JP2005532680A - 照明源を備える光学装置 - Google Patents

照明源を備える光学装置 Download PDF

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Publication number
JP2005532680A
JP2005532680A JP2004518539A JP2004518539A JP2005532680A JP 2005532680 A JP2005532680 A JP 2005532680A JP 2004518539 A JP2004518539 A JP 2004518539A JP 2004518539 A JP2004518539 A JP 2004518539A JP 2005532680 A JP2005532680 A JP 2005532680A
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JP
Japan
Prior art keywords
illumination
light source
projection
light beam
individual
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JP2004518539A
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English (en)
Japanese (ja)
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JP2005532680A5 (enExample
Inventor
ベイデル，ディエター
レング，ノルベルト
ワングラー，ヨハンス
Original Assignee
カール・ツアイス・エスエムテイ・アーゲー
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Publication of JP2005532680A publication Critical patent/JP2005532680A/ja
Publication of JP2005532680A5 publication Critical patent/JP2005532680A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Eye Examination Apparatus (AREA)
JP2004518539A 2002-07-08 2003-06-18 照明源を備える光学装置 Pending JP2005532680A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10230652A DE10230652A1 (de) 2002-07-08 2002-07-08 Optische Vorrichtung mit einer Beleuchtungslichtquelle
PCT/EP2003/006397 WO2004006021A2 (de) 2002-07-08 2003-06-18 Optische vorrichtung mit einer beleuchtungsquelle

Publications (2)

Publication Number Publication Date
JP2005532680A true JP2005532680A (ja) 2005-10-27
JP2005532680A5 JP2005532680A5 (enExample) 2006-09-14

Family

ID=29796199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004518539A Pending JP2005532680A (ja) 2002-07-08 2003-06-18 照明源を備える光学装置

Country Status (7)

Country Link
US (1) US20050226000A1 (enExample)
EP (1) EP1520210A2 (enExample)
JP (1) JP2005532680A (enExample)
CN (1) CN1666153A (enExample)
AU (1) AU2003246548A1 (enExample)
DE (1) DE10230652A1 (enExample)
WO (1) WO2004006021A2 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007027188A (ja) * 2005-07-12 2007-02-01 Nano System Solutions:Kk 露光用照明光源の形成方法、露光用照明光源装置、露光方法及び露光装置
JP2015522937A (ja) * 2012-06-01 2015-08-06 エーエスエムエル ネザーランズ ビー．ブイ． 複数の放射ビームの特性を修正するアセンブリ、リソグラフィ装置、複数の放射ビームの特性を修正する方法およびデバイス製造方法
JP2023158018A (ja) * 2020-01-21 2023-10-26 株式会社ニコン 照明光学系、露光装置、及びデバイス製造方法

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US7245354B2 (en) * 2004-02-03 2007-07-17 Yuri Granik Source optimization for image fidelity and throughput
DE102004031720A1 (de) * 2004-06-30 2006-01-26 Infineon Technologies Ag Abbildungseinrichtung und Verfahren zum Ermitteln einer optimierten Beleuchtungsverteilung in der Abbildungseinrichtung
US7283209B2 (en) 2004-07-09 2007-10-16 Carl Zeiss Smt Ag Illumination system for microlithography
WO2006064363A1 (en) * 2004-12-14 2006-06-22 Radove Gmbh Process and apparatus for the production of collimated uv rays for photolithographic transfer
TW200625027A (en) * 2005-01-14 2006-07-16 Zeiss Carl Smt Ag Illumination system for a microlithographic projection exposure apparatus
DE102005031792A1 (de) * 2005-07-07 2007-01-11 Carl Zeiss Smt Ag Verfahren zur Entfernung von Kontamination von optischen Elementen, insbesondere von Oberflächen optischer Elemente sowie ein optisches System oder Teilsystem hierfür
DE102005053651A1 (de) * 2005-11-10 2007-05-16 Zeiss Carl Smt Ag Mikrolithographische Projektionsbelichtungsanlage sowie Verfahren zur Herstellung mikrostrukturierter Bauelemente
JP5361239B2 (ja) * 2008-04-09 2013-12-04 キヤノン株式会社 露光装置及びデバイス製造方法
US8330938B2 (en) * 2009-02-27 2012-12-11 Corning Incorporated Solid-state array for lithography illumination
US9046359B2 (en) 2012-05-23 2015-06-02 Jds Uniphase Corporation Range imaging devices and methods
DE102015212910A1 (de) * 2015-07-09 2017-01-12 Sac Sirius Advanced Cybernetics Gmbh Vorrichtung zur Beleuchtung von Gegenständen
CN105222997A (zh) * 2015-09-29 2016-01-06 合肥京东方显示光源有限公司 一种光源模拟装置、光源测试系统及测试方法
CN106814548A (zh) * 2015-11-30 2017-06-09 上海微电子装备有限公司 自由光瞳照明方法及照明系统
NL2017493B1 (en) * 2016-09-19 2018-03-27 Kulicke & Soffa Liteq B V Optical beam homogenizer based on a lens array
CN108803244B (zh) * 2017-04-27 2021-06-18 上海微电子装备（集团）股份有限公司 照明装置及照明方法和一种光刻机
DE102018201457A1 (de) * 2018-01-31 2019-08-01 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102022203331A1 (de) 2022-04-04 2022-11-10 Carl Zeiss Smt Gmbh Beleuchtungssystem und Projektionsbelichtungsanlage für Mikrolithographie

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US3729252A (en) * 1970-06-05 1973-04-24 Eastman Kodak Co Optical spatial filtering with multiple light sources
HU175630B (hu) * 1976-12-15 1980-09-28 Mta Szamitastech Autom Kutato Lazernoe ustrojstvo dlja registracii dannykh i signalov
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
KR950004968B1 (ko) * 1991-10-15 1995-05-16 가부시키가이샤 도시바 투영노광 장치
US6038279A (en) * 1995-10-16 2000-03-14 Canon Kabushiki Kaisha X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device
DE19540108C2 (de) * 1995-10-27 1998-08-06 Ldt Gmbh & Co Vorrichtung zur Darstellung eines ersten Bildes in einem durch eine durchsichtige Scheibe sichtbaren zweiten Bild
US6628370B1 (en) * 1996-11-25 2003-09-30 Mccullough Andrew W. Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system
US5840451A (en) * 1996-12-04 1998-11-24 Advanced Micro Devices, Inc. Individually controllable radiation sources for providing an image pattern in a photolithographic system
US6233039B1 (en) * 1997-06-05 2001-05-15 Texas Instruments Incorporated Optical illumination system and associated exposure apparatus
WO1999045558A1 (en) * 1998-03-05 1999-09-10 Fed Corporation Blue and ultraviolet photolithography with organic light emitting devices
US6215578B1 (en) * 1998-09-17 2001-04-10 Vanguard International Semiconductor Corporation Electronically switchable off-axis illumination blade for stepper illumination system
US6224216B1 (en) * 2000-02-18 2001-05-01 Infocus Corporation System and method employing LED light sources for a projection display
US6509955B2 (en) * 2000-05-25 2003-01-21 Ball Semiconductor, Inc. Lens system for maskless photolithography
US6658315B2 (en) * 2001-10-31 2003-12-02 Ball Semiconductor, Inc. Non-synchronous control of pulsed light
WO2003040830A2 (en) * 2001-11-07 2003-05-15 Applied Materials, Inc. Optical spot grid array printer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007027188A (ja) * 2005-07-12 2007-02-01 Nano System Solutions:Kk 露光用照明光源の形成方法、露光用照明光源装置、露光方法及び露光装置
JP2015522937A (ja) * 2012-06-01 2015-08-06 エーエスエムエル ネザーランズ ビー．ブイ． 複数の放射ビームの特性を修正するアセンブリ、リソグラフィ装置、複数の放射ビームの特性を修正する方法およびデバイス製造方法
JP2023158018A (ja) * 2020-01-21 2023-10-26 株式会社ニコン 照明光学系、露光装置、及びデバイス製造方法

Also Published As

Publication number Publication date
CN1666153A (zh) 2005-09-07
WO2004006021A2 (de) 2004-01-15
DE10230652A1 (de) 2004-01-29
EP1520210A2 (de) 2005-04-06
WO2004006021A3 (de) 2004-09-16
US20050226000A1 (en) 2005-10-13
AU2003246548A1 (en) 2004-01-23

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