JP2006019798A - マイクロ波回路 - Google Patents
マイクロ波回路 Download PDFInfo
- Publication number
- JP2006019798A JP2006019798A JP2004192792A JP2004192792A JP2006019798A JP 2006019798 A JP2006019798 A JP 2006019798A JP 2004192792 A JP2004192792 A JP 2004192792A JP 2004192792 A JP2004192792 A JP 2004192792A JP 2006019798 A JP2006019798 A JP 2006019798A
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- JP
- Japan
- Prior art keywords
- ground conductor
- dielectric substrate
- hole
- connection means
- fet chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/4905—Shape
- H01L2224/49051—Connectors having different shapes
- H01L2224/49052—Different loop heights
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49175—Parallel arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Landscapes
- Waveguides (AREA)
- Microwave Amplifiers (AREA)
Abstract
【解決手段】 一面に分岐回路9、10などが形成され、他面側に接地導体1が設けられる誘電体基板2に貫通孔4が形成され、その貫通孔4内に多フィンガーFETチップ3が装着され、この貫通孔4の近傍で、誘電体基板2の一面に接地導体1と電気的に接続して接地導体膜5が設けられている。そして、多フィンガーFET3の複数のソース電極と接地導体膜5とが、第1の接続手段6により電気的に接続され、多フィンガーFETチップ3の複数のゲート電極と誘電体基板2の一面に設けられる入力側分岐回路9とが、第2の接続手段7により電気的に接続され、この第1の接続手段6の少なくとも1つは、第2の接続手段7の2つの間に設けられる構造になっている。
【選択図】 図1
Description
2 誘電体基板
3 多フィンガーFETチップ
4 貫通孔
5 接地導体膜
6 第1の接続手段
7 第2の接続手段
8 第3の接続手段
9 入力側分岐回路
10 出力側分岐回路
11 入力線路
12 出力線路
Claims (1)
- 一面に配線が形成され、他面側に接地導体が設けられる誘電体基板と、該誘電体基板に形成された貫通孔内に装着される多フィンガーFETチップと、前記貫通孔近傍で前記誘電体基板の一面に前記接地導体と電気的に接続して設けられる接地導体膜と、前記多フィンガーFETチップの複数のソース電極と前記接地導体膜とを電気的に接続する第1の接続手段と、前記多フィンガーFETチップの複数のゲート電極と前記誘電体基板の一面に設けられるゲート配線とを電気的に接続する第2の接続手段とを有し、前記第1の接続手段の少なくとも1つは、前記第2の接続手段の2つの間に設けられる構造であることを特徴とするマイクロ波回路。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004192792A JP2006019798A (ja) | 2004-06-30 | 2004-06-30 | マイクロ波回路 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004192792A JP2006019798A (ja) | 2004-06-30 | 2004-06-30 | マイクロ波回路 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006019798A true JP2006019798A (ja) | 2006-01-19 |
Family
ID=35793679
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004192792A Pending JP2006019798A (ja) | 2004-06-30 | 2004-06-30 | マイクロ波回路 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2006019798A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007103391A (ja) * | 2005-01-06 | 2007-04-19 | Mitsubishi Electric Corp | 半導体増幅器 |
JP2007267026A (ja) * | 2006-03-28 | 2007-10-11 | Fujitsu Ltd | 高出力増幅器 |
JP2012508459A (ja) * | 2008-11-12 | 2012-04-05 | テレフオンアクチーボラゲット エル エム エリクソン(パブル) | 改良された大面積光検出器 |
US9503035B2 (en) | 2013-12-18 | 2016-11-22 | Tdk Corporation | High-frequency amplifier |
-
2004
- 2004-06-30 JP JP2004192792A patent/JP2006019798A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007103391A (ja) * | 2005-01-06 | 2007-04-19 | Mitsubishi Electric Corp | 半導体増幅器 |
JP4579040B2 (ja) * | 2005-01-06 | 2010-11-10 | 三菱電機株式会社 | 半導体増幅器 |
JP2007267026A (ja) * | 2006-03-28 | 2007-10-11 | Fujitsu Ltd | 高出力増幅器 |
JP2012508459A (ja) * | 2008-11-12 | 2012-04-05 | テレフオンアクチーボラゲット エル エム エリクソン(パブル) | 改良された大面積光検出器 |
US9503035B2 (en) | 2013-12-18 | 2016-11-22 | Tdk Corporation | High-frequency amplifier |
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