JP2005534978A - リム位相シフトマスクの形成方法および該リム位相シフトマスクを使用した半導体デバイスの構築 - Google Patents

リム位相シフトマスクの形成方法および該リム位相シフトマスクを使用した半導体デバイスの構築 Download PDF

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Publication number
JP2005534978A
JP2005534978A JP2004525977A JP2004525977A JP2005534978A JP 2005534978 A JP2005534978 A JP 2005534978A JP 2004525977 A JP2004525977 A JP 2004525977A JP 2004525977 A JP2004525977 A JP 2004525977A JP 2005534978 A JP2005534978 A JP 2005534978A
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JP
Japan
Prior art keywords
film
phase shift
rim
opening
transparent substrate
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Pending
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JP2004525977A
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English (en)
Japanese (ja)
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JP2005534978A5 (https=
Inventor
エム． ガーザ、シーザー
イー． ウー、ウェイ
ジェイ． ロマン、バーナード
ジェイ．エス． マンガト、パンウィッター
ジェイ． ノードキスト、ケビン
ジェイ． ドークシャー、ウィリアム
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NXP USA Inc
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NXP USA Inc
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Publication date
Application filed by NXP USA Inc filed Critical NXP USA Inc
Publication of JP2005534978A publication Critical patent/JP2005534978A/ja
Publication of JP2005534978A5 publication Critical patent/JP2005534978A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004525977A 2002-08-06 2003-05-15 リム位相シフトマスクの形成方法および該リム位相シフトマスクを使用した半導体デバイスの構築 Pending JP2005534978A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/213,344 US6797440B2 (en) 2002-08-06 2002-08-06 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device
PCT/US2003/015590 WO2004013694A1 (en) 2002-08-06 2003-05-15 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device

Publications (2)

Publication Number Publication Date
JP2005534978A true JP2005534978A (ja) 2005-11-17
JP2005534978A5 JP2005534978A5 (https=) 2009-10-08

Family

ID=31494444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004525977A Pending JP2005534978A (ja) 2002-08-06 2003-05-15 リム位相シフトマスクの形成方法および該リム位相シフトマスクを使用した半導体デバイスの構築

Country Status (7)

Country Link
US (1) US6797440B2 (https=)
EP (1) EP1529246A1 (https=)
JP (1) JP2005534978A (https=)
CN (1) CN1717624A (https=)
AU (1) AU2003232155A1 (https=)
TW (1) TWI228207B (https=)
WO (1) WO2004013694A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008091924A (ja) * 2006-10-03 2008-04-17 Power Integrations Inc 高電圧ｆｅｔ用ゲートエッチング方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6913868B2 (en) * 2003-01-21 2005-07-05 Applied Materials, Inc. Conductive bi-layer e-beam resist with amorphous carbon
KR100571411B1 (ko) * 2003-12-27 2006-04-14 동부아남반도체 주식회사 반도체 소자의 마스크 및 그 패턴 형성 방법
KR100652388B1 (ko) * 2004-11-30 2006-12-01 삼성전자주식회사 다-위상 위상 변조부를 구비하는 포커스 모니터링 마스크및 그 제조 방법
US20070012335A1 (en) * 2005-07-18 2007-01-18 Chang Hsiao C Photomask cleaning using vacuum ultraviolet (VUV) light cleaning
US20080146001A1 (en) * 2006-12-15 2008-06-19 Texas Instruments Inc. Pre-STI nitride descum step for increased margin against STI seam voids
JP2009025553A (ja) * 2007-07-19 2009-02-05 Canon Inc 位相シフトマスク
KR100950481B1 (ko) * 2008-06-26 2010-03-31 주식회사 하이닉스반도체 포토마스크를 이용한 홀 타입 패턴 형성방법
CN102279517A (zh) * 2010-06-14 2011-12-14 清华大学 纳米压印方法
US20120098124A1 (en) * 2010-10-21 2012-04-26 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device having under-bump metallization (ubm) structure and method of forming the same
JP2012099178A (ja) * 2010-11-02 2012-05-24 Hoya Corp ビットパターンドメディア製造用のインプリントモールド及びその製造方法
KR101582175B1 (ko) * 2015-03-17 2016-01-05 에이피시스템 주식회사 레이저 패터닝을 이용한 섀도우 마스크의 제조 장치 및 레이저 패터닝을 이용한 섀도우 마스크의 제조 방법
US9659821B1 (en) * 2016-05-23 2017-05-23 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming interconnect structures by self-aligned approach
US11131919B2 (en) * 2018-06-22 2021-09-28 International Business Machines Corporation Extreme ultraviolet (EUV) mask stack processing

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6007324A (en) 1977-10-23 1999-12-28 Taiwan Semiconductor Manufacturing Company, Ltd. Double layer method for fabricating a rim type attenuating phase shifting mask
US5126006A (en) 1990-10-30 1992-06-30 International Business Machines Corp. Plural level chip masking
EP0567419A2 (en) * 1992-04-23 1993-10-27 International Business Machines Corporation A shifter-based rim phase shifting structure and process to fabricate the same
US5302477A (en) 1992-08-21 1994-04-12 Intel Corporation Inverted phase-shifted reticle
US5403682A (en) 1992-10-30 1995-04-04 International Business Machines Corporation Alternating rim phase-shifting mask
JP2500050B2 (ja) 1992-11-13 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション リム型の位相シフト・マスクの形成方法
US5495959A (en) 1994-05-11 1996-03-05 Micron Technology, Inc. Method of making substractive rim phase shifting masks
US6224724B1 (en) 1995-02-23 2001-05-01 Tokyo Electron Limited Physical vapor processing of a surface with non-uniformity compensation
US5536606A (en) 1995-05-30 1996-07-16 Micron Technology, Inc. Method for making self-aligned rim phase shifting masks for sub-micron lithography
US5955222A (en) * 1996-12-03 1999-09-21 International Business Machines Corporation Method of making a rim-type phase-shift mask and mask manufactured thereby
TW352421B (en) * 1998-04-27 1999-02-11 United Microelectronics Corp Method and process of phase shifting mask
KR100295049B1 (ko) * 1998-07-23 2001-11-30 윤종용 위상반전마스크제조방법
US6582856B1 (en) * 2000-02-28 2003-06-24 Chartered Semiconductor Manufacturing Ltd. Simplified method of fabricating a rim phase shift mask
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008091924A (ja) * 2006-10-03 2008-04-17 Power Integrations Inc 高電圧ｆｅｔ用ゲートエッチング方法

Also Published As

Publication number Publication date
US6797440B2 (en) 2004-09-28
WO2004013694A1 (en) 2004-02-12
EP1529246A1 (en) 2005-05-11
US20040029021A1 (en) 2004-02-12
TWI228207B (en) 2005-02-21
CN1717624A (zh) 2006-01-04
AU2003232155A1 (en) 2004-02-23
TW200405134A (en) 2004-04-01

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