JP2006030319A - グレートーンマスク及びグレートーンマスクの製造方法 - Google Patents

グレートーンマスク及びグレートーンマスクの製造方法 Download PDF

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Publication number
JP2006030319A
JP2006030319A JP2004205306A JP2004205306A JP2006030319A JP 2006030319 A JP2006030319 A JP 2006030319A JP 2004205306 A JP2004205306 A JP 2004205306A JP 2004205306 A JP2004205306 A JP 2004205306A JP 2006030319 A JP2006030319 A JP 2006030319A
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JP
Japan
Prior art keywords
pattern
resist pattern
resist
film
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004205306A
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English (en)
Japanese (ja)
Inventor
Michiaki Sano
道明 佐野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2004205306A priority Critical patent/JP2006030319A/ja
Priority to TW094123347A priority patent/TW200608579A/zh
Priority to CNB2005100840683A priority patent/CN100562803C/zh
Priority to KR1020050062864A priority patent/KR100965181B1/ko
Priority to CN200910179767A priority patent/CN101673049A/zh
Publication of JP2006030319A publication Critical patent/JP2006030319A/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H10D86/0231—Manufacture or treatment of multiple TFTs using masks, e.g. half-tone masks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Junction Field-Effect Transistors (AREA)
JP2004205306A 2004-07-12 2004-07-12 グレートーンマスク及びグレートーンマスクの製造方法 Pending JP2006030319A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004205306A JP2006030319A (ja) 2004-07-12 2004-07-12 グレートーンマスク及びグレートーンマスクの製造方法
TW094123347A TW200608579A (en) 2004-07-12 2005-07-11 Gray tone mask and method for manufacturing the same
CNB2005100840683A CN100562803C (zh) 2004-07-12 2005-07-12 灰色调掩模和灰色调掩模的制造方法
KR1020050062864A KR100965181B1 (ko) 2004-07-12 2005-07-12 그레이톤 마스크 및 그레이톤 마스크의 제조방법
CN200910179767A CN101673049A (zh) 2004-07-12 2005-07-12 灰色调掩模和灰色调掩模的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004205306A JP2006030319A (ja) 2004-07-12 2004-07-12 グレートーンマスク及びグレートーンマスクの製造方法

Publications (1)

Publication Number Publication Date
JP2006030319A true JP2006030319A (ja) 2006-02-02

Family

ID=35896788

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004205306A Pending JP2006030319A (ja) 2004-07-12 2004-07-12 グレートーンマスク及びグレートーンマスクの製造方法

Country Status (4)

Country Link
JP (1) JP2006030319A (https=)
KR (1) KR100965181B1 (https=)
CN (2) CN101673049A (https=)
TW (1) TW200608579A (https=)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100663115B1 (ko) 2004-07-12 2007-01-02 호야 가부시키가이샤 그레이톤 마스크 및 그레이톤 마스크의 제조 방법
WO2007091572A1 (ja) 2006-02-07 2007-08-16 Ntt Docomo, Inc. 移動局、無線アクセスネットワーク装置およびリソース要求方法
JP2007248802A (ja) * 2006-03-16 2007-09-27 Hoya Corp パターン形成方法及びグレートーンマスクの製造方法
JP2008102465A (ja) * 2006-10-23 2008-05-01 Sk Electronics:Kk ハーフトーンマスク及びその製造方法
JP2009230126A (ja) * 2008-02-26 2009-10-08 Hoya Corp 多階調フォトマスク、その製造方法及びパターン転写方法
JP2009294682A (ja) * 2009-09-24 2009-12-17 Hoya Corp マスクブランク及びフォトマスク
JP2010072406A (ja) * 2008-09-19 2010-04-02 Hoya Corp フォトマスクブランク、フォトマスク及びこれらの製造方法
JP2010191310A (ja) * 2009-02-20 2010-09-02 Hoya Corp 多階調フォトマスクの製造方法、及び半導体トランジスタの製造方法
JP2011227223A (ja) * 2010-04-19 2011-11-10 Hoya Corp 多階調マスクの製造方法およびエッチング装置
WO2013094756A1 (ja) * 2011-12-21 2013-06-27 大日本印刷株式会社 大型位相シフトマスクおよび大型位相シフトマスクの製造方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5429590B2 (ja) * 2007-07-10 2014-02-26 Ｎｌｔテクノロジー株式会社 ハーフトーンマスク
CN101546733B (zh) * 2008-03-28 2011-07-27 北京京东方光电科技有限公司 Tft-lcd阵列基板和彩膜基板的制造方法
KR101295235B1 (ko) * 2008-08-15 2013-08-12 신에쓰 가가꾸 고교 가부시끼가이샤 그레이톤 마스크 블랭크, 그레이톤 마스크, 및 제품 가공 표지 또는 제품 정보 표지의 형성방법
CN101656233B (zh) * 2008-08-22 2012-10-24 群康科技(深圳)有限公司 薄膜晶体管基板的制造方法
CN101661907B (zh) * 2008-08-27 2011-12-28 北京京东方光电科技有限公司 液晶显示装置的阵列基板制造方法
CN102331637A (zh) * 2011-09-28 2012-01-25 深圳市华星光电技术有限公司 一种专用遮光板及其制作方法、液晶面板的制作方法
CN104407496A (zh) * 2014-10-28 2015-03-11 京东方科技集团股份有限公司 一种掩模板
CN108563098A (zh) * 2018-01-17 2018-09-21 京东方科技集团股份有限公司 一种掩膜版及其制备方法
CN109634052A (zh) * 2018-12-05 2019-04-16 惠科股份有限公司 光罩及光罩的制作方法
CN111367142A (zh) * 2018-12-26 2020-07-03 聚灿光电科技（宿迁）有限公司 一种包含不同透光性的新型光学掩膜版

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09127677A (ja) * 1995-10-31 1997-05-16 Nec Corp フォトマスク及びその製造方法
JPH10326009A (ja) * 1997-03-24 1998-12-08 Hitachi Ltd 半導体集積回路装置の製造方法
JPH11125894A (ja) * 1997-10-24 1999-05-11 Nec Corp フォトマスク及びその設計方法
JP2002261078A (ja) * 2001-02-27 2002-09-13 Nec Kagoshima Ltd パターン形成方法および液晶表示装置の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3429125B2 (ja) * 1995-12-21 2003-07-22 沖電気工業株式会社 位相シフトマスク及びそのマスクを用いたレジストパターンの形成方法
KR100219079B1 (ko) * 1996-06-29 1999-09-01 김영환 해프톤 위상 반전 마스크
KR100601168B1 (ko) * 1999-05-13 2006-07-13 삼성전자주식회사 박막 트랜지스터 기판 및 그의 제조 방법
US6255130B1 (en) * 1998-11-19 2001-07-03 Samsung Electronics Co., Ltd. Thin film transistor array panel and a method for manufacturing the same
JP2003173015A (ja) * 2001-09-28 2003-06-20 Hoya Corp グレートーンマスクの製造方法
CN1231813C (zh) * 2002-06-25 2005-12-14 Hoya株式会社 灰调掩模

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09127677A (ja) * 1995-10-31 1997-05-16 Nec Corp フォトマスク及びその製造方法
JPH10326009A (ja) * 1997-03-24 1998-12-08 Hitachi Ltd 半導体集積回路装置の製造方法
JPH11125894A (ja) * 1997-10-24 1999-05-11 Nec Corp フォトマスク及びその設計方法
JP2002261078A (ja) * 2001-02-27 2002-09-13 Nec Kagoshima Ltd パターン形成方法および液晶表示装置の製造方法

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100663115B1 (ko) 2004-07-12 2007-01-02 호야 가부시키가이샤 그레이톤 마스크 및 그레이톤 마스크의 제조 방법
WO2007091572A1 (ja) 2006-02-07 2007-08-16 Ntt Docomo, Inc. 移動局、無線アクセスネットワーク装置およびリソース要求方法
EP3592096A1 (en) 2006-02-07 2020-01-08 NTT DoCoMo, Inc. Mobile station, radio access network device, and resource request method
JP2007248802A (ja) * 2006-03-16 2007-09-27 Hoya Corp パターン形成方法及びグレートーンマスクの製造方法
JP2008102465A (ja) * 2006-10-23 2008-05-01 Sk Electronics:Kk ハーフトーンマスク及びその製造方法
JP2009230126A (ja) * 2008-02-26 2009-10-08 Hoya Corp 多階調フォトマスク、その製造方法及びパターン転写方法
JP2010072406A (ja) * 2008-09-19 2010-04-02 Hoya Corp フォトマスクブランク、フォトマスク及びこれらの製造方法
JP2010191310A (ja) * 2009-02-20 2010-09-02 Hoya Corp 多階調フォトマスクの製造方法、及び半導体トランジスタの製造方法
JP2009294682A (ja) * 2009-09-24 2009-12-17 Hoya Corp マスクブランク及びフォトマスク
JP2011227223A (ja) * 2010-04-19 2011-11-10 Hoya Corp 多階調マスクの製造方法およびエッチング装置
TWI505325B (zh) * 2010-04-19 2015-10-21 Ｈｏｙａ股份有限公司 多階調遮罩之製造方法及蝕刻裝置
WO2013094756A1 (ja) * 2011-12-21 2013-06-27 大日本印刷株式会社 大型位相シフトマスクおよび大型位相シフトマスクの製造方法
JP2013148892A (ja) * 2011-12-21 2013-08-01 Dainippon Printing Co Ltd 大型位相シフトマスクおよび大型位相シフトマスクの製造方法

Also Published As

Publication number Publication date
KR20060050099A (ko) 2006-05-19
TWI355080B (https=) 2011-12-21
KR100965181B1 (ko) 2010-06-24
CN100562803C (zh) 2009-11-25
CN101673049A (zh) 2010-03-17
CN1721988A (zh) 2006-01-18
TW200608579A (en) 2006-03-01

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