JP2005534978A5 - - Google Patents

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Publication number
JP2005534978A5
JP2005534978A5 JP2004525977A JP2004525977A JP2005534978A5 JP 2005534978 A5 JP2005534978 A5 JP 2005534978A5 JP 2004525977 A JP2004525977 A JP 2004525977A JP 2004525977 A JP2004525977 A JP 2004525977A JP 2005534978 A5 JP2005534978 A5 JP 2005534978A5
Authority
JP
Japan
Prior art keywords
film
opening
forming
transparent substrate
phase shift
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004525977A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005534978A (ja
Filing date
Publication date
Priority claimed from US10/213,344 external-priority patent/US6797440B2/en
Application filed filed Critical
Publication of JP2005534978A publication Critical patent/JP2005534978A/ja
Publication of JP2005534978A5 publication Critical patent/JP2005534978A5/ja
Pending legal-status Critical Current

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JP2004525977A 2002-08-06 2003-05-15 リム位相シフトマスクの形成方法および該リム位相シフトマスクを使用した半導体デバイスの構築 Pending JP2005534978A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/213,344 US6797440B2 (en) 2002-08-06 2002-08-06 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device
PCT/US2003/015590 WO2004013694A1 (en) 2002-08-06 2003-05-15 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device

Publications (2)

Publication Number Publication Date
JP2005534978A JP2005534978A (ja) 2005-11-17
JP2005534978A5 true JP2005534978A5 (https=) 2009-10-08

Family

ID=31494444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004525977A Pending JP2005534978A (ja) 2002-08-06 2003-05-15 リム位相シフトマスクの形成方法および該リム位相シフトマスクを使用した半導体デバイスの構築

Country Status (7)

Country Link
US (1) US6797440B2 (https=)
EP (1) EP1529246A1 (https=)
JP (1) JP2005534978A (https=)
CN (1) CN1717624A (https=)
AU (1) AU2003232155A1 (https=)
TW (1) TWI228207B (https=)
WO (1) WO2004013694A1 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6913868B2 (en) * 2003-01-21 2005-07-05 Applied Materials, Inc. Conductive bi-layer e-beam resist with amorphous carbon
KR100571411B1 (ko) * 2003-12-27 2006-04-14 동부아남반도체 주식회사 반도체 소자의 마스크 및 그 패턴 형성 방법
KR100652388B1 (ko) * 2004-11-30 2006-12-01 삼성전자주식회사 다-위상 위상 변조부를 구비하는 포커스 모니터링 마스크및 그 제조 방법
US20070012335A1 (en) * 2005-07-18 2007-01-18 Chang Hsiao C Photomask cleaning using vacuum ultraviolet (VUV) light cleaning
US7381618B2 (en) * 2006-10-03 2008-06-03 Power Integrations, Inc. Gate etch process for a high-voltage FET
US20080146001A1 (en) * 2006-12-15 2008-06-19 Texas Instruments Inc. Pre-STI nitride descum step for increased margin against STI seam voids
JP2009025553A (ja) * 2007-07-19 2009-02-05 Canon Inc 位相シフトマスク
KR100950481B1 (ko) * 2008-06-26 2010-03-31 주식회사 하이닉스반도체 포토마스크를 이용한 홀 타입 패턴 형성방법
CN102279517A (zh) * 2010-06-14 2011-12-14 清华大学 纳米压印方法
US20120098124A1 (en) * 2010-10-21 2012-04-26 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device having under-bump metallization (ubm) structure and method of forming the same
JP2012099178A (ja) * 2010-11-02 2012-05-24 Hoya Corp ビットパターンドメディア製造用のインプリントモールド及びその製造方法
KR101582175B1 (ko) * 2015-03-17 2016-01-05 에이피시스템 주식회사 레이저 패터닝을 이용한 섀도우 마스크의 제조 장치 및 레이저 패터닝을 이용한 섀도우 마스크의 제조 방법
US9659821B1 (en) * 2016-05-23 2017-05-23 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming interconnect structures by self-aligned approach
US11131919B2 (en) * 2018-06-22 2021-09-28 International Business Machines Corporation Extreme ultraviolet (EUV) mask stack processing

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6007324A (en) 1977-10-23 1999-12-28 Taiwan Semiconductor Manufacturing Company, Ltd. Double layer method for fabricating a rim type attenuating phase shifting mask
US5126006A (en) 1990-10-30 1992-06-30 International Business Machines Corp. Plural level chip masking
EP0567419A2 (en) * 1992-04-23 1993-10-27 International Business Machines Corporation A shifter-based rim phase shifting structure and process to fabricate the same
US5302477A (en) 1992-08-21 1994-04-12 Intel Corporation Inverted phase-shifted reticle
US5403682A (en) 1992-10-30 1995-04-04 International Business Machines Corporation Alternating rim phase-shifting mask
JP2500050B2 (ja) 1992-11-13 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション リム型の位相シフト・マスクの形成方法
US5495959A (en) 1994-05-11 1996-03-05 Micron Technology, Inc. Method of making substractive rim phase shifting masks
US6224724B1 (en) 1995-02-23 2001-05-01 Tokyo Electron Limited Physical vapor processing of a surface with non-uniformity compensation
US5536606A (en) 1995-05-30 1996-07-16 Micron Technology, Inc. Method for making self-aligned rim phase shifting masks for sub-micron lithography
US5955222A (en) * 1996-12-03 1999-09-21 International Business Machines Corporation Method of making a rim-type phase-shift mask and mask manufactured thereby
TW352421B (en) * 1998-04-27 1999-02-11 United Microelectronics Corp Method and process of phase shifting mask
KR100295049B1 (ko) * 1998-07-23 2001-11-30 윤종용 위상반전마스크제조방법
US6582856B1 (en) * 2000-02-28 2003-06-24 Chartered Semiconductor Manufacturing Ltd. Simplified method of fabricating a rim phase shift mask
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use

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