JP2005533896A5 - - Google Patents

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Publication number
JP2005533896A5
JP2005533896A5 JP2004523443A JP2004523443A JP2005533896A5 JP 2005533896 A5 JP2005533896 A5 JP 2005533896A5 JP 2004523443 A JP2004523443 A JP 2004523443A JP 2004523443 A JP2004523443 A JP 2004523443A JP 2005533896 A5 JP2005533896 A5 JP 2005533896A5
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JP
Japan
Prior art keywords
wet stripping
formulation
composition
stripping composition
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004523443A
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English (en)
Japanese (ja)
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JP2005533896A (ja
Filing date
Publication date
Priority claimed from US10/201,340 external-priority patent/US6849200B2/en
Application filed filed Critical
Publication of JP2005533896A publication Critical patent/JP2005533896A/ja
Publication of JP2005533896A5 publication Critical patent/JP2005533896A5/ja
Withdrawn legal-status Critical Current

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JP2004523443A 2002-07-23 2003-07-16 犠牲的反射防止材料の湿式剥離除去のための組成物および方法 Withdrawn JP2005533896A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/201,340 US6849200B2 (en) 2002-07-23 2002-07-23 Composition and process for wet stripping removal of sacrificial anti-reflective material
PCT/US2003/022148 WO2004009730A1 (en) 2002-07-23 2003-07-16 Composition and process for wet stripping removal of sacrificial anti-reflective material

Publications (2)

Publication Number Publication Date
JP2005533896A JP2005533896A (ja) 2005-11-10
JP2005533896A5 true JP2005533896A5 (enExample) 2006-09-21

Family

ID=30769632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004523443A Withdrawn JP2005533896A (ja) 2002-07-23 2003-07-16 犠牲的反射防止材料の湿式剥離除去のための組成物および方法

Country Status (7)

Country Link
US (1) US6849200B2 (enExample)
EP (1) EP1551936A4 (enExample)
JP (1) JP2005533896A (enExample)
CN (1) CN1671821A (enExample)
AU (1) AU2003249279A1 (enExample)
TW (1) TW200408003A (enExample)
WO (1) WO2004009730A1 (enExample)

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TWI502065B (zh) 2010-10-13 2015-10-01 Entegris Inc 抑制氮化鈦腐蝕之組成物及方法
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US9678430B2 (en) 2012-05-18 2017-06-13 Entegris, Inc. Composition and process for stripping photoresist from a surface including titanium nitride
WO2014089196A1 (en) 2012-12-05 2014-06-12 Advanced Technology Materials, Inc. Compositions for cleaning iii-v semiconductor materials and methods of using same
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TWI683889B (zh) 2013-07-31 2020-02-01 美商恩特葛瑞斯股份有限公司 用於移除金屬硬遮罩及蝕刻後殘餘物之具有Ｃｕ／Ｗ相容性的水性配方
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