JP4498060B2 - 投影光学系、露光装置及び光学素子の製造方法 - Google Patents

投影光学系、露光装置及び光学素子の製造方法 Download PDF

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Publication number
JP4498060B2
JP4498060B2 JP2004237899A JP2004237899A JP4498060B2 JP 4498060 B2 JP4498060 B2 JP 4498060B2 JP 2004237899 A JP2004237899 A JP 2004237899A JP 2004237899 A JP2004237899 A JP 2004237899A JP 4498060 B2 JP4498060 B2 JP 4498060B2
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Japan
Prior art keywords
optical system
projection optical
light
incident
multilayer film
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Expired - Fee Related
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JP2004237899A
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Japanese (ja)
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JP2006059889A (ja
JP2006059889A5 (enExample
Inventor
正磨 加藤
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Canon Inc
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Canon Inc
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Priority to JP2004237899A priority Critical patent/JP4498060B2/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
  • Optical Filters (AREA)
JP2004237899A 2004-08-18 2004-08-18 投影光学系、露光装置及び光学素子の製造方法 Expired - Fee Related JP4498060B2 (ja)

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JP2004237899A JP4498060B2 (ja) 2004-08-18 2004-08-18 投影光学系、露光装置及び光学素子の製造方法

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JP2004237899A JP4498060B2 (ja) 2004-08-18 2004-08-18 投影光学系、露光装置及び光学素子の製造方法

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JP2006059889A JP2006059889A (ja) 2006-03-02
JP2006059889A5 JP2006059889A5 (enExample) 2007-09-27
JP4498060B2 true JP4498060B2 (ja) 2010-07-07

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1930771A1 (en) * 2006-12-04 2008-06-11 Carl Zeiss SMT AG Projection objectives having mirror elements with reflective coatings
JP5269079B2 (ja) 2007-08-20 2013-08-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射コーティングを備えたミラー要素を有する投影対物系
JP2010199503A (ja) * 2009-02-27 2010-09-09 Nikon Corp 光学素子、露光装置及びデバイス製造方法
DE102009047179B8 (de) 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh Projektionsobjektiv
WO2013146488A1 (ja) * 2012-03-28 2013-10-03 Hoya株式会社 多層反射膜付き基板の製造方法、反射型マスクブランクの製造方法、及び反射型マスクの製造方法
JP5746259B2 (ja) * 2013-05-07 2015-07-08 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射コーティングを備えたミラー要素を有する投影対物系

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2569447B2 (ja) * 1988-11-28 1997-01-08 株式会社ニコン 多層膜反射鏡の製造方法
JP2002162566A (ja) * 2000-11-27 2002-06-07 Nikon Corp 光学系の設計方法，光学系および投影露光装置
DE50208750D1 (de) * 2001-08-01 2007-01-04 Zeiss Carl Smt Ag Reflektives Projektionsobjektiv für EUV-Photolithographie
JP2003077805A (ja) * 2001-09-03 2003-03-14 Nikon Corp 光学系の製造方法およびｅｕｖ露光装置

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