AU2003232155A1 - Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device - Google Patents

Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device

Info

Publication number
AU2003232155A1
AU2003232155A1 AU2003232155A AU2003232155A AU2003232155A1 AU 2003232155 A1 AU2003232155 A1 AU 2003232155A1 AU 2003232155 A AU2003232155 A AU 2003232155A AU 2003232155 A AU2003232155 A AU 2003232155A AU 2003232155 A1 AU2003232155 A1 AU 2003232155A1
Authority
AU
Australia
Prior art keywords
phase shifting
shifting mask
rim phase
semiconductor device
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003232155A
Other languages
English (en)
Inventor
William J. Dauksher
Cesar M. Garza
Panwitter J. S. Mangat
Kevin J. Nordquist
Bernard J. Roman
Wei E. Wu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP USA Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of AU2003232155A1 publication Critical patent/AU2003232155A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003232155A 2002-08-06 2003-05-15 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device Abandoned AU2003232155A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/213,344 US6797440B2 (en) 2002-08-06 2002-08-06 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device
US10/213,344 2002-08-06
PCT/US2003/015590 WO2004013694A1 (en) 2002-08-06 2003-05-15 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device

Publications (1)

Publication Number Publication Date
AU2003232155A1 true AU2003232155A1 (en) 2004-02-23

Family

ID=31494444

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003232155A Abandoned AU2003232155A1 (en) 2002-08-06 2003-05-15 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device

Country Status (7)

Country Link
US (1) US6797440B2 (https=)
EP (1) EP1529246A1 (https=)
JP (1) JP2005534978A (https=)
CN (1) CN1717624A (https=)
AU (1) AU2003232155A1 (https=)
TW (1) TWI228207B (https=)
WO (1) WO2004013694A1 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6913868B2 (en) * 2003-01-21 2005-07-05 Applied Materials, Inc. Conductive bi-layer e-beam resist with amorphous carbon
KR100571411B1 (ko) * 2003-12-27 2006-04-14 동부아남반도체 주식회사 반도체 소자의 마스크 및 그 패턴 형성 방법
KR100652388B1 (ko) * 2004-11-30 2006-12-01 삼성전자주식회사 다-위상 위상 변조부를 구비하는 포커스 모니터링 마스크및 그 제조 방법
US20070012335A1 (en) * 2005-07-18 2007-01-18 Chang Hsiao C Photomask cleaning using vacuum ultraviolet (VUV) light cleaning
US7381618B2 (en) * 2006-10-03 2008-06-03 Power Integrations, Inc. Gate etch process for a high-voltage FET
US20080146001A1 (en) * 2006-12-15 2008-06-19 Texas Instruments Inc. Pre-STI nitride descum step for increased margin against STI seam voids
JP2009025553A (ja) * 2007-07-19 2009-02-05 Canon Inc 位相シフトマスク
KR100950481B1 (ko) * 2008-06-26 2010-03-31 주식회사 하이닉스반도체 포토마스크를 이용한 홀 타입 패턴 형성방법
CN102279517A (zh) * 2010-06-14 2011-12-14 清华大学 纳米压印方法
US20120098124A1 (en) * 2010-10-21 2012-04-26 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device having under-bump metallization (ubm) structure and method of forming the same
JP2012099178A (ja) * 2010-11-02 2012-05-24 Hoya Corp ビットパターンドメディア製造用のインプリントモールド及びその製造方法
KR101582175B1 (ko) * 2015-03-17 2016-01-05 에이피시스템 주식회사 레이저 패터닝을 이용한 섀도우 마스크의 제조 장치 및 레이저 패터닝을 이용한 섀도우 마스크의 제조 방법
US9659821B1 (en) * 2016-05-23 2017-05-23 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming interconnect structures by self-aligned approach
US11131919B2 (en) * 2018-06-22 2021-09-28 International Business Machines Corporation Extreme ultraviolet (EUV) mask stack processing

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6007324A (en) 1977-10-23 1999-12-28 Taiwan Semiconductor Manufacturing Company, Ltd. Double layer method for fabricating a rim type attenuating phase shifting mask
US5126006A (en) 1990-10-30 1992-06-30 International Business Machines Corp. Plural level chip masking
EP0567419A2 (en) * 1992-04-23 1993-10-27 International Business Machines Corporation A shifter-based rim phase shifting structure and process to fabricate the same
US5302477A (en) 1992-08-21 1994-04-12 Intel Corporation Inverted phase-shifted reticle
US5403682A (en) 1992-10-30 1995-04-04 International Business Machines Corporation Alternating rim phase-shifting mask
JP2500050B2 (ja) 1992-11-13 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション リム型の位相シフト・マスクの形成方法
US5495959A (en) 1994-05-11 1996-03-05 Micron Technology, Inc. Method of making substractive rim phase shifting masks
US6224724B1 (en) 1995-02-23 2001-05-01 Tokyo Electron Limited Physical vapor processing of a surface with non-uniformity compensation
US5536606A (en) 1995-05-30 1996-07-16 Micron Technology, Inc. Method for making self-aligned rim phase shifting masks for sub-micron lithography
US5955222A (en) * 1996-12-03 1999-09-21 International Business Machines Corporation Method of making a rim-type phase-shift mask and mask manufactured thereby
TW352421B (en) * 1998-04-27 1999-02-11 United Microelectronics Corp Method and process of phase shifting mask
KR100295049B1 (ko) * 1998-07-23 2001-11-30 윤종용 위상반전마스크제조방법
US6582856B1 (en) * 2000-02-28 2003-06-24 Chartered Semiconductor Manufacturing Ltd. Simplified method of fabricating a rim phase shift mask
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use

Also Published As

Publication number Publication date
US6797440B2 (en) 2004-09-28
WO2004013694A1 (en) 2004-02-12
EP1529246A1 (en) 2005-05-11
US20040029021A1 (en) 2004-02-12
TWI228207B (en) 2005-02-21
CN1717624A (zh) 2006-01-04
JP2005534978A (ja) 2005-11-17
TW200405134A (en) 2004-04-01

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