TW200732829A - Mask blank and photomask - Google Patents

Mask blank and photomask

Info

Publication number
TW200732829A
TW200732829A TW095148957A TW95148957A TW200732829A TW 200732829 A TW200732829 A TW 200732829A TW 095148957 A TW095148957 A TW 095148957A TW 95148957 A TW95148957 A TW 95148957A TW 200732829 A TW200732829 A TW 200732829A
Authority
TW
Taiwan
Prior art keywords
light transparent
semi
mask
mask blank
transparent film
Prior art date
Application number
TW095148957A
Other languages
Chinese (zh)
Other versions
TWI417644B (en
Inventor
Masaru Mitsui
Michiaki Sano
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200732829A publication Critical patent/TW200732829A/en
Application granted granted Critical
Publication of TWI417644B publication Critical patent/TWI417644B/en

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)

Abstract

To provide a large mask and a mask blank for FPD suitable for multicolor exposure. A mask blank for the manufacture of an FPD device, comprising a light transparent substrate and at least a semi-light transparent film for a gray tone mask having the function of regulating transmission amount provided on the light transparent substrate, characterized in that the semi-light transparent film for a gray tone mask is a film regulated so that, in a wavelength range at least from I line to g line radiated from an ultrahigh pressure mercury lamp, the transmittance (that is, semitransmittance) range of the semi-light transparent film is within less than 5%.
TW95148957A 2005-12-26 2006-12-26 Mask base and mask TWI417644B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005371970 2005-12-26
JP2006348984A JP4516560B2 (en) 2005-12-26 2006-12-26 Mask blank and photomask

Publications (2)

Publication Number Publication Date
TW200732829A true TW200732829A (en) 2007-09-01
TWI417644B TWI417644B (en) 2013-12-01

Family

ID=38454326

Family Applications (3)

Application Number Title Priority Date Filing Date
TW104124008A TWI569092B (en) 2005-12-26 2006-12-26 A mask substrate and a mask for manufacturing a flat panel display device
TW102138847A TWI498667B (en) 2005-12-26 2006-12-26 A mask substrate and a mask for manufacturing a flat panel display device
TW95148957A TWI417644B (en) 2005-12-26 2006-12-26 Mask base and mask

Family Applications Before (2)

Application Number Title Priority Date Filing Date
TW104124008A TWI569092B (en) 2005-12-26 2006-12-26 A mask substrate and a mask for manufacturing a flat panel display device
TW102138847A TWI498667B (en) 2005-12-26 2006-12-26 A mask substrate and a mask for manufacturing a flat panel display device

Country Status (2)

Country Link
JP (1) JP4516560B2 (en)
TW (3) TWI569092B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008052120A (en) * 2006-08-25 2008-03-06 Hoya Corp Mask blank, photomask, and method for manufacturing same
JP5407125B2 (en) * 2007-08-29 2014-02-05 大日本印刷株式会社 Gradation mask
JP4934236B2 (en) * 2007-09-29 2012-05-16 Ｈｏｙａ株式会社 Gray tone mask blank, gray tone mask manufacturing method, gray tone mask, and pattern transfer method
JP2009086383A (en) * 2007-09-29 2009-04-23 Hoya Corp Gray tone mask, pattern transfer method and gray tone mask blank
JP4934237B2 (en) * 2007-09-29 2012-05-16 Ｈｏｙａ株式会社 Gray-tone mask manufacturing method, gray-tone mask, and pattern transfer method
JP5097528B2 (en) * 2007-12-18 2012-12-12 Ｈｏｙａ株式会社 Multi-tone photomask
JP5336226B2 (en) * 2008-02-26 2013-11-06 Ｈｏｙａ株式会社 Multi-tone photomask manufacturing method
JP5215019B2 (en) * 2008-03-28 2013-06-19 Ｈｏｙａ株式会社 Multi-tone photomask, manufacturing method thereof, and pattern transfer method
JP2010044149A (en) 2008-08-11 2010-02-25 Hoya Corp Multi-gradation photomask, pattern transfer method, and manufacturing method of display unit using multi-gradation photomask
JP5121020B2 (en) * 2008-09-26 2013-01-16 Ｈｏｙａ株式会社 Multi-tone photomask, photomask blank, and pattern transfer method
WO2010150355A1 (en) * 2009-06-23 2010-12-29 Hoya株式会社 Multilevel gradation photomask
JP7037919B2 (en) 2017-11-14 2022-03-17 アルバック成膜株式会社 Mask blank, halftone mask and its manufacturing method
JP2024004082A (en) 2022-06-28 2024-01-16 Hoya株式会社 Mask blank, mask for transcription, method for manufacturing mask for transcription, and method for manufacturing display device
JP2024006605A (en) 2022-07-04 2024-01-17 Hoya株式会社 Mask blank, mask for transcription, method for manufacturing mask for transcription, and method for manufacturing display device

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JPH01214859A (en) * 1988-02-24 1989-08-29 Hitachi Ltd Mask
KR100295385B1 (en) * 1993-04-09 2001-09-17 기타지마 요시토시 Halftone Phase Shift Photomask, Blanks for Halftone Phase Shift Photomask and Manufacturing Method thereof
JP3262302B2 (en) * 1993-04-09 2002-03-04 大日本印刷株式会社 Phase shift photomask, blank for phase shift photomask, and method of manufacturing the same
KR100311704B1 (en) * 1993-08-17 2001-12-15 기타오카 다카시 Halftone Phase Shift Photomask, Blanks for Halftone Phase Shift Photomask and Manufacturing Method of the Blanks
JP3289606B2 (en) * 1996-07-11 2002-06-10 凸版印刷株式会社 Blank for halftone type phase shift mask and halftone type phase shift mask
TW358170B (en) * 1997-06-10 1999-05-11 Taiwan Semiconductor Mfg Co Ltd Semi-transparent phase shift mask structure and the manufacturing method
JPH11125896A (en) * 1997-08-19 1999-05-11 Toppan Printing Co Ltd Photomask blank and photomask
TW479159B (en) * 2001-02-09 2002-03-11 Nanya Technology Corp Interlacing phase shift mask and its manufacturing method
JP2003029393A (en) * 2001-07-12 2003-01-29 Matsushita Electric Ind Co Ltd Mask, pattern forming method using the same, and lithography
JP2003195483A (en) * 2001-12-28 2003-07-09 Hoya Corp Photomask blank, photomask and method for manufacturing the same
JP2003322947A (en) * 2002-04-26 2003-11-14 Hoya Corp Halftone phase shifting mask blank and halftone phase shifting mask
GB0215243D0 (en) * 2002-07-02 2002-08-14 Koninkl Philips Electronics Nv Mask and manufacturing method using mask
JP2004177683A (en) * 2002-11-27 2004-06-24 Clariant (Japan) Kk Method for forming pattern by using ultrahigh heat-resistant positive photosensitive composition
US20060057469A1 (en) * 2003-02-03 2006-03-16 Mitsuhiro Kureishi Photomask blank, photomask, and pattern transfer method using photomask
WO2004090635A1 (en) * 2003-04-09 2004-10-21 Hoya Corporation Method of producing photomask and photomask blank
JP4393290B2 (en) * 2003-06-30 2010-01-06 Ｈｏｙａ株式会社 Method for manufacturing gray tone mask and method for manufacturing thin film transistor substrate
JP4385690B2 (en) * 2003-09-09 2009-12-16 凸版印刷株式会社 Exposure mask for manufacturing liquid crystal display element and method for manufacturing the same
JP4919220B2 (en) * 2005-02-28 2012-04-18 Ｈｏｙａ株式会社 Gray tone mask
JP4961990B2 (en) * 2005-12-14 2012-06-27 大日本印刷株式会社 Mask blank and gradation mask

Also Published As

Publication number Publication date
TWI417644B (en) 2013-12-01
TW201407260A (en) 2014-02-16
TWI498667B (en) 2015-09-01
TW201541186A (en) 2015-11-01
TWI569092B (en) 2017-02-01
JP4516560B2 (en) 2010-08-04
JP2007199700A (en) 2007-08-09

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