical film thickness of (1.1 to 1.7) × λ / 4;
And a ninth mirror having an optical film thickness of (2.5 to 3.1) × λ / 4.
前記金属膜層は、７０ｎｍ以上の物理膜厚を有し、
前記誘電体膜層は、前記光の波長λに対して、前記基板側から順に、
（０．６〜１）×λ／４の光学膜厚を有する第１の層と、
（０．６〜１）×λ／４の光学膜厚を有する第２の層と、
（０．８〜１．３）×λ／４の光学膜厚を有する第３の層と、
（０．８〜１．３）×λ／４の光学膜厚を有する第４の層と、
（１．８〜２．５）×λ／４の光学膜厚を有する第５の層と、
（２〜３）×λ／４の光学膜厚を有する第６の層と、
（１．８〜２．５）×λ／４の光学膜厚を有する第７の層と、
（０．７〜１．３）×λ／４の光学膜厚を有する第８の層と、
（０．４〜１）×λ／４の光学膜厚を有する第９の層と、
（０．１〜０．５）×λ／４の光学膜厚を有する第１０の層とを有することを特徴とする反射ミラー。 On the substrate, a metal film layer, a first dielectric film having a refractive index of 1.35 to 1.55 and a second dielectric film having a refractive index of 1.85 to 2.4 are alternately arranged. A reflection mirror having a multilayer film of nine or more layers composed of a dielectric film layer laminated on the metal film layer, and reflecting light;
The metal film layer has a physical film thickness of 70 nm or more,
The dielectric film layer is sequentially from the substrate side with respect to the wavelength λ of the light.
A first layer having a (0.6-1) optical film thickness of × λ / 4,
A second layer having a (0.6-1) optical film thickness of × λ / 4,
A third layer having an optical thickness of (0.8 to 1.3) × λ / 4;
A fourth layer having an optical thickness of (0.8 to 1.3) × λ / 4;
A fifth layer having a (1.8-2.5) optical thickness of × λ / 4,
A sixth layer having an optical thickness of (2 ~ 3) × λ / 4,
A seventh layer having an optical film thickness of (1.8 to 2.5) × λ / 4;
An eighth layer having an optical film thickness of (0.7 to 1.3) × λ / 4;
A ninth layer having (0.4-1) optical film thickness of × λ / 4,
And a tenth layer having an optical film thickness of (0.1 to 0.5) × λ / 4.
前記金属膜層は、７０ｎｍ以上の物理膜厚を有し、
前記誘電体膜層は、前記光の波長λに対して、前記基板側から順に、
（０．６〜１．３）×λ／４の光学膜厚を有する第１の層と、
（０．６〜１．３）×λ／４の光学膜厚を有する第２の層と、
（０．２〜０．８）×λ／４の光学膜厚を有する第３の層と、
（０．９〜１．５）×λ／４の光学膜厚を有する第４の層と、
（１．８〜２．４）×λ／４の光学膜厚を有する第５の層と、
（０．８〜１．４）×λ／４の光学膜厚を有する第６の層と、
（０．２〜０．８）×λ／４の光学膜厚を有する第７の層と、
（０．０５〜０．４）×λ／４の光学膜厚を有する第８の層とを有することを特徴とする反射ミラー。 On the substrate, a metal film layer, a first dielectric film having a refractive index of 1.35 to 1.55 and a second dielectric film having a refractive index of 1.85 to 2.4 are alternately arranged. A reflection mirror having a multilayer film of nine or more layers composed of a dielectric film layer laminated on the metal film layer, and reflecting light;
The metal film layer has a physical film thickness of 70 nm or more,
The dielectric film layer is sequentially from the substrate side with respect to the wavelength λ of the light.
A first layer having an optical film thickness of (0.6 to 1.3) × λ / 4;
A second layer having an optical film thickness of (0.6 to 1.3) × λ / 4;
A third layer having an optical thickness of (0.2 to 0.8) × λ / 4;
A fourth layer having an optical thickness of (0.9 to 1.5) × λ / 4;
A fifth layer having an optical film thickness of (1.8 to 2.4) × λ / 4;
A sixth layer having an optical thickness of (0.8 to 1.4) × λ / 4;
A seventh layer having an optical thickness of (0.2 to 0.8) × λ / 4;
And an eighth layer having an optical film thickness of (0.05 to 0.4) × λ / 4.
前記複数の光学素子のうち少なくとも一の光学素子は、請求項１〜４のうちいずれか一項記載の反射ミラーであることを特徴とする光学系。 Having a plurality of optical elements,
5. The optical system according to claim 1, wherein at least one of the plurality of optical elements is the reflecting mirror according to claim 1.
光源からの光で前記レチクルを照明する照明光学系と、
前記レチクルのパターンを前記被処理体に投影する投影光学系とを有し、
前記照明光学系及び前記投影光学系を構成する複数の光学素子のうち少なくとも一の光学素子は、請求項１〜４のうちいずれか一項記載の反射ミラーを有することを特徴とする露光装置。 An exposure apparatus that exposes a reticle pattern onto an object to be processed,
An illumination optical system that illuminates the reticle with light from a light source;
A projection optical system for projecting the reticle pattern onto the object to be processed;
The exposure apparatus according to claim 1, wherein at least one of the plurality of optical elements constituting the illumination optical system and the projection optical system includes the reflection mirror according to claim 1.
露光された前記被処理体を現像するステップとを有することを特徴とするデバイス製造方法。 Exposing the object to be processed using the exposure apparatus according to claim 6 or 7 ,
And developing the exposed object to be processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005034108A JP4785389B2 (en) | 2005-02-10 | 2005-02-10 | Reflective mirror, exposure apparatus and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005034108A JP4785389B2 (en) | 2005-02-10 | 2005-02-10 | Reflective mirror, exposure apparatus and device manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006220903A JP2006220903A (en) | 2006-08-24 |
| JP2006220903A5 true JP2006220903A5 (en) | 2008-03-27 |
| JP4785389B2 JP4785389B2 (en) | 2011-10-05 |
Family
ID=36983272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005034108A Expired - Fee Related JP4785389B2 (en) | 2005-02-10 | 2005-02-10 | Reflective mirror, exposure apparatus and device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4785389B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5311757B2 (en) * | 2007-03-29 | 2013-10-09 | キヤノン株式会社 | Reflective optical element, exposure apparatus, and device manufacturing method |
| JP2008257777A (en) * | 2007-04-03 | 2008-10-23 | Topcon Corp | Optical component |
| US10067265B2 (en) | 2010-10-12 | 2018-09-04 | Toyota Motor Engineering & Manufacturing North America, Inc. | Semi-transparent reflectors |
| JP2014086579A (en) * | 2012-10-19 | 2014-05-12 | Applied Materials Inc | Reflective member for vacuum chamber |
| JP6236987B2 (en) | 2013-08-23 | 2017-11-29 | ミツミ電機株式会社 | Optical scanning device and optical scanning unit |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2629693B2 (en) * | 1987-02-26 | 1997-07-09 | 松下電器産業株式会社 | Excimer laser mirror |
| JPH1031106A (en) * | 1996-07-18 | 1998-02-03 | Nikon Corp | Laser mirror for multiwavelength |
| JP3976919B2 (en) * | 1998-12-28 | 2007-09-19 | 日東光器株式会社 | Reflection mirror |
| JP2001337462A (en) * | 2000-05-26 | 2001-12-07 | Nikon Corp | Exposure device, method for manufacturing exposure device and method for manufacturing microdevice |
| JP2001338867A (en) * | 2000-05-30 | 2001-12-07 | Nikon Corp | Lighting device, position-measuring device, and aligner and exposure method |
-
2005
- 2005-02-10 JP JP2005034108A patent/JP4785389B2/en not_active Expired - Fee Related
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