JP2005536042A - シャワーヘッドの改良 - Google Patents
シャワーヘッドの改良 Download PDFInfo
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- JP2005536042A JP2005536042A JP2004526997A JP2004526997A JP2005536042A JP 2005536042 A JP2005536042 A JP 2005536042A JP 2004526997 A JP2004526997 A JP 2004526997A JP 2004526997 A JP2004526997 A JP 2004526997A JP 2005536042 A JP2005536042 A JP 2005536042A
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- sheet
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- showerhead
- face plate
- shower head
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- 238000012545 processing Methods 0.000 claims abstract description 46
- 239000012530 fluid Substances 0.000 claims abstract description 14
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- 238000005192 partition Methods 0.000 claims description 13
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- 229910052751 metal Inorganic materials 0.000 claims description 7
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- 238000001259 photo etching Methods 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 238000001020 plasma etching Methods 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims description 2
- 239000002516 radical scavenger Substances 0.000 claims description 2
- 238000009760 electrical discharge machining Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 34
- 239000000463 material Substances 0.000 description 16
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- 235000012431 wafers Nutrition 0.000 description 7
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- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000002173 cutting fluid Substances 0.000 description 3
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- 239000004065 semiconductor Substances 0.000 description 3
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
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- 239000002985 plastic film Substances 0.000 description 1
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
Abstract
Description
気体容器へ通じる気体入口、
前記気体入口と処理スペースとの間に取り付けられかつ複数の孔を有する面板、および
前記面板の孔の最小直径よりも小さい寸法の複数の孔を有するシート(sheet)を含む基板を処理するためのシャワーヘッドが提供され、
前記シートは、流体が前記シートの孔を介して前記気体容器から前記処理スペースへ通過するように、前記シャワーヘッド内または前記シャワーヘッド上に取り付けられていることを特徴とする。
シートに複数の孔を形成する工程、および
気体容器に通じる気体入口、および前記気体容器と処理スペースとの間に取り付けられた面板を有するシャワーヘッドに、前記気体容器から前記シートの孔そして同様に前記面板の孔を介して前記処理スペースへ流体が通過するように、前記シャワーヘッド内または上に前記シートを取り付ける工程を含む。
Claims (21)
- 気体容器(10)へ通じる気体入口(8)、
前記気体容器と処理スペース(11)との間に取り付けられかつ複数の孔(9)を有する面板(6)、および
前記面板の孔の最小直径よりも小さい寸法の複数の孔(18)を有するシート(16)を含む基板(3)を処理するためのシャワーヘッド(5)であって、
前記シートは、流体が前記シートの孔を介して前記気体容器から前記処理スペースへ通過するように前記シャワーヘッド内または前記シャワーヘッド上に取り付けられている、シャワーヘッド。 - 前記シート(16)は前記面板(6)に封止されている、請求項1のシャワーヘッド。
- 前記シート(16)は前記面板(6)へ取り付けられている、請求項1または2のシャワーヘッド。
- 前記シート(16)は前記気体容器(10)と前記面板(6)との間に取り付けられている、請求項1から3のいずれか1のシャワーヘッド。
- 前記面板の孔(9)の少なくとも幾つかは前記シートの孔(18)と整列していない、請求項4のシャワーヘッド。
- 前記シート(16)は前記面板(6)と前記処理スペース(11)との間に取り付けられている、請求項1から3のいずれか1のシャワーヘッド。
- 前記シート(16)はフッ素掃去剤で形成されている、請求項6のシャワーヘッド。
- 前記シート(16)は珪素または炭素を含む、請求項6のシャワーヘッド。
- 前記面板の孔(9)および前記シートの孔(18)は実質的に整列している、請求項1から8のいずれか1のシャワーヘッド。
- 前記シャワーヘッド(5)は、複数の孔を有する仕切板(19)を更に含み、前記仕切板は二つの容器を形成し、かつ前記シート(16)は前記仕切板に隣接して取り付けられている、請求項1から9のいずれか1のシャワーヘッド。
- 前記シート(16)は前記仕切板(19)の孔と前記面板(6)の孔(9)との間に取り付けられている、請求項10のシャワーヘッド。
- 前記シャワーヘッドは、更に、前記シート(16)に隣接する他のシート(19)を含み、前記他のシートの孔は前記シート(16)の孔よりも大きい寸法であり、前記シートおよび前記他のシートは流体がそれらの両シートの孔へ流れるように構成されている、請求項1から11のいずれか1のシャワーヘッド。
- 前記シート(16)は弾性材または金属またはプラスチックで形成されている、請求項1から12のいずれか1のシャワーヘッド。
- 前記他のシート(19)は弾性材で形成されている、請求項12のシャワーヘッド。
- 前記シートの孔(18)は略0.5mmまたはそれよりも小さい直径である、請求項1から14のいずれか1のシャワーヘッド。
- 前記シートの孔(18)は略0.15mmの直径である、請求項1から15のいずれか1のシャワーヘッド。
- シート(16)に複数の孔(18)を形成し、かつ
気体容器(10)に通じる気体入口(8)、および前記気体容器と処理スペース(11)との間に取り付けられた面板(6)を有するシャワーヘッド(5)のシャワーヘッド内または上に、前記気体容器から前記シートの孔を介して前記処理スペースへ流体が通過するように、前記シートを取り付ける、各工程を含む基板処理用シャワーヘッド(5)を製造する方法。 - 前記シートの孔(18)はフォトエッチング、スパーク腐蝕、レーザー成形、金型成形、スタンピング、ダイカッティング、またはプラズマエッチングにより形成される、請求項17の方法。
- 基板処理用のシャワーヘッド(5)に取り付けられるシート(16)であって、
前記シャワーヘッドの面板(6)内の孔(9)の最小直径よりも小さい直径の複数の孔(18)を有する、シート。 - 前記シート(16)の厚みが1mmよりも小さい、請求項19のシート。
- 少なくとも一部が弾性材により形成されている、請求項19または20のシート。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US40176902P | 2002-08-08 | 2002-08-08 | |
GB0218371A GB0218371D0 (en) | 2002-08-08 | 2002-08-08 | Improvements to showerheads |
PCT/GB2003/003113 WO2004015165A1 (en) | 2002-08-08 | 2003-07-16 | Improvements to showerheads |
Publications (1)
Publication Number | Publication Date |
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JP2005536042A true JP2005536042A (ja) | 2005-11-24 |
Family
ID=31716920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004526997A Pending JP2005536042A (ja) | 2002-08-08 | 2003-07-16 | シャワーヘッドの改良 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20040123800A1 (ja) |
JP (1) | JP2005536042A (ja) |
AU (1) | AU2003282533A1 (ja) |
DE (1) | DE10392996T5 (ja) |
GB (1) | GB2406583B (ja) |
WO (1) | WO2004015165A1 (ja) |
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WO2013070438A1 (en) * | 2011-11-08 | 2013-05-16 | Applied Materials, Inc. | Precursor distribution features for improved deposition uniformity |
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Also Published As
Publication number | Publication date |
---|---|
US20040123800A1 (en) | 2004-07-01 |
DE10392996T5 (de) | 2005-07-21 |
GB2406583A (en) | 2005-04-06 |
WO2004015165A1 (en) | 2004-02-19 |
GB0501776D0 (en) | 2005-03-02 |
GB2406583B (en) | 2005-12-21 |
AU2003282533A1 (en) | 2004-02-25 |
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