AU2003246548A1 - Optical device comprising an light source - Google Patents

Optical device comprising an light source

Info

Publication number
AU2003246548A1
AU2003246548A1 AU2003246548A AU2003246548A AU2003246548A1 AU 2003246548 A1 AU2003246548 A1 AU 2003246548A1 AU 2003246548 A AU2003246548 A AU 2003246548A AU 2003246548 A AU2003246548 A AU 2003246548A AU 2003246548 A1 AU2003246548 A1 AU 2003246548A1
Authority
AU
Australia
Prior art keywords
light source
optical device
optical
source
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003246548A
Other languages
English (en)
Inventor
Dieter Bader
Norbert Reng
Johannes Wangler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2003246548A1 publication Critical patent/AU2003246548A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Eye Examination Apparatus (AREA)
AU2003246548A 2002-07-08 2003-06-18 Optical device comprising an light source Abandoned AU2003246548A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10230652A DE10230652A1 (de) 2002-07-08 2002-07-08 Optische Vorrichtung mit einer Beleuchtungslichtquelle
DE10230652.4 2002-07-08
PCT/EP2003/006397 WO2004006021A2 (de) 2002-07-08 2003-06-18 Optische vorrichtung mit einer beleuchtungsquelle

Publications (1)

Publication Number Publication Date
AU2003246548A1 true AU2003246548A1 (en) 2004-01-23

Family

ID=29796199

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003246548A Abandoned AU2003246548A1 (en) 2002-07-08 2003-06-18 Optical device comprising an light source

Country Status (7)

Country Link
US (1) US20050226000A1 (enExample)
EP (1) EP1520210A2 (enExample)
JP (1) JP2005532680A (enExample)
CN (1) CN1666153A (enExample)
AU (1) AU2003246548A1 (enExample)
DE (1) DE10230652A1 (enExample)
WO (1) WO2004006021A2 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7245354B2 (en) * 2004-02-03 2007-07-17 Yuri Granik Source optimization for image fidelity and throughput
DE102004031720A1 (de) * 2004-06-30 2006-01-26 Infineon Technologies Ag Abbildungseinrichtung und Verfahren zum Ermitteln einer optimierten Beleuchtungsverteilung in der Abbildungseinrichtung
US7283209B2 (en) 2004-07-09 2007-10-16 Carl Zeiss Smt Ag Illumination system for microlithography
WO2006064363A1 (en) * 2004-12-14 2006-06-22 Radove Gmbh Process and apparatus for the production of collimated uv rays for photolithographic transfer
TW200625027A (en) * 2005-01-14 2006-07-16 Zeiss Carl Smt Ag Illumination system for a microlithographic projection exposure apparatus
DE102005031792A1 (de) * 2005-07-07 2007-01-11 Carl Zeiss Smt Ag Verfahren zur Entfernung von Kontamination von optischen Elementen, insbesondere von Oberflächen optischer Elemente sowie ein optisches System oder Teilsystem hierfür
JP2007027188A (ja) * 2005-07-12 2007-02-01 Nano System Solutions:Kk 露光用照明光源の形成方法、露光用照明光源装置、露光方法及び露光装置
DE102005053651A1 (de) * 2005-11-10 2007-05-16 Zeiss Carl Smt Ag Mikrolithographische Projektionsbelichtungsanlage sowie Verfahren zur Herstellung mikrostrukturierter Bauelemente
JP5361239B2 (ja) * 2008-04-09 2013-12-04 キヤノン株式会社 露光装置及びデバイス製造方法
US8330938B2 (en) * 2009-02-27 2012-12-11 Corning Incorporated Solid-state array for lithography illumination
US9046359B2 (en) 2012-05-23 2015-06-02 Jds Uniphase Corporation Range imaging devices and methods
KR20150028266A (ko) * 2012-06-01 2015-03-13 에이에스엠엘 네델란즈 비.브이. 복수의 방사선 빔들의 특성들을 변경하는 조립체, 리소그래피 장치, 복수의 방사선 빔들의 특성들을 변경하는 방법 및 디바이스 제조 방법
DE102015212910A1 (de) * 2015-07-09 2017-01-12 Sac Sirius Advanced Cybernetics Gmbh Vorrichtung zur Beleuchtung von Gegenständen
CN105222997A (zh) * 2015-09-29 2016-01-06 合肥京东方显示光源有限公司 一种光源模拟装置、光源测试系统及测试方法
CN106814548A (zh) * 2015-11-30 2017-06-09 上海微电子装备有限公司 自由光瞳照明方法及照明系统
NL2017493B1 (en) * 2016-09-19 2018-03-27 Kulicke & Soffa Liteq B V Optical beam homogenizer based on a lens array
CN108803244B (zh) * 2017-04-27 2021-06-18 上海微电子装备（集团）股份有限公司 照明装置及照明方法和一种光刻机
DE102018201457A1 (de) * 2018-01-31 2019-08-01 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
JP7340167B2 (ja) * 2020-01-21 2023-09-07 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
DE102022203331A1 (de) 2022-04-04 2022-11-10 Carl Zeiss Smt Gmbh Beleuchtungssystem und Projektionsbelichtungsanlage für Mikrolithographie

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3729252A (en) * 1970-06-05 1973-04-24 Eastman Kodak Co Optical spatial filtering with multiple light sources
HU175630B (hu) * 1976-12-15 1980-09-28 Mta Szamitastech Autom Kutato Lazernoe ustrojstvo dlja registracii dannykh i signalov
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
KR950004968B1 (ko) * 1991-10-15 1995-05-16 가부시키가이샤 도시바 투영노광 장치
US6038279A (en) * 1995-10-16 2000-03-14 Canon Kabushiki Kaisha X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device
DE19540108C2 (de) * 1995-10-27 1998-08-06 Ldt Gmbh & Co Vorrichtung zur Darstellung eines ersten Bildes in einem durch eine durchsichtige Scheibe sichtbaren zweiten Bild
US6628370B1 (en) * 1996-11-25 2003-09-30 Mccullough Andrew W. Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system
US5840451A (en) * 1996-12-04 1998-11-24 Advanced Micro Devices, Inc. Individually controllable radiation sources for providing an image pattern in a photolithographic system
US6233039B1 (en) * 1997-06-05 2001-05-15 Texas Instruments Incorporated Optical illumination system and associated exposure apparatus
WO1999045558A1 (en) * 1998-03-05 1999-09-10 Fed Corporation Blue and ultraviolet photolithography with organic light emitting devices
US6215578B1 (en) * 1998-09-17 2001-04-10 Vanguard International Semiconductor Corporation Electronically switchable off-axis illumination blade for stepper illumination system
US6224216B1 (en) * 2000-02-18 2001-05-01 Infocus Corporation System and method employing LED light sources for a projection display
US6509955B2 (en) * 2000-05-25 2003-01-21 Ball Semiconductor, Inc. Lens system for maskless photolithography
US6658315B2 (en) * 2001-10-31 2003-12-02 Ball Semiconductor, Inc. Non-synchronous control of pulsed light
WO2003040830A2 (en) * 2001-11-07 2003-05-15 Applied Materials, Inc. Optical spot grid array printer

Also Published As

Publication number Publication date
CN1666153A (zh) 2005-09-07
WO2004006021A2 (de) 2004-01-15
DE10230652A1 (de) 2004-01-29
EP1520210A2 (de) 2005-04-06
JP2005532680A (ja) 2005-10-27
WO2004006021A3 (de) 2004-09-16
US20050226000A1 (en) 2005-10-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase