TW200608579A - Gray tone mask and method for manufacturing the same - Google Patents
Gray tone mask and method for manufacturing the sameInfo
- Publication number
- TW200608579A TW200608579A TW094123347A TW94123347A TW200608579A TW 200608579 A TW200608579 A TW 200608579A TW 094123347 A TW094123347 A TW 094123347A TW 94123347 A TW94123347 A TW 94123347A TW 200608579 A TW200608579 A TW 200608579A
- Authority
- TW
- Taiwan
- Prior art keywords
- forming part
- resist pattern
- pattern forming
- tone mask
- gray tone
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- 239000010408 film Substances 0.000 abstract 2
- 239000010409 thin film Substances 0.000 abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 238000002834 transmittance Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
- G02F1/136236—Active matrix addressed cells for reducing the number of lithographic steps using a grey or half tone lithographic process
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/13625—Patterning using multi-mask exposure
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Junction Field-Effect Transistors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004205306A JP2006030319A (ja) | 2004-07-12 | 2004-07-12 | グレートーンマスク及びグレートーンマスクの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200608579A true TW200608579A (en) | 2006-03-01 |
TWI355080B TWI355080B (zh) | 2011-12-21 |
Family
ID=35896788
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094123347A TW200608579A (en) | 2004-07-12 | 2005-07-11 | Gray tone mask and method for manufacturing the same |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2006030319A (zh) |
KR (1) | KR100965181B1 (zh) |
CN (2) | CN100562803C (zh) |
TW (1) | TW200608579A (zh) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006030320A (ja) | 2004-07-12 | 2006-02-02 | Hoya Corp | グレートーンマスク及びグレートーンマスクの製造方法 |
JP4786359B2 (ja) | 2006-02-07 | 2011-10-05 | 株式会社エヌ・ティ・ティ・ドコモ | 移動局、無線アクセスネットワーク装置およびリソース要求方法 |
JP2007248802A (ja) * | 2006-03-16 | 2007-09-27 | Hoya Corp | パターン形成方法及びグレートーンマスクの製造方法 |
JP2008102465A (ja) * | 2006-10-23 | 2008-05-01 | Sk Electronics:Kk | ハーフトーンマスク及びその製造方法 |
JP5429590B2 (ja) * | 2007-07-10 | 2014-02-26 | Nltテクノロジー株式会社 | ハーフトーンマスク |
JP5336226B2 (ja) * | 2008-02-26 | 2013-11-06 | Hoya株式会社 | 多階調フォトマスクの製造方法 |
CN101546733B (zh) * | 2008-03-28 | 2011-07-27 | 北京京东方光电科技有限公司 | Tft-lcd阵列基板和彩膜基板的制造方法 |
KR101295235B1 (ko) * | 2008-08-15 | 2013-08-12 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 그레이톤 마스크 블랭크, 그레이톤 마스크, 및 제품 가공 표지 또는 제품 정보 표지의 형성방법 |
CN101656233B (zh) * | 2008-08-22 | 2012-10-24 | 群康科技(深圳)有限公司 | 薄膜晶体管基板的制造方法 |
CN101661907B (zh) * | 2008-08-27 | 2011-12-28 | 北京京东方光电科技有限公司 | 液晶显示装置的阵列基板制造方法 |
JP5510947B2 (ja) * | 2008-09-19 | 2014-06-04 | Hoya株式会社 | フォトマスクの製造方法およびフォトマスク |
JP2010191310A (ja) * | 2009-02-20 | 2010-09-02 | Hoya Corp | 多階調フォトマスクの製造方法、及び半導体トランジスタの製造方法 |
JP2009294682A (ja) * | 2009-09-24 | 2009-12-17 | Hoya Corp | マスクブランク及びフォトマスク |
JP5123349B2 (ja) * | 2010-04-19 | 2013-01-23 | Hoya株式会社 | 多階調マスクの製造方法 |
CN102331637A (zh) * | 2011-09-28 | 2012-01-25 | 深圳市华星光电技术有限公司 | 一种专用遮光板及其制作方法、液晶面板的制作方法 |
CN108267927B (zh) * | 2011-12-21 | 2021-08-24 | 大日本印刷株式会社 | 大型相移掩膜 |
CN104407496A (zh) * | 2014-10-28 | 2015-03-11 | 京东方科技集团股份有限公司 | 一种掩模板 |
CN108563098A (zh) * | 2018-01-17 | 2018-09-21 | 京东方科技集团股份有限公司 | 一种掩膜版及其制备方法 |
CN109634052A (zh) * | 2018-12-05 | 2019-04-16 | 惠科股份有限公司 | 光罩及光罩的制作方法 |
CN111367142A (zh) * | 2018-12-26 | 2020-07-03 | 聚灿光电科技(宿迁)有限公司 | 一种包含不同透光性的新型光学掩膜版 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2917879B2 (ja) * | 1995-10-31 | 1999-07-12 | 日本電気株式会社 | フォトマスク及びその製造方法 |
JP3429125B2 (ja) * | 1995-12-21 | 2003-07-22 | 沖電気工業株式会社 | 位相シフトマスク及びそのマスクを用いたレジストパターンの形成方法 |
KR100219079B1 (ko) * | 1996-06-29 | 1999-09-01 | 김영환 | 해프톤 위상 반전 마스크 |
JP3619664B2 (ja) * | 1997-03-24 | 2005-02-09 | 株式会社ルネサステクノロジ | 半導体集積回路装置の製造方法 |
JP3178391B2 (ja) * | 1997-10-24 | 2001-06-18 | 日本電気株式会社 | フォトマスクの設計方法 |
KR100601168B1 (ko) * | 1999-05-13 | 2006-07-13 | 삼성전자주식회사 | 박막 트랜지스터 기판 및 그의 제조 방법 |
JP4410951B2 (ja) * | 2001-02-27 | 2010-02-10 | Nec液晶テクノロジー株式会社 | パターン形成方法および液晶表示装置の製造方法 |
-
2004
- 2004-07-12 JP JP2004205306A patent/JP2006030319A/ja active Pending
-
2005
- 2005-07-11 TW TW094123347A patent/TW200608579A/zh unknown
- 2005-07-12 KR KR1020050062864A patent/KR100965181B1/ko active IP Right Grant
- 2005-07-12 CN CNB2005100840683A patent/CN100562803C/zh not_active Expired - Fee Related
- 2005-07-12 CN CN200910179767A patent/CN101673049A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20060050099A (ko) | 2006-05-19 |
KR100965181B1 (ko) | 2010-06-24 |
CN1721988A (zh) | 2006-01-18 |
CN101673049A (zh) | 2010-03-17 |
TWI355080B (zh) | 2011-12-21 |
CN100562803C (zh) | 2009-11-25 |
JP2006030319A (ja) | 2006-02-02 |
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